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    LASER APPARATUS AND EUV LIGHT GENERATION SYSTEM
    31.
    发明申请
    LASER APPARATUS AND EUV LIGHT GENERATION SYSTEM 审中-公开

    公开(公告)号：US20200044407A1

    公开(公告)日：2020-02-06

    申请号：US16595782

    申请日：2019-10-08

    Applicant: Gigaphoton Inc.

    Inventor： Tsukasa HORI ,  Yoshifumi UENO ,  Takayuki YABU ,  Yoshiaki KUROSAWA

    IPC: H01S3/04 ,  H05G2/00 ,  H01S3/23

    Abstract: A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring.

    EXTREME UV LIGHT GENERATION DEVICE AND TARGET RECOVERY APPARATUS
    34.
    发明申请
    EXTREME UV LIGHT GENERATION DEVICE AND TARGET RECOVERY APPARATUS 有权

    公开(公告)号：US20170307979A1

    公开(公告)日：2017-10-26

    申请号：US15645295

    申请日：2017-07-10

    Applicant: Gigaphoton Inc.

    Inventor： Tsukasa HORI ,  Fumio IWAMOTO ,  Kazukiyo KAMIKANNA

    IPC: G03F7/20

    CPC classification number: H05G2/008 ,  G03F7/2002 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006

    Abstract: An EUV light generation device generates EUV light stably. The EUV light generation device may include a chamber in which extreme ultraviolet light is generated when a target is irradiated with laser light in a predetermined region inside the chamber, a target supply device configured to output the target to the predetermined region in the chamber to thereby supply the target to the predetermined region, and a target recovery apparatus configured to recover the target output from the target supply device and not irradiated with the laser light. The target recovery apparatus may include a receiver disposed to be inclined with respect to a trajectory of the target output from the target supply device, the receiver being configured to receive the target by allowing the target not irradiated with the laser light to collide with the receiver, and an excitation device configured to vibrate the receiver.

    TARGET SUPPLY DEVICE, TARGET MATERIAL REFINING METHOD, RECORDING MEDIUM HAVING TARGET MATERIAL REFINING PROGRAM RECORDED THEREIN, AND TARGET GENERATOR
    35.
    发明申请
    TARGET SUPPLY DEVICE, TARGET MATERIAL REFINING METHOD, RECORDING MEDIUM HAVING TARGET MATERIAL REFINING PROGRAM RECORDED THEREIN, AND TARGET GENERATOR 审中-公开
    目标供应装置，目标材料精炼方法，记录有目标材料精炼程序的记录介质和目标发电机

    公开(公告)号：US20170053780A1

    公开(公告)日：2017-02-23

    申请号：US15346431

    申请日：2016-11-08

    Applicant: Gigaphoton Inc.

    Inventor： Fumio IWAMOTO ,  Yutaka SHIRAISHI ,  Tsukasa HORI ,  Osamu WAKABAYASHI

    IPC: H01J37/32

    CPC classification number: H01J37/32449 ,  H05G2/00 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: A target supply device may be provided with a tank configured to contain a metal as a target material, a nozzle having a nozzle hole through which the target material is output from the tank, a filter disposed in a communication portion for conducting the target material from the tank to the nozzle hole, a temperature adjuster configured to change the temperature of the target material in the tank, and a controller controlling the temperature adjuster to change the temperature of the target material in the tank such that oxygen in the target material is precipitated as metal oxide.

    Abstract translation: 目标供给装置可以设置有容纳作为目标材料的金属的罐，具有目标材料从罐输出的喷嘴孔的喷嘴，设置在用于将目标材料传导的连通部中的过滤器 所述罐到喷嘴孔，温度调节器，其构造成改变罐中的目标材料的温度;以及控制器，控制温度调节器以改变罐中的目标材料的温度，使得靶材料中的氧沉淀 作为金属氧化物。

    FILTER AND TARGET SUPPLY APPARATUS
    36.
    发明申请
    FILTER AND TARGET SUPPLY APPARATUS 审中-公开
    过滤器和目标供应装置

    公开(公告)号：US20160227637A1

    公开(公告)日：2016-08-04

    申请号：US14992477

    申请日：2014-06-13

    Applicant: GIGAPHOTON INC.

    Inventor： Tomohide ICHINOSE ,  Fumio IWAMOTO ,  Yutaka SHIRAISHI ,  Tsukasa HORI ,  Hideo HOSHINO

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: H05G2/006 ,  B01D25/16 ,  B01D29/46 ,  B01D46/406 ,  G03F7/70191 ,  H05G2/005

    Abstract: A filter may include: a first member having a first surface provided with a channel; and a second member set with a second surface thereof covering the channel. The first member may include a first passable portion that allows a fluid to pass between the first surface and a first space, which is defined beside a surface of the first member opposite to the first surface, through a first area of the channel. The second member may include a second passable portion that allows the fluid to pass between the second surface and a second space, which is defined beside a surface of the second member opposite to the second surface, through a second area of the channel distanced from the first area.

    Abstract translation: 过滤器可以包括：具有设置有通道的第一表面的第一构件; 以及第二构件，其具有覆盖所述通道的第二表面。 第一构件可以包括第一可通过部分，其允许流体在通道的第一区域之间在第一表面和限定在与第一表面相对的第一构件的表面旁边的第一空间之间通过。 第二构件可以包括第二可通过部分，其允许流体在第二表面和第二空间之间通过，第二空间限定在与第二表面相对的第二构件的表面旁边，通过与第二空间相距的通道的第二区域 第一区。

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