公开(公告)号：US20210292919A1

公开(公告)日：2021-09-23

申请号：US17259610

申请日：2019-07-08

Applicant: Siemens Energy Global GmbH & Co. KG

Inventor： Thomas Purucker ,  Stephan Rückert ,  Jochen Straub ,  Peter Utz

IPC: C25B1/04 ,  C25B13/00 ,  C25B9/23 ,  C25B15/08 ,  C25B9/05 ,  C25B9/70

Abstract: An electrolysis unit and to a method for electrochemically decomposing water into hydrogen and oxygen. The electrolysis unit has at least two electrolysis modules. The electrolysis unit also has exactly one first gas separation device for a first product gas including oxygen and exactly one second gas separation device for a second product gas including hydrogen. The first gas separation device is connected to the at least two electrolysis modules by respective first lines. The second gas separation device is connected to the at least two electrolysis modules by respective second lines. The at least two first lines have the same first length. The at least two second lines likewise have the same second length.

公开(公告)号：US10655240B2

公开(公告)日：2020-05-19

申请号：US15968192

申请日：2018-05-01

Applicant: Lam Research Corporation

Inventor： Stephen J. Banik ,  Bryan L. Buckalew ,  Gabriel Hay Graham ,  Alfred Bostick ,  Sean Wilbur ,  John Floyd Ostrowski

IPC: C25B9/08 ,  C25B9/10 ,  C25B11/03 ,  C25B9/18 ,  C25B13/00 ,  C25B15/00 ,  C25B9/16 ,  C25D21/04 ,  C25D21/14 ,  C25D5/08

Abstract: An electroplating apparatus includes an electrode at the bottom of a chamber, an ionically resistive element with through holes arranged horizontally at the top of the chamber, with a membrane in the middle. One or more panels extend vertically and parallelly from the membrane to the element and extend linearly across the chamber, forming a plurality of regions between the membrane and the element. A substrate with a protuberance extending along a chord of the substrate and contacting a top surface of the element is arranged above a first region. An electrolyte flowed between the substrate and the element descends into the first region via the through holes on a first side of the protuberance and ascends from the first region via the through holes on a second side of the protuberance, forcing air bubbles out from a portion of the element associated with the first region.

公开(公告)号：US20170175277A1

公开(公告)日：2017-06-22

申请号：US15316641

申请日：2015-06-04

Applicant: SunFire GmbH

Inventor： Christian von Olshausen ,  Joerg Brabandt ,  Dirk Schaarmann

IPC: C25B1/12 ,  C25B1/10 ,  C25B13/00 ,  C25B15/02 ,  C25B15/08 ,  C25B9/10 ,  C25B9/18

CPC classification number: C25B1/12 ,  C25B1/00 ,  C25B1/10 ,  C25B9/08 ,  C25B9/10 ,  C25B9/18 ,  C25B13/00 ,  C25B15/02 ,  C25B15/08 ,  Y02E60/366

Abstract: The invention relates to an electrolysis method comprising an electrolysis cell (4), which method uses at least one recirculating flushing medium (50, 60). The invention further relates to an electrolysis system, in particular for carrying out the electrolysis method.

公开(公告)号：US09540737B2

公开(公告)日：2017-01-10

申请号：US14778627

申请日：2014-03-26

Applicant: Ohio University

Inventor： Gerardine G. Botte

IPC: C25B1/00 ,  C25B11/04 ,  C25B9/08 ,  C25B13/00

CPC classification number: C25B1/00 ,  C25B9/08 ,  C25B11/04 ,  C25B11/0473 ,  C25B11/0478 ,  C25B13/00

Abstract: A method is provided for an electrochemical synthesis of ammonia in alkaline media. The method electrolytically converts N2 and H2 to NH3 in an electrochemical cell comprising an anode, a cathode, and an alkaline electrolyte. The method includes exposing an anode to a H2-containing fluid, wherein the anode is active toward adsorption and oxidation of H2; exposing a cathode to a N2-containing fluid, wherein the cathode is active toward adsorption and reduction of N2 to form NH3; and applying a voltage between the anode and the cathode so as to facilitate adsorption of hydrogen onto the anode and adsorption of nitrogen onto the cathode; wherein the voltage is sufficient to simultaneously oxidize the H2 and reduce the N2. The electrolytic method is performed with the H2 and N2 pressures from about 10 atmospheres (atm) to about 1 atm; and at temperatures from about 25° C. to about 205° C.

Abstract translation: 提供了一种在碱性介质中电化学合成氨的方法。 该方法在包括阳极，阴极和碱性电解质的电化学电池中将N 2和H 2电解转化成NH 3。 该方法包括将阳极暴露于含H 2的流体中，其中阳极对H2的吸附和氧化是有活性的; 将阴极暴露于含N2的流体中，其中阴极对吸附和还原N 2有活性以形成NH 3; 并且在阳极和阴极之间施加电压，以便促进氢吸附到阳极上并将氮气吸附到阴极上; 其中电压足以同时氧化H 2并还原N 2。 电解方法用H2和N2压力从约10大气压（atm）至约1atm进行; 并且在约25℃至约205℃的温度下

公开(公告)号：US09418823B2

公开(公告)日：2016-08-16

申请号：US14019877

申请日：2013-09-06

Applicant: Sputtering Components, Inc.

Inventor： Daniel Theodore Crowley ,  Patrick Lawrence Morse ,  John Robert German

IPC: C23C14/00 ,  C25B11/00 ,  C25B13/00 ,  H01J37/34

CPC classification number: H01J37/3455 ,  H01J37/345 ,  H01J37/347 ,  H01J37/3476 ,  H01J37/3479

Abstract: A magnetron assembly for a rotary target cathode comprises a rigid support structure, a magnet bar structure movably attached to the rigid support structure, and at least one actuation mechanism coupled to the rigid support structure and configured to change a distance of the magnet bar structure from a surface of a rotatable target cylinder. The magnetron assembly also includes a position indicating mechanism operative to measure a position of the magnet bar structure relative to the surface of the rotatable target cylinder. A communications device is configured to receive command signals from outside of the magnetron assembly and transmit information signals to outside of the magnetron assembly.

Abstract translation: 用于旋转目标阴极的磁控管组件包括刚性支撑结构，可移动地附接到刚性支撑结构的磁棒结构，以及联接到刚性支撑结构并被配置为改变磁棒结构与轴承结构的距离的至少一个致动机构 可旋转目标气缸的表面。 磁控管组件还包括位置指示机构，其可操作以测量磁棒结构相对于可旋转目标气缸的表面的位置。 通信设备被配置为从磁控管组件的外部接收命令信号，并将信息信号发送到磁控管组件的外部。

公开(公告)号：US09299544B2

公开(公告)日：2016-03-29

申请号：US13334859

申请日：2011-12-22

Applicant: Tetsuya Endo

Inventor： Tetsuya Endo

IPC: C23C14/00 ,  C25B11/00 ,  C25B13/00 ,  H01J37/34 ,  C23C14/34 ,  C23C14/35

CPC classification number: H01J37/3455 ,  C23C14/3407 ,  C23C14/35 ,  H01J37/3405 ,  H01J37/3435

Abstract: A sputtering apparatus includes a target electrode capable of mounting a target, a first support member which supports the target electrode, a magnet unit which forms a magnetic field on a surface of the target, a second support member which supports the magnet unit, and a force generation portion which is provided between the first support member and the second support member, and generates a second force in a direction opposite to a first force that acts on the second support member by an action of the magnetic field formed between the target and the magnet unit, wherein the second force has a magnitude which increases as the magnet unit comes closer to the target electrode.

Abstract translation: 溅射装置包括能够安装靶的目标电极，支撑目标电极的第一支撑构件，在靶的表面上形成磁场的磁体单元，支撑磁体单元的第二支撑构件，以及 力产生部分，其设置在第一支撑构件和第二支撑构件之间，并且通过形成在目标和第二支撑构件之间的磁场的作用沿与第二支撑构件作用的第一力相反的方向产生第二力 磁体单元，其中所述第二力具有随着所述磁体单元靠近所述目标电极而增加的大小。

公开(公告)号：US09051649B2

公开(公告)日：2015-06-09

申请号：US13792882

申请日：2013-03-11

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Pao-Tsung Lai ,  Chia-Chiun Chen ,  Ching-Chung Cheng ,  Chi-Feng Chen

IPC: C23C14/00 ,  C25B11/00 ,  C25B13/00 ,  C23C14/54 ,  H01L21/285 ,  H01L21/67 ,  H01L21/677

CPC classification number: C23C14/541 ,  C23C14/564 ,  H01L21/2855 ,  H01L21/67017 ,  H01L21/67109 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/67745

Abstract: Provided is a physical vapor deposition apparatus with one or multiple deposition chambers for depositing films on substrates. The deposition chambers includes a heater and various cooling features to cool the chamber, the heater and the substrate. The sidewalls and top of the chamber are cooled by a cooling feature. The heater includes a cooling plate. A fitted heated cover is disposed between the heater and the substrate. A cooling pipe delivers a coolant throughout the cooling plate and extends in a high spatial density throughout the surface of the cooling plate. The cooling pipe occupies an area of about 14-20% of the area of the cooling plate and no location on the cooling plate surface is greater than about 15-20 mm from the cooling pipe. The cooling pipe cools the heater rapidly and enables deposition operations of long duration and using high power to be carried out.

Abstract translation: 提供了具有一个或多个沉积室的物理气相沉积设备，用于在基底上沉积膜。 沉积室包括加热器和用于冷却室，加热器和基板的各种冷却特征。 室的侧壁和顶部由冷却特征冷却。 加热器包括一个冷却板。 在加热器和基板之间设置一个装配的加热盖。 冷却管在整个冷却板处输送冷却剂，并在冷却板的整个表面上以高空间密度延伸。 冷却管占据冷却板面积的约14-20％的面积，冷却板表面上的位置不大于冷却管约15-20mm。 冷却管快速冷却加热器，实现长时间的沉积操作，并实施高功率。

公开(公告)号：US08999119B2

公开(公告)日：2015-04-07

申请号：US13702443

申请日：2011-08-26

Applicant: Kenichi Tokuhiro ,  Takaiki Nomura ,  Kazuhito Hato ,  Noboru Taniguchi ,  Takahiro Suzuki ,  Satoru Tamura

Inventor： Kenichi Tokuhiro ,  Takaiki Nomura ,  Kazuhito Hato ,  Noboru Taniguchi ,  Takahiro Suzuki ,  Satoru Tamura

IPC: C25B1/04 ,  C25B1/02 ,  C25B9/00 ,  C25B9/06 ,  C25B9/08 ,  C25B9/10 ,  C25B13/00 ,  C25B11/02 ,  C25B15/00 ,  C25B11/04 ,  C01B3/04 ,  C25B1/00 ,  C25B11/03 ,  B01J35/00

CPC classification number: C25B11/0442 ,  B01J35/004 ,  C01B3/042 ,  C25B1/003 ,  C25B9/08 ,  C25B11/03 ,  Y02E60/364 ,  Y02E60/368

Abstract: The hydrogen production device of the present invention includes: a first electrode including a conductive substrate and a photocatalytic semiconductor layer; a second electrode that is electrically connected to the first electrode and disposed in a second region opposite to a first region relative to the first electrode; the first region is defined as a region on a side of a surface of the first electrode in which the photocatalytic semiconductor layer is provided; a water-containing electrolyte solution; and a housing containing these. The first electrode is provided with first through-holes and the second electrode is provided with second through-holes; and the first through-holes and second through-holes form a communicating hole for allowing the first region and the second region to communicate with each other. An ion exchange membrane having substantially the same shape as the communicating hole is disposed in the communicating hole to close the communicating hole.

Abstract translation: 本发明的氢制造装置包括：第一电极，其包括导电性基板和光催化性半导体层; 第二电极，其电连接到第一电极并且设置在相对于第一电极与第一区域相反的第二区域中; 第一区域被定义为设置有光催化半导体层的第一电极的表面侧的区域; 含水电解质溶液; 和包含这些的房屋。 第一电极设置有第一通孔，第二电极设置有第二通孔; 并且第一通孔和第二通孔形成用于使第一区域和第二区域彼此连通的连通孔。 具有与连通孔大致相同形状的离子交换膜设置在连通孔中以闭合连通孔。

公开(公告)号：US08888968B2

公开(公告)日：2014-11-18

申请号：US14178878

申请日：2014-02-12

Applicant: GTA, Inc.

Inventor： Elias Stanley Greenbaum

IPC: C25B1/10 ,  C25B9/08 ,  C25B11/02 ,  C25B13/00 ,  C02F1/461

CPC classification number: C25B11/02 ,  C02F1/46104 ,  C02F2201/46115 ,  C25B1/10 ,  C25B9/00 ,  C25B9/08 ,  C25B13/00 ,  C25B13/02 ,  Y02E60/366 ,  Y10T29/49108 ,  Y10T29/4911

Abstract: An apparatus for the electrolytic splitting of water into hydrogen and oxygen gases is disclosed. The apparatus comprises: (i) a first hemi-enclosure; (ii) a second hemi-enclosure; (iii) a diaphragm electrode array positioned between the first hemi-enclosure and the second hemi-enclosure comprising: (a) a diaphragm, that passes ions and impedes the passage of gases, comprising a first side and a second opposed side; (b) a first plurality of electrodes in a first vicinity of the first side of the diaphragm; and (c) a second plurality of electrodes in a second vicinity of the second opposed side of the diaphragm; (iv) a fastener, for leak-tight fastening of the first hemi-enclosure, the diaphragm electrode array, and the second hemi-enclosure, whereby a leak-tight enclosure is formed; (v) contacts, for electrically powering the first and second pluralities of electrodes, and; (vi) pathways, configured to remove hydrogen and oxygen gases from the enclosure.

Abstract translation: 公开了一种用于将水分解成氢气和氧气的装置。 该装置包括：（i）第一半封闭装置; （ii）第二半封闭物; （iii）位于所述第一半封壳和所述第二半封闭壳体之间的隔膜电极阵列，包括：（a）使离子并阻止气体通过的隔膜，包括第一侧和第二相对侧; （b）在隔膜的第一侧的第一附近的第一多个电极; 和（c）在隔膜的第二相对侧的第二附近的第二多个电极; （iv）紧固件，用于密封第一半壳体，隔膜电极阵列和第二半壳体的紧密紧固，由此形成防漏外壳; （v）用于为第一和第二多个电极供电的触点，以及 （vi）构造成从外壳去除氢气和氧气的路径。

公开(公告)号：US08663439B2

公开(公告)日：2014-03-04

申请号：US11719229

申请日：2005-11-04

Applicant: Atsushi Nakamura ,  Masataka Yahagi ,  Akihisa Inoue ,  Hisamichi Kimura ,  Shin-ichi Yamaura

Inventor： Atsushi Nakamura ,  Masataka Yahagi ,  Akihisa Inoue ,  Hisamichi Kimura ,  Shin-ichi Yamaura

IPC: C25B9/00 ,  C25B13/00 ,  C25B11/00 ,  C23C14/00 ,  H01B1/06 ,  H05B7/085 ,  C22C1/04 ,  C22C1/06 ,  C22C33/02

CPC classification number: C23C14/3414 ,  B01D67/0072 ,  B01D71/022 ,  B01D2325/04 ,  B22F2998/10 ,  B22F2999/00 ,  C01B3/503 ,  C01B3/505 ,  C22C5/04 ,  C22C9/00 ,  C22C16/00 ,  C22C19/03 ,  C22C19/07 ,  C22C45/001 ,  C22C45/003 ,  C22C45/02 ,  C22C45/04 ,  C22C45/10 ,  B22F9/082 ,  B22F3/10 ,  B22F2201/11

Abstract: A sputtering target for producing a metallic glass membrane characterized in comprising a structure obtained by sintering atomized powder having a composition of a ternary compound system or greater with at least one or more metal elements selected from Pd, Zr, Fe, Co, Cu and Ni as its main component (component of greatest atomic %), and being an average grain size of 50 μm or less. The prepared metallic glass membrane can be used as a substitute for conventional high-cost bulk metallic glass obtained by quenching of molten metal. This sputtering target for producing the metallic glass membrane is also free from problems such as defects in the metallic glass membrane and unevenness of composition, has a uniform structure, can be produced efficiently and at low cost, and does not generate many nodules or particles. Further provided is a method for manufacturing such a sputtering target for forming the metallic glass membrane.