公开(公告)号：US5978071A

公开(公告)日：1999-11-02

申请号：US84211

申请日：1998-05-26

申请人： Hideyuki Miyajima ,  Susumu Makinouchi ,  Kazuya Ota

发明人： Hideyuki Miyajima ,  Susumu Makinouchi ,  Kazuya Ota

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/52 ,  G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70425 ,  G03F7/70716 ,  G03F9/70

摘要： A projection exposure apparatus for positioning, for each shot provided on a wafer, a pattern formed on a mask with respect to the wafer and also for exposing the pattern on the wafer includes a wafer stage carrying the wafer and movable stepwise for each shot, a mask stage carrying the mask and movable, a stage control unit for making relative positioning between the wafer and the pattern of the mask and maintaining the relative positioning so that the stage control unit moves the mask stage to make the relative positioning before the wafer stage stops for each shot, and an exposure control unit for performing exposure while the relative positioning is maintained.

摘要翻译： 一种投影曝光装置，用于对于在晶片上设置的每个镜头，定位相对于晶片在掩模上形成的图案以及用于使晶片上的图案曝光的投影曝光装置包括承载晶片的晶片台，并且每个镜头均可逐步移动， 携带掩模并可移动的掩模台，用于在晶片和掩模的图案之间进行相对定位并保持相对定位的台控制单元，使得台控制单元移动掩模台，以在晶片台停止之前进行相对定位 以及用于在保持相对定位的同时执行曝光的曝光控制单元。

公开(公告)号：US5714860A

公开(公告)日：1998-02-03

申请号：US555177

申请日：1995-11-08

申请人： Susumu Makinouchi

发明人： Susumu Makinouchi

IPC分类号： G12B5/00 ,  G03F7/20 ,  G05B19/23 ,  H01L21/027 ,  G05B13/00

CPC分类号： G03F7/70716 ,  G03F7/709 ,  G05B19/232 ,  G05B2219/37275 ,  G05B2219/41117 ,  G05B2219/41165 ,  G05B2219/41327 ,  G05B2219/41337 ,  G05B2219/45026

摘要： A stage device comprises a base, a movable member movably provided on the base, a damping system for giving a damping force to the movable member, a position detector for detecting a position of the movable member with respect to the base, a deviation detector for obtaining a deviation of a position of the movable member from a target position of the movable member on the base on the basis of a result of the detection by the position detector and a damping control system for changing the damping force in accordance with the deviation detected by the deviation detector.

摘要翻译： 舞台装置包括基座，可移动地设置在基座上的可动构件，用于向可动构件施加阻尼力的阻尼系统，用于检测可动构件相对于基座的位置的位置检测器，用于 基于位置检测器的检测结果，根据所检测到的偏差来改变阻尼力的阻尼控制系统，获得可移动部件的位置与基座上的可动部件的目标位置的偏差 通过偏差检测器。

公开(公告)号：US5446519A

公开(公告)日：1995-08-29

申请号：US186555

申请日：1994-01-26

申请人： Susumu Makinouchi

发明人： Susumu Makinouchi

IPC分类号： G03F9/00 ,  G03F7/20 ,  G12B5/00 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42

CPC分类号： G03F7/70716 ,  G03F7/709

摘要： A stage device is provided with a base plate supported by an antivibration device; a table supported by the base plate through a driving shaft in substantially rigid manner; and a first drive system for placing the table in a predetermined position on the base plate. A second drive systems is provided for applying, to the table, an acceleration the same as that of the base plate, in order to correct the relative positional aberration between the base plate and the table, induced by the vibration of the base plate generated when the table is driven by the first drive system.

摘要翻译： 舞台装置设置有由防振装置支撑的底板; 由基板以基本上刚性方式通过驱动轴支撑的工作台; 以及用于将桌子放置在基板上的预定位置的第一驱动系统。 提供第二驱动系统，用于向桌子施加与基板相同的加速度，以便校正由基板产生的基板的振动引起的基板和工作台之间的相对位置像差， 该表由第一个驱动系统驱动。

公开(公告)号：US08390780B2

公开(公告)日：2013-03-05

申请号：US12330119

申请日：2008-12-08

申请人： Susumu Makinouchi ,  Toru Imai ,  Akihiro Watanabe

发明人： Susumu Makinouchi ,  Toru Imai ,  Akihiro Watanabe

IPC分类号： G03B27/42

CPC分类号： G01D5/38 ,  G01D5/266 ,  G03F7/70716 ,  G03F7/70775

摘要： A moving grating is arranged on a side of a wafer stage, a light source irradiates a light to the moving grating, diffracted lights generated from the moving grating are interfered by fixed scales and an index scale of which positional relation with the light source is fixed, and a detection instrument detects the interfered light. In this case, since the moving grating is arranged on a side of the wafer stage, upsizing of the entire wafer stage can be suppressed. Further, since interference occurs between a plurality of diffracted lights (e.g., the ±1st-order diffracted light) passing extremely close optical paths, influence caused by a fluctuation of ambient atmosphere becomes less in comparison to conventional interferometers, and thus, a high-precision measurement of positional information of the movable body is possible.

摘要翻译： 移动光栅布置在晶片台的一侧，光源将光照射到移动光栅，由移动光栅产生的衍射光被固定的刻度干扰，并且与光源的位置关系固定的折射率 并且检测仪器检测被干扰的光。 在这种情况下，由于移动光栅布置在晶片台的一侧，因此可以抑制整个晶片台的大型化。 此外，由于在通过非常接近的光路的多个衍射光（例如±1级衍射光）之间发生干涉，所以与常规干涉仪相比，由环境大气的波动引起的影响变小， 移动体的位置信息的精度测量是可能的。

公开(公告)号：US07961289B2

公开(公告)日：2011-06-14

申请号：US11355965

申请日：2006-02-17

申请人： Hiroyuki Nagasaka ,  Yuuki Ishii ,  Susumu Makinouchi

发明人： Hiroyuki Nagasaka ,  Yuuki Ishii ,  Susumu Makinouchi

IPC分类号： G03B27/52

摘要： An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of the projection optical system, exposes the substrate, the exposure apparatus includes: a liquid supply system that supplies the liquid onto the substrate and a liquid recovery system that recovers the liquid having been supplied on the substrate. When the exposure light is being irradiated on the image plane side of the projection optical system, the liquid recovery system does not perform recovery of the liquid.

公开(公告)号：US20100171030A1

公开(公告)日：2010-07-08

申请号：US12726023

申请日：2010-03-17

申请人： Susumu MAKINOUCHI

发明人： Susumu MAKINOUCHI

IPC分类号： G01D5/26 ,  G01D5/12

CPC分类号： G01D5/34707 ,  G01B7/14 ,  G01D5/2451

摘要： An encoder apparatus comprises a first scale member with a scale region on which a scale is arranged; a detector that detects light from the scale region; and a retaining member with a retaining surface that is arranged so as to face a surface of the first scale member including the scale region via a predetermined gap, and that retains a liquid at least between the retaining surface and the first scale member.

摘要翻译： 编码器装置包括具有刻度区域的第一标尺部件，刻度尺布置在其上; 检测来自刻度区域的光的检测器; 以及具有保持面的保持构件，其被配置为经由预定间隙面对包括刻度区域的第一刻度尺的表面，并且至少在保持表面和第一刻度构件之间保持液体。

公开(公告)号：US20090262321A1

公开(公告)日：2009-10-22

申请号：US12366934

申请日：2009-02-06

申请人： Susumu MAKINOUCHI

发明人： Susumu MAKINOUCHI

IPC分类号： G03B27/54 ,  G01B11/14 ,  G03B27/32

CPC分类号： G01D5/34746 ,  G01D5/38 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

摘要： A mirror block on which moving gratings are arranged is fixed to the lower surface of a stage. Fixed gratings are placed on the upper surface of a stage platform that is opposed to the lower surface of the stage. A Y encoder that measures Y positional information of the stage is configured including the moving gratings and the fixed gratings. Similarly, an X encoder that measures X positional information of the stage is configured including the moving gratings and the fixed grating.

摘要翻译： 安置有移动光栅的镜块固定在舞台的下表面。 固定光栅放置在与平台的下表面相对的平台平台的上表面上。 测量台的Y位置信息的Y编码器被配置为包括移动光栅和固定光栅。 类似地，测量台阶X的位置信息的X编码器被配置成包括移动光栅和固定光栅。

公开(公告)号：US20070267571A1

公开(公告)日：2007-11-22

申请号：US11798255

申请日：2007-05-11

申请人： Susumu Makinouchi ,  Toru Imai ,  Akihiro Watanabe

发明人： Susumu Makinouchi ,  Toru Imai ,  Akihiro Watanabe

IPC分类号： G01D5/34

CPC分类号： G01D5/38

摘要： When an incident light is obliquely incident on an index scale, the optical path length of light A becomes longer than the optical path length of light B and an optical path length difference occurs, which causes a phase difference in both of the diffracted lights incident on a photodetection element. According to the phase difference, intensity of a photoelectric detection signal output from the photodetection element changes. That is, due to a periodic change in the incident angle of the incident light, the phase difference between light A and light B is modulated, and the interference signal becomes greatly modulated.

摘要翻译： 当入射光倾斜地入射到指数刻度上时，光A的光程长度比光B的光路长度长，并且产生光程长度差，导致入射到的两个衍射光的相位差 光电检测元件。 根据相位差，从光检测元件输出的光电检测信号的强度变化。 也就是说，由于入射光的入射角度的周期性变化，光A和光B之间的相位差被调制，并且干扰信号变得很大地被调制。

公开(公告)号：US06633363B1

公开(公告)日：2003-10-14

申请号：US09662340

申请日：2000-09-14

申请人： Susumu Makinouchi

发明人： Susumu Makinouchi

IPC分类号： G03B2742

CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F7/70725 ,  G03F9/70

摘要： A scanning exposure apparatus and method for synchronously moving a mask and a substrate with respect to an exposing radiation flux to project an image of a mask pattern on the mask onto the substrate, includes an alignment sensor detecting the initial rotational angle of the mask relative to the substrate, a mask position detector, a substrate position detector, a calculation unit processing the position signals of the mask and the substrate in accordance with the projection ratio of the projection optical system and the initial rotational angle of the mask relative to the substrate to derive a positional deviation of the mask stage relative to the substrate stage, and a controller controlling the mask stage movement and the substrate stage movement to eliminate the positional deviation.

摘要翻译： 一种扫描曝光装置和方法，用于相对于曝光辐射通量同步移动掩模和衬底，以将掩模上的掩模图案的图像投影到衬底上，包括对准传感器，其检测掩模相对于掩模的初始旋转角度 基板，掩模位置检测器，基板位置检测器，计算单元，根据投影光学系统的投影比和掩模相对于基板的初始旋转角度对掩模和基板的位置信号进行处理， 导出掩模台相对于基板台的位置偏移，以及控制掩模台移动和基板台移动以消除位置偏差的控制器。

公开(公告)号：US06490025B1

公开(公告)日：2002-12-03

申请号：US09039562

申请日：1998-03-16

申请人： Susumu Makinouchi ,  Masato Takahashi

发明人： Susumu Makinouchi ,  Masato Takahashi

IPC分类号： G03B2742

CPC分类号： G03F7/70358 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70833 ,  G03F7/709

摘要： An exposure apparatus for projecting an image pattern on a mask onto a photosensitive substrate, including: a body including a projecting optical system through which the image pattern is projected from the mask to the photosensitive substrate; a first stage movable to the body and adapted to mount the mask; a second stage movable to the body and adapted to mount the photosensitive substrate; a measuring device for measuring the position of either one of the mask mounted on the first stage and the photosensitive substrate mounted on the second stage; a vibration sensor for measuring vibration of the body; and a position controller for controlling the position of either one of the mask mounted on the first stage and the photosensitive substrate mounted on the second stage based on a measurement value of the vibration sensor and a measurement value of the measuring device.

摘要翻译： 一种用于将掩模上的图像图案投影到感光基板上的曝光装置，包括：主体，包括投影光学系统，图像图案通过该投影光学系统从掩模投射到感光基板; 可移动到身体并适于安装面罩的第一阶段; 第二阶段，其可移动到所述主体并且适于安装所述感光基板; 测量装置，用于测量安装在第一平台上的掩模中的任一个和安装在第二平台上的感光基板的位置; 用于测量身体振动的振动传感器; 以及位置控制器，用于基于所述振动传感器的测量值和所述测量装置的测量值来控制安装在所述第一平台上的所述掩模中的任一个和安装在所述第二平台上的感光基板的位置。