公开(公告)号：US09832855B2

公开(公告)日：2017-11-28

申请号：US14970402

申请日：2015-12-15

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  Daniel John William Brown ,  Alexander Anthony Schafgans ,  Palash Parijat Das

IPC: H05G2/00 ,  H01S3/00 ,  H01S3/223 ,  H01S3/23

CPC classification number: H05G2/008 ,  H01S3/0064 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2391 ,  H05G2/003

Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.

公开(公告)号：US20160007434A1

公开(公告)日：2016-01-07

申请号：US14325153

申请日：2014-07-07

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  John Tom Stewart, IV ,  Jordan Jur ,  Andrew LaForge ,  Daniel Brown ,  Jason M. Arcand ,  Alexander A. Schafgans ,  Michael A. Purvis

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/006

Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.

公开(公告)号：US08912514B2

公开(公告)日：2014-12-16

申请号：US14310972

申请日：2014-06-20

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  Robert J. Rafac ,  Igor V. Fomenkov ,  Daniel J. W. Brown ,  Daniel J. Golich

IPC: H01S3/10 ,  H01S3/13 ,  H05G2/00 ,  G21K5/02

CPC classification number: H05G2/008 ,  G21K5/02 ,  H01S3/10 ,  H05G2/005

Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.

公开(公告)号：US20140264087A1

公开(公告)日：2014-09-18

申请号：US13830461

申请日：2013-03-14

Applicant: ASML Netherlands B.V.

Inventor： Robert J. Rafac ,  Yezheng Tao

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/005

Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.

Abstract translation: 用于产生EUV光的技术包括将第一辐射脉冲引导到目标材料液滴以形成修改的液滴，所述第一辐射脉冲具有足以改变目标材料液滴形状的能量; 将第二脉冲的辐射引向修饰的液滴以形成吸收材料，第二脉冲的辐射具有足以改变改性液滴的性质的能量，该性质与辐射的吸收有关; 并且将放大的光束引向吸收材料，放大的光束具有足以将吸收材料的至少一部分转化成极紫外（EUV）光的能量。