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公开(公告)号：US20200305263A1
公开(公告)日：2020-09-24
申请号：US16840714
申请日：2020-04-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Alexander Anthony Schafgans , Palash Parijat Das
Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
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公开(公告)号：US09832855B2
公开(公告)日：2017-11-28
申请号：US14970402
申请日：2015-12-15
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Alexander Anthony Schafgans , Palash Parijat Das
CPC classification number: H05G2/008 , H01S3/0064 , H01S3/2232 , H01S3/2308 , H01S3/2391 , H05G2/003
Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
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Patent Agency Ranking
公开(公告)号：US12245350B2
公开(公告)日：2025-03-04
申请号：US18075589
申请日：2022-12-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Alexander Anthony Schafgans , Palash Parijat Das
Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
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公开(公告)号：US20230139746A1
公开(公告)日：2023-05-04
申请号：US18075589
申请日：2022-12-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Alexander Anthony Schafgans , Palash Parijat Das
Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
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公开(公告)号：US11553582B2
公开(公告)日：2023-01-10
申请号：US16840714
申请日：2020-04-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Alexander Anthony Schafgans , Palash Parijat Das
Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
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公开(公告)号：US20180063935A1
公开(公告)日：2018-03-01
申请号：US15790576
申请日：2017-10-23
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Alexander Anthony Schafgans , Palash Parijat Das
CPC classification number: H05G2/008 , H01S3/0064 , H01S3/2232 , H01S3/2308 , H01S3/2391 , H05G2/003
Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
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公开(公告)号：US20170099721A1
公开(公告)日：2017-04-06
申请号：US14970402
申请日：2015-12-15
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Alexander Anthony Schafgans , Palash Parijat Das
IPC: H05G2/00
CPC classification number: H05G2/008 , H01S3/0064 , H01S3/2232 , H01S3/2308 , H01S3/2391 , H05G2/003
Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
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