Optical modulating device, beam steering device, and system employing the same

    公开(公告)号:US11237452B2

    公开(公告)日:2022-02-01

    申请号:US15683879

    申请日:2017-08-23

    Abstract: An optical modulating device, a beam steering device, and a system employing the same are provided. The optical modulating device includes an active layer, a driver configured to electrically control a refraction index of the active layer, and a nano-antenna disposed on the active layer, and having a dual nano-antenna structure including a first nano-antenna and a second nano-antenna, the first nano-antenna having a length different from a length of the second nano-antenna, and the first nano-antenna being spaced apart from the second nano-antenna. The driver includes a first driver electrically connected to the first nano-antenna, and a second driver electrically connected to the second nano-antenna.

    OPTICAL MODULATING DEVICE AND OPTICAL APPARATUS EMPLOYING THE SAME

    公开(公告)号:US20210405500A1

    公开(公告)日:2021-12-30

    申请号:US17101200

    申请日:2020-11-23

    Abstract: Provided is an optical modulating device including an incidence optical system, an optical modulating assembly including a plurality of nano-antennas that form a meta-grating based on a driving signal, the optical modulating assembly being configured to change a traveling direction of incidence light incident at an incidence angle from the incidence optical system based on an effective displacement of the meta-grating according to the driving signal, and an emission optical system configured to emit light steered by the optical modulating assembly, wherein the emission optical system is further configured to emit first-order diffraction light of the incidence light based on the meta-grating.

    MQW devices and methods for semiconductor patterning systems

    公开(公告)号:US10168622B2

    公开(公告)日:2019-01-01

    申请号:US15628611

    申请日:2017-06-20

    Abstract: MQW devices, IC chips and methods may be used in semiconductor lithography patterning systems. An MQW device includes an array of pixels that have transmission elements and associated support circuits. The support circuits have preliminary memory cells and final memory cells. The final memory cells store transmittance values that control transmittances of the associated transmission elements. This way, exposure of a target with a lithography system for purposes of patterning the target may be performed through the transmission elements according to the controlled transmittances, while subsequent transmittance values are being received by the preliminary memory cells from memory banks. The exposure of the target therefore needs to pause for less time, in order to wait for the MQW device to be refreshed with the subsequent transmittance values. Accordingly the whole semiconductor lithography patterning system may operate faster and thus have more throughput.

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