公开(公告)号：US20160209327A1

公开(公告)日：2016-07-21

申请号：US15083946

申请日：2016-03-29

Applicant: KLA-Tencor Corporation

Inventor： Tzahi Grunzweig ,  Alexander Svizher

IPC: G01N21/47 ,  G06F17/50

Abstract: A scatterometry metrology system, configured to measure diffraction signals from at least one target having respective at least one measurement direction, the scatterometry metrology system having at least one field stop having edges which are slanted with respect to the at least one measurement direction.

Abstract translation: 散射测量系统，被配置为测量来自具有相应的至少一个测量方向的至少一个目标的衍射信号，所述散射测量计量系统具有至少一个具有相对于所述至少一个测量方向倾斜的边缘的场停止。

公开(公告)号：US09080971B2

公开(公告)日：2015-07-14

申请号：US14516540

申请日：2014-10-16

Applicant: KLA-Tencor Corporation

Inventor： Daniel Kandel ,  Vladimir Levinski ,  Alexander Svizher ,  Joel Seligson ,  Andrew Hill ,  Ohad Bachar ,  Amnon Manassen ,  Yung-Ho Alex Chuang ,  Ilan Sela ,  Moshe Markowitz ,  Daria Negri ,  Efraim Rotem

IPC: G01N21/47 ,  G01B11/02 ,  G03F7/20 ,  G01N21/956 ,  G01N21/95 ,  G01B11/06 ,  G01N21/21

CPC classification number: G01N21/47 ,  G01B11/02 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/4792 ,  G01N2201/06113 ,  G01N2201/105 ,  G03F7/70625 ,  G03F7/70633

Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.

Abstract translation: 提供了各种计量系统和方法。 一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到 在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。 测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。 此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。