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21.发明申请COMPOSITION OF PREPARING POLY(IMIDE-BENZOXASOLE) COPOLYMER, POLY(IMIDE-BENZOXASOLE) COPOLYMER, ARTICLE CONTAINING POLY(IMIDE-BENZOXASOLE) COPOLYMER, AND DISPLAY DEVICE INCLUDING SAME 审中-公开制备聚（二苯基苯甲酸酯）共聚物，聚（咪唑烷基苯甲酸酯）共聚物的组合物，含有聚（二苯基苯甲酸酯）共聚物的制品和包括其的显示装置公开(公告)号：US20160237214A1
公开(公告)日：2016-08-18
申请号：US14879287
申请日：2015-10-09
发明人： Sung Woo HONG , Byung-hee SOHN , Sun Jin SONG , Chanjae AHN , Kyeong-sik JU , Sungwon CHOI
IPC分类号： C08G73/22
CPC分类号： C08G73/22 , C08G73/1039 , C08G73/1042 , C08G73/1067 , C08G73/1085 , C08G73/14
摘要： A composition for preparing poly(imide-benzoxazole) copolymer is described, where the copolymer include: a tetracarboxylic acid dianhydride represented by Chemical Formula 1, a diamine represented by Chemical Formula 2, and a diamine represented by Chemical Formula 3: wherein definitions of groups and variables in Chemical Formulae 1 to 3 are the same as described in the specification.
摘要翻译： 描述了用于制备聚（酰亚胺 - 苯并恶唑）共聚物的组合物，其中共聚物包括：由化学式1表示的四羧酸二酐，由化学式2表示的二胺和由化学式3表示的二胺：其中基团 并且化学式1至3中的变量与说明书中描述的相同。
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公开(公告)号：US20200255597A1
公开(公告)日：2020-08-13
申请号：US16783288
申请日：2020-02-06
发明人： Ha Na KIM , Yoon Seok KO , Hyun Seok CHOI , Ju Hyun KIM , Byunghee SOHN , Sungwon CHOI
摘要： A poly(imide-amide) copolymer or its precursor includes two ends and a main chain located between the two ends, and includes a group represented by Chemical Formula 1 at one end, and a structural unit represented by Chemical Formula 7, and at least one of a structural unit represented by Chemical Formula 2 or a structural unit represented by Chemical Formula 3 in the main chain: wherein, in Chemical Formulae 1, 2, 3, and 7, R1 and Ar1 to Ar4 are the same as defined in the detailed description.
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23.发明公开公开(公告)号：US20240043592A1
公开(公告)日：2024-02-08
申请号：US18068365
申请日：2022-12-19
发明人： Minsang KIM , Haengdeog KOH , Yoonhyun KWAK , Chanjae AHN , Jungha CHAE , Sungwon CHOI , Minyoung HA
IPC分类号： C08F220/18 , C07C381/12 , G03F7/039 , G03F7/038 , C08F212/14
CPC分类号： C08F220/1807 , C07C381/12 , G03F7/039 , G03F7/038 , C08F212/24
摘要： Provided are a polymer including a repeating unit represented by Formula 1, a photoresist composition including the polymer, and a method of forming a pattern by using the photoresist composition:
wherein the details of R11, L11, a11, A11−, and B11+in Formula 1 are provided in the present specification.-
公开(公告)号：US20220171284A1
公开(公告)日：2022-06-02
申请号：US17238355
申请日：2021-04-23
发明人： Eunkyung LEE , Sumin KIM , Hyunwoo KIM , Juhyeon PARK , Giyoung SONG , Sukkoo HONG , Yoonhyun KWAK , Youngmin NAM , Byunghee SOHN , Sunyoung LEE , Aram JEON , Sungwon CHOI
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C07C381/12 , C07C309/12 , C07D333/76
摘要： Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.
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25.发明公开公开(公告)号：US20230324791A1
公开(公告)日：2023-10-12
申请号：US18313555
申请日：2023-05-08
发明人： Eunkyung LEE , Sumin KIM , Hyunwoo KIM , Juhyeon PARK , Giyoung SONG , Sukkoo HONG , Yoonhyun KWAK , Youngmin NAM , Byunghee SOHN , Sunyoung LEE , Aram JEON , Sungwon CHOI
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C07C309/12 , C07D333/76 , C07C381/12
CPC分类号： G03F7/0045 , C07C309/12 , C07C381/12 , C07D333/76 , G03F7/038 , G03F7/039 , C07C2603/74
摘要： Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:
wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.-
26.发明公开公开(公告)号：US20240327338A1
公开(公告)日：2024-10-03
申请号：US18483895
申请日：2023-10-10
发明人： Aram JEON , Hana KIM , Beomseok KIM , Hoyoon PARK , Kyuhyun IM , Jinwon JEON , Sungwon CHOI
IPC分类号： C07C309/58 , C07C309/42 , G03F7/004 , G03F7/029 , G03F7/20
CPC分类号： C07C309/58 , C07C309/42 , G03F7/0045 , G03F7/0048 , G03F7/029 , G03F7/2004
摘要： Provided are an organic salt represented by Formula 1, a resist composition including the same, and a method of forming a pattern by using the same:
A11+B11− Formula 1
wherein, in Formula 1,
A11+ is represented by Formula 1A, and B11− is represented by Formula 1B,
wherein descriptions of R11 to R13, L21, L22, a21, a22, R21, R22, Rf, b22, c11 and n11 in Formulae 1A and 1B are provided herein.-
公开(公告)号：US20240319595A1
公开(公告)日：2024-09-26
申请号：US18612246
申请日：2024-03-21
发明人： Hoyoon PARK , Haengdeog KOH , Yoonhyun KWAK , Minsang KIM , Beomseok KIM , Hana KIM , Hyeran KIM , Chanjae AHN , Kyuhyun IM , Sungwon CHOI
IPC分类号： G03F7/039
CPC分类号： G03F7/039
摘要： Provided are a photoreactive polymer compound including a first repeating unit represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:
A description of Formula 1 is provided herein.-
公开(公告)号：US20240319594A1
公开(公告)日：2024-09-26
申请号：US18493192
申请日：2023-10-24
发明人： Chanjae AHN , Cheol KANG , Minsang KIM , Beomseok KIM , Changki KIM , Hana KIM , Hyeran KIM , Changheon LEE , Sungwon CHOI , Hyunseok CHOI
IPC分类号： G03F7/039 , C08F212/14 , C08F220/18 , G03F7/038
CPC分类号： G03F7/039 , C08F212/24 , C08F212/28 , C08F220/1806 , C08F220/1807 , G03F7/038
摘要： Provided are a resist composition and a pattern forming method using the same. The resist composition includes a polymer including a first repeating unit repeating unit Formula 1, a photoacid generator, and an organic solvent.
In Formula 1, L11 to L13, a11 to a13, A11 to A13, R11 to R14, b12 to b14, and p are the same as described in the detailed description.-
公开(公告)号：US20240231225A1
公开(公告)日：2024-07-11
申请号：US18325465
申请日：2023-05-30
发明人： Haengdeog KOH , Yoonhyun KWAK , Mijeong KIM , Youngmin NAM , Chanjae AHN , Changheon LEE , Kyuhyun IM , Sungwon CHOI , Sunghyun HAN
CPC分类号： G03F7/0044 , G03F7/2004 , G03F7/32
摘要： Provided are a resist composition and a pattern forming method using the same. The resist composition may include an organometallic compound represented by Formula 1 below and a polymer repeating unit represented by Formula 2 below.
In Formulas 1 and 2, descriptions of M11, R11, R12, n, A21, L21 to L24, a21 to a24, R21, R22, b22, p, and X21 refer to the specification.-
30.发明公开公开(公告)号：US20240124635A1
公开(公告)日：2024-04-18
申请号：US18164841
申请日：2023-02-06
发明人： Minsang KIM , Haengdeog KOH , Yoonhyun KWAK , Beomseok KIM , Chanjae AHN , Jungha CHAE , Sungwon CHOI
IPC分类号： C08F228/06 , G03F7/038 , G03F7/20
CPC分类号： C08F228/06 , G03F7/038 , G03F7/2004
摘要： Provided are a polymer, a resist composition including the same, and a method of forming a pattern using the resist composition, the polymer including one or more of a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2, and free of a repeating unit of which a structure changes by an acid:
In Formulae 1 and 2, R11 to R16, b12, X−, R21 to R24, b22, and Y are as described in the specification.
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