公开(公告)号：US20150118506A1

公开(公告)日：2015-04-30

申请号：US14062341

申请日：2013-10-24

Applicant: General Electric Company

Inventor： Yuefeng Luo ,  William Edward Adis ,  Michael Lewis Jones

IPC: B32B15/04 ,  C25F3/02

CPC classification number: C25F3/24 ,  B32B3/00 ,  B32B3/02 ,  B32B3/30 ,  B32B7/00 ,  B32B7/12 ,  B32B9/00 ,  B32B9/04 ,  B32B15/00 ,  B32B15/04 ,  B32B2255/00 ,  B32B2255/06 ,  B32B2264/104 ,  B32B2307/20 ,  B32B2307/208 ,  B32B2307/7242 ,  B32B2307/7265 ,  B32B2457/00 ,  C25D9/06 ,  C25D9/10 ,  C25D11/36 ,  C25F1/06 ,  C25F7/00 ,  Y10T428/31678

Abstract: The present disclosure generally relates to a sealed metal laminate structure comprising: a metal layer having a first surface and an opposite second surface; a first enamel layer laminated on the first surface of the metal layer, except at an exposed metal protrusion at a perimeter edge of the sealed metal laminate structure; a second enamel layer laminated on the second surface of the metal layer, except at the exposed metal protrusion at the perimeter edge of the sealed laminate structure; and a phosphate sealer deposited on the exposed metal protrusion of the sealed metal laminate structure. The present disclosure also relates to a metal laminate structure without a phosphate sealer. In addition, systems and methods for treating workpieces, including metal laminate structures, are discussed.

Abstract translation: 本发明一般涉及一种密封金属叠层结构，包括：具有第一表面和相对的第二表面的金属层; 层压在金属层的第一表面上的第一搪瓷层，除了在密封的金属层压结构的周边处的暴露的金属突起之外; 层压在金属层的第二表面上的第二搪瓷层，除了在密封层叠结构的周边边缘处的暴露的金属突起之外; 以及沉积在密封的金属层压结构的暴露的金属突起上的磷酸盐封隔体。 本公开还涉及没有磷酸盐封闭剂的金属层压结构。 另外，还讨论了用于处理工件（包括金属层压结构）的系统和方法。

公开(公告)号：US20140131318A1

公开(公告)日：2014-05-15

申请号：US13676254

申请日：2012-11-14

Applicant: GENERAL ELECTRIC COMPANY

Inventor： Yuefeng Luo ,  William Edward Adis ,  Michael Lewis Jones

IPC: B23H1/02

CPC classification number: B23H1/024 ,  B23H1/02 ,  B23H1/028 ,  B23H7/18 ,  B23H9/10

Abstract: Systems and methods for controlled and precise EDM manufacturing of a component are disclosed. In one embodiment, a system includes: a tank for holding a fluid; a first electrode array in the tank, the first electrode array including a plurality of electrodes configured to shape a workpiece; a workpiece fixture for positioning the workpiece at least partially immersed in the fluid and proximate the first electrode array; a pulse generator for creating an electric discharge between the workpiece and the first electrode array to remove material from the workpiece; a gap sensing circuit communicatively connected to the workpiece and the first electrode array, the gap sensing circuit configured to monitor the electric discharge between the workpiece and the first electrode array; and a computing device communicatively connected to the gap sensing circuit and the workpiece fixture, the computing device manipulating a position of the workpiece in the tank relative the first electrode array based upon data obtained from the gap sensing circuit.

Abstract translation: 公开了用于组件的受控和精确的EDM制造的系统和方法。 在一个实施例中，系统包括：用于保持流体的罐; 所述槽中的第一电极阵列，所述第一电极阵列包括构造成成形工件的多个电极; 用于将所述工件定位成至少部分地浸没在所述流体中并且靠近所述第一电极阵列的工件夹具; 脉冲发生器，用于在所述工件和所述第一电极阵列之间产生放电以从所述工件移除材料; 间隙感测电路，其通信地连接到所述工件和所述第一电极阵列，所述间隙感测电路被配置为监测所述工件与所述第一电极阵列之间的放电; 以及计算设备，其通信地连接到所述间隙感测电路和所述工件夹具，所述计算设备基于从所述间隙感测电路获得的数据，相对于所述第一电极阵列操纵所述工件在所述槽中的位置。