公开(公告)号：US10216091B2

公开(公告)日：2019-02-26

申请号：US15436140

申请日：2017-02-17

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Deguenther ,  Michael Patra

IPC: G03F7/20 ,  G02B5/08 ,  G02B5/09 ,  G21K1/06

Abstract: A facet mirror for an illumination optical unit for projection lithography has a plurality of used facets, which in each case reflect an illumination light partial beam. The facet mirror has at least one change subunit having a plurality of change facets arranged jointly on a facet carrier, which change facets can be positioned alternatively at the used location of exactly one used facet. This results in a facet mirror with which different illumination geometries or illumination settings can be set operationally reliably and stably.

公开(公告)号：US10146135B2

公开(公告)日：2018-12-04

申请号：US14633738

申请日：2015-02-27

Applicant: Carl Zeiss SMT GmbH

Inventor： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

IPC: G03F7/20 ,  G02B5/09 ,  G02B26/10

Abstract: A microlithography projection exposure apparatus includes illumination optics configured to illuminate object field points of an object field in an object plane, and projection optics configured to image the object field onto an image field in an image plane. The illumination optics includes a multi-mirror array which includes a plurality of mirrors configured to adjust an intensity distribution in exit pupils associated with the object field points. The illumination optics also includes an optical system configured to produce, via an incoherent superposition of illumination rays, a temporal modification of a temporal stabilization of an illumination of the multi-mirror array. The optical system includes a mirror which includes a mirror surface. In addition, the optical system includes an actuator configured to produce a tilt of at least a portion of the mirror surface.

公开(公告)号：US10061203B2

公开(公告)日：2018-08-28

申请号：US15244234

申请日：2016-08-23

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Deguenther ,  Michael Patra ,  Thomas Korb

IPC: G03F7/20 ,  G02B26/08 ,  G02B5/18 ,  G02B27/10

CPC classification number: G03F7/702 ,  G02B5/1861 ,  G02B26/0808 ,  G02B26/0833 ,  G02B27/1086 ,  G03F7/70191 ,  G03F7/70208

Abstract: A beam distribution optical unit serves for splitting an incident beam of illumination light into at least two emergent illumination-light beams. The beam distribution optical unit has at least one blazed reflection grating having reflective grating structures. The result is an optical unit in which a plurality of illumination-light beams are efficiently produced from one incident beam of illumination light.

公开(公告)号：US09933706B2

公开(公告)日：2018-04-03

申请号：US15270201

申请日：2016-09-20

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Deguenther ,  Damian Fiolka ,  Gerhard-Wilhelm Ziegler

IPC: G03B27/54 ,  G03F7/20 ,  G02B17/08

CPC classification number: G03F7/70191 ,  G02B17/0892 ,  G03F7/70116 ,  G03F7/70941

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a spatial light modulator which varies an intensity distribution in a pupil surface. The modulator includes an array of mirrors that reflect impinging projection light into directions that depend on control signals applied to the mirrors. A prism, which directs the projection light towards the spatial light modulator, has a double pass surface on which the projection light impinges twice, namely a first time when leaving the prism and before it is reflected by the mirrors, and a second time when entering the prism and after it has been reflected by the mirrors. A pupil perturbation suppressing mechanism is provided that reduces reflections of projection light when it impinges the first time on the double pass surface, and/or prevents that light portions being a result of such reflections contribute to the intensity distribution in the pupil surface.

公开(公告)号：US09910359B2

公开(公告)日：2018-03-06

申请号：US15086475

申请日：2016-03-31

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Deguenther ,  Vladimir Davydenko ,  Thomas Korb ,  Frank Schlesener ,  Stefanie Hilt ,  Wolfgang Hoegele

IPC: G03F7/20 ,  G02B26/08

CPC classification number: G03F7/70058 ,  G02B26/0833 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70425

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a pupil forming unit directing light on a spatial light modulator that transmits or reflects impinging light in a spatially resolved manner. An objective images a light exit surface of the spatial light modulator on light entrance facets of an optical integrator so that an image of an object area on the light exit surface completely coincides with one of the light entrance facets. The pupil forming unit and the spatial light modulator are controlled so that the object area is completely illuminated by the pupil forming unit and projection light associated with a point in the object area is at least partially and variably prevented from impinging on the one of the light entrance facets.

公开(公告)号：US09804499B2

公开(公告)日：2017-10-31

申请号：US13932167

申请日：2013-07-01

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Deguenther

IPC: G03B27/72 ,  G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70116 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70191

Abstract: An illumination system of a microlithographic projection exposure apparatus comprises an optical integrator having a plurality of light entrance facets and a beam deflection array of reflective or transparent beam deflecting elements. Each beam deflecting element is configured to illuminate a spot on the optical integrator at a position that is variable by changing a deflection angle produced by the beam deflecting element. The illumination system further comprises a control unit which is configured to control the beam deflection elements in such a manner that a light pattern assembled from the spots on at least one of the light entrance facets is varied in response to an input command that a field dependency of the angular irradiance distribution in a mask plane shall be modified.

公开(公告)号：US20170102622A1

公开(公告)日：2017-04-13

申请号：US15383136

申请日：2016-12-19

Applicant: Carl Zeiss SMT GmbH

Inventor： Damian Fiolka ,  Markus Deguenther

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G02B7/008 ,  G02B27/286 ,  G03B27/72 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70891 ,  G03F7/70966

Abstract: A microlithography optical system includes a projection objective and an illumination system that includes a temperature compensated polarization-modulating optical element. The temperature compensated polarization-modulating optical element includes a first polarization-modulating optical element of optically active material, the first polarization-modulating optical element having a first specific rotation with a sign. The temperature compensated polarization-modulating optical element includes also includes a second polarization-modulating optical element of optically active material, the second polarization-modulating optical element having a second specific rotation with a sign opposite to the sign of the first specific rotation.

公开(公告)号：US09563129B2

公开(公告)日：2017-02-07

申请号：US14665420

申请日：2015-03-23

Applicant: Carl Zeiss SMT GmbH

Inventor： Johannes Wangler ,  Johannes Eisenmenger ,  Markus Deguenther ,  Michael Patra

IPC: G03B27/54 ,  G03F7/20 ,  G02B26/08 ,  G01B11/14 ,  G01M11/00

CPC classification number: G03F7/70033 ,  G01B11/14 ,  G01M11/005 ,  G02B26/0833 ,  G02B27/62 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/7085

Abstract: An EUV lithography system has an EUV beam path and a monitor beam path. The EUV beam path includes a mirror system having plurality of mirror elements, the orientations of which can be changed. The monitor beam path includes a monitor radiation source, a screen and a spatially resolving detector. The mirror system is arranged in the monitor beam path between the monitor radiation source and the screen.

Abstract translation: EUV光刻系统具有EUV光束路径和监视器光束路径。 EUV光束路径包括具有多个反射镜元件的反射镜系统，其方向可以改变。 监视器光束路径包括监视器辐射源，屏幕和空间分辨检测器。 镜子系统被布置在监视器辐射源和屏幕之间的监视器光束路径中。

公开(公告)号：US09500954B2

公开(公告)日：2016-11-22

申请号：US14543079

申请日：2014-11-17

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Deguenther ,  Vladimir Davydenko ,  Thomas Korb ,  Frank Schlesener ,  Stefanie Hilt ,  Wolfgang Hoegele

IPC: G03B27/54 ,  G03F7/20 ,  G02B26/08

CPC classification number: G03F7/70058 ,  G02B26/0833 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70425

Abstract: An illumination system of a microlithographic projection exposure apparatus includes an optical integrator having a plurality of light entrance facets each being associated with a secondary light source. A spatial light modulator has a light exit surface and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light on the spatial light modulator. An objective images the light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator. The light exit surface of the optical light modulator includes groups of object areas being separated by areas that are not imaged on the light entrance facets. The objective combines images of the object areas so that the images of the object areas abut on the optical integrator.

Abstract translation: 微光刻投影曝光装置的照明系统包括具有多个光入射面的光学积分器，每个光入射面与二次光源相关联。 空间光调制器具有光出射表面，并以空间分辨的方式透射或反射入射的投影光。 瞳孔形成单元将投射光引导到空间光调制器上。 目标将空间光调制器的光出射表面成像到光学积分器的光入射面上。 光学调制器的光出射表面包括由未在光入射面上成像的区域分离的物体区域组。 该目的将物体区域的图像合并，使得物体区域的图像抵接在光学积分器上。

公开(公告)号：US09494483B2

公开(公告)日：2016-11-15

申请号：US14494144

申请日：2014-09-23

Applicant: Carl Zeiss SMT GMBH

Inventor： Ralf Frese ,  Michael Samaniego ,  Markus Deguenther ,  Helmut Haidner ,  Rainer Hoch ,  Martin Schriever

IPC: G01J1/42 ,  G01M11/02 ,  G01M11/00 ,  G03F7/20

CPC classification number: G01M11/0207 ,  G01M11/005 ,  G03F7/706

Abstract: A measuring system (10) for measuring an imaging quality of an EUV lens (30) includes a diffractive test structure (26), a measurement light radiating device (16) which is configured to radiate measurement light (21) in the EUV wavelength range onto the test structure, a variation device (28) for varying at least one image-determining parameter of an imaging of the test structure that is effected by a lens, a detector (14) for recording an image stack including a plurality of images generated with different image-determining parameters being set, and an evaluation device (15) which is configured to determine the imaging quality of the lens from the image stack.

Abstract translation: 一种用于测量EUV透镜（30）的成像质量的测量系统（10）包括衍射测试结构（26），测量光辐射装置（16），其被配置为辐射EUV波长范围内的测量光（21） 变化装置（28），其用于改变由透镜实现的测试结构的成像的至少一个图像确定参数;用于记录包括产生的多个图像的图像堆叠的检测器（14） 设置不同的图像确定参数;以及评估装置（15），其被配置为从图像堆栈确定透镜的成像质量。