ELECTRONIC DEVICE AND CONTROL METHOD THEREOF

    公开(公告)号:US20210279589A1

    公开(公告)日:2021-09-09

    申请号:US17258617

    申请日:2019-05-10

    Abstract: Disclosed is an electronic device. The electronic device comprises a storage in which sample data and a matrix included in an artificial intelligence model which is trained on the basis of the sample data are stored, and a processor, wherein the processor is configured to: on the basis of the sizes of a plurality of elements included in the matrix, obtain a first matrix pruned by converting values of elements in the number corresponding to a first proportion to zero values; on the basis of test data, obtain first accuracy of an artificial intelligence model including the first matrix; if the first accuracy is within a preset range with respect to a preset value, retrain the artificial intelligence model including the first matrix on the basis of the sample data; and, on the basis of the sizes of a plurality of elements included in the retrained first matrix, obtain a second matrix pruned by converting values of elements in the number corresponding to a second proportion, which is greater than the first proportion, to zero values.

    ELECTRONIC APPARATUS AND METHOD FOR CONTROLLING THEREOF

    公开(公告)号:US20210271981A1

    公开(公告)日:2021-09-02

    申请号:US17171582

    申请日:2021-02-09

    Abstract: An electronic apparatus performing an operation of a neural network model is provided. The electronic apparatus includes a memory configured to store weight data including quantized weight values of the neural network model; and a processor configured to obtain operation data based on input data and binary data having at least one bit value different from each other, generate a lookup table by matching the operation data with the binary data, identify operation data corresponding to the weight data from the lookup table, and perform an operation of the neural network model based on the identified operation data.

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20200035678A1

    公开(公告)日:2020-01-30

    申请号:US16592330

    申请日:2019-10-03

    Abstract: Disclosed are semiconductor devices and methods of manufacturing the same. The semiconductor device comprises a first transistor on a substrate, and a second transistor on the substrate. Each of the first and second transistors includes a plurality of semiconductor patterns vertically stacked on the substrate and vertically spaced apart from each other, and a gate dielectric pattern and a work function pattern filling a space between the semiconductor patterns. The work function pattern of the first transistor includes a first work function metal layer, the work function pattern of the second transistor includes the first work function metal layer and a second work function metal layer, the first work function metal layer of each of the first and second transistors has a work function greater than that of the second work function metal layer, and the first transistor has a threshold voltage less than that of the second transistor.

Patent Agency Ranking