Invention Grant
- Patent Title: Measuring system for measuring an imaging quality of an EUV lens
- Patent Title (中): 用于测量EUV镜头成像质量的测量系统
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Application No.: US14494144Application Date: 2014-09-23
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Publication No.: US09494483B2Publication Date: 2016-11-15
- Inventor: Ralf Frese , Michael Samaniego , Markus Deguenther , Helmut Haidner , Rainer Hoch , Martin Schriever
- Applicant: Carl Zeiss SMT GMBH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Edell, Shapiro & Finnan, LLC
- Priority: DE102012204704 20120323
- Main IPC: G01J1/42
- IPC: G01J1/42 ; G01M11/02 ; G01M11/00 ; G03F7/20

Abstract:
A measuring system (10) for measuring an imaging quality of an EUV lens (30) includes a diffractive test structure (26), a measurement light radiating device (16) which is configured to radiate measurement light (21) in the EUV wavelength range onto the test structure, a variation device (28) for varying at least one image-determining parameter of an imaging of the test structure that is effected by a lens, a detector (14) for recording an image stack including a plurality of images generated with different image-determining parameters being set, and an evaluation device (15) which is configured to determine the imaging quality of the lens from the image stack.
Public/Granted literature
- US20150009492A1 Measuring System for Measuring an Imaging Quality of an EUV Lens Public/Granted day:2015-01-08
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