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公开(公告)号：US08136212B2
公开(公告)日：2012-03-20
申请号：US12061512
申请日：2008-04-02
Applicant: Yoshitaka Zaitsu , Chienliu Chang , Masao Majima
Inventor： Yoshitaka Zaitsu , Chienliu Chang , Masao Majima
IPC: H04R17/00
CPC classification number: G02B26/0841 , B81C1/00634 , B81C2201/0101 , Y10T29/42 , Y10T29/49005 , Y10T29/49124 , Y10T29/49165 , Y10T29/49609
Abstract: A structure fabricating method plastically deforms a target portion of a substrate, to thereby fabricate a structure having an inclined segment that is inclined relative to a principal surface of the substrate. The method includes forming a projection on the target portion to project from the principal surface of the substrate or from an opposing surface of the substrate on the side opposite to the principal surface, and applying a force to the projection to plastically deform the target portion such that the target portion is bent in a direction from one surface of the substrate on the side where the projection is formed, toward another surface on the side opposite to the one surface.
Abstract translation: 结构制造方法使基板的目标部分塑性变形，从而制造具有相对于基板的主表面倾斜的倾斜段的结构。 所述方法包括在所述目标部分上形成突出部，从所述基板的主表面或与所述基板的与所述主表面相反的一侧的相对表面突出，并且向所述突起施加力以使所述目标部分塑性变形 目标部分沿着从形成有突起的一侧的基板的一个表面朝向与该一个表面相对的一侧的另一表面的方向弯曲。
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公开(公告)号：US08087153B2
公开(公告)日：2012-01-03
申请号：US12489315
申请日：2009-06-22
Applicant: Ayako Kato , Chienliu Chang
Inventor： Ayako Kato , Chienliu Chang
IPC: G01R3/00
CPC classification number: H04R31/00 , Y10T29/49005 , Y10T29/49007 , Y10T29/4908 , Y10T29/49137 , Y10T29/49155
Abstract: A handling member is prepared that provides a channel that can withstand subsequent back face processing as to a substrate having elements made up of a substrate and a membrane, and the handling member is fixed to the substrate so that at least a portion within the elements are supported by the handling member. This provides a manufacturing method wherein the physical strength of an element at the time of manufacturing an electromechanical transducing apparatus is strengthened, and the handling member is easily detached in a short time after processing of the element.
Abstract translation: 制备处理构件，其提供能够承受对由具有由基板和膜构成的元件的基板的后续后处理的通道，并且处理构件固定到基板，使得元件内的至少一部分为 由处理构件支撑。 这提供了一种制造方法，其中在制造机电换能装置时元件的物理强度得到加强，并且处理构件在元件处理后的短时间内容易地分离。
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公开(公告)号：US08087152B2
公开(公告)日：2012-01-03
申请号：US12488590
申请日：2009-06-22
Applicant: Ayako Kato , Chienliu Chang
Inventor： Ayako Kato , Chienliu Chang
IPC: G01R3/00
CPC classification number: B81C1/0038 , B81C2201/0194 , Y10T29/49005 , Y10T29/49007 , Y10T29/49009 , Y10T29/4908
Abstract: A groove is formed on a handling member, on a face to be fixed to an element, the groove making up a portion of a channel that externally communicates in the state of being fixed to the element. The handling member is fixed so that the cleavage direction of the vibrating membrane and the edge direction of the groove of the handling member intersect. Thus, the probability that a membrane will break during handling or processing of the substrate is reduced, and the handling member can be quickly removed from the substrate.
Abstract translation: 沟槽形成在处理构件上，待固定在元件上的表面上，沟槽构成固定在元件上的外部沟槽的一部分。 处理构件被固定成使得振动膜的解理方向和处理构件的槽的边缘方向相交。 因此，减少在处理或处理衬底期间膜会破裂的可能性，并且处理构件可以快速地从衬底移除。
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公开(公告)号：US08082651B2
公开(公告)日：2011-12-27
申请号：US12173158
申请日：2008-07-15
Applicant: Yoshitaka Zaitsu , Chienliu Chang , Masao Majima
Inventor： Yoshitaka Zaitsu , Chienliu Chang , Masao Majima
CPC classification number: B81C1/00174 , B81B2203/058 , Y10T29/4902 , Y10T29/49861 , Y10T29/49904 , Y10T29/49922
Abstract: A micro-structure fabrication method fabricates a micro-structure including an inclined part inclined to a principal plane of a substrate by plastically deforming a work piece having the substrate with the principal plane. The structure fabrication method includes the steps of providing in the work piece a projection configured to protrude from a first surface and away from the principal plane of the substrate, and bending the work piece toward a second surface opposite to the first surface. The bending is accomplished by applying a force on a block including an inclined pressure plane that is abutted on the projection for plastically deforming the work piece, in which in bending the work piece, the direction of a first force applied on the work piece intersects with the direction of a second force of the inclined pressure plane pushing the projection.
Abstract translation: 微结构制造方法通过使具有主平面的基板的工件塑性变形来制造微结构，该微结构包括倾斜部分，其倾斜于基板的主平面。 该结构制造方法包括以下步骤：在工件中设置突起，该突起被构造成从第一表面突出并远离基板的主平面，并且将工件朝向与第一表面相对的第二表面弯曲。 弯曲是通过在包括倾斜压力平面的块上施加力来实现的，所述倾斜压力平面抵靠在突出部上，用于使工件塑性变形，其中在弯曲工件时，施加在工件上的第一力的方向与 推动突起的倾斜压力平面的第二力的方向。
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公开(公告)号：US20110305822A1
公开(公告)日：2011-12-15
申请号：US13114567
申请日：2011-05-24
Applicant: Yoshihiro Hasegawa , Chienliu Chang , Yuichi Masaki
Inventor： Yoshihiro Hasegawa , Chienliu Chang , Yuichi Masaki
CPC classification number: C25F3/02 , B06B1/0292
Abstract: This invention includes energizing an electrode in which the surface facing a cavity is exposed as one electrode for electrolytic etching and the other electrode provided at the outside and contacting an electrolytic etching solution to perform electrolytic etching of a sacrificial layer to form a cavity. Thereafter, a removal agent is introduced from an etching hole to reduce residues of the sacrificial layer due to the electrolytic etching.
Abstract translation: 本发明包括使面向空腔的表面露出的电极通电，作为电解蚀刻用的一个电极，另一个电极设置在外部，并与电解蚀刻溶液接触以进行牺牲层的电解蚀刻以形成空腔。 此后，从蚀刻孔引入去除剂，以减少由于电解蚀刻而导致的牺牲层的残留。
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Patent Agency Ranking
公开(公告)号：US20110095645A1
公开(公告)日：2011-04-28
申请号：US12673232
申请日：2008-09-19
Applicant: Chienliu Chang
Inventor： Chienliu Chang
CPC classification number: B06B1/0292 , Y10T29/49005
Abstract: In an electromechanical transducer which includes a vibration membrane provided with an upper electrode, a substrate provided with a lower electrode, and a support member adapted to support the vibration membrane in such a manner that a gap is formed between the vibration membrane and the substrate with these electrodes being arranged in opposition to each other, it is constructed such that a part of the vibration membrane and a region of the substrate are in contact with each other, and a remaining region of the vibration membrane other than the contact region is able to vibrate. There is an overlap region of the first electrode and second electrode in the contact region, and at least one of these electrodes has a through portion formed therethrough in at least a part of the overlap region.
Abstract translation: 在包括设置有上电极的振动膜的机电换能器中，设置有下电极的基板和适于以振动膜和基板之间形成间隙的方式支撑振动膜的支撑构件， 这些电极彼此相对地布置，其构造使得振动膜的一部分和基板的区域彼此接触，并且除了接触区域之外的振动膜的剩余区域能够 颤动。 在接触区域中存在第一电极和第二电极的重叠区域，并且这些电极中的至少一个具有在重叠区域的至少一部分中穿过其形成的通孔。
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公开(公告)号：US20110062439A1
公开(公告)日：2011-03-17
申请号：US12948683
申请日：2010-11-17
Applicant: Chienliu Chang
Inventor： Chienliu Chang
IPC: H01L29/786
CPC classification number: H01L29/7869 , H01L27/1296 , H01L29/78603
Abstract: In the present invention, a thin film transistor is formed on a plastic film substrate (1) having anisotropy of thermal shrinkage rate or coefficient of thermal expansion in in-plane directions of the substrate. A channel is formed such that the direction (7) in which the thermal shrinkage rate or the coefficient of thermal expansion of the substrate is largest is nonparallel to the direction (8) of a current flowing through the channel of the thin film transistor. Then, a thin film transistor having stable and uniform electrical characteristics, which is formed on the plastic film substrate, is provided.
Abstract translation: 在本发明中，在具有基板的面内方向的热收缩率或热膨胀系数的各向异性的塑料薄膜基板（1）上形成薄膜晶体管。 形成通道，使得其中热收缩率或基板的热膨胀系数最大的方向（7）与流过薄膜晶体管的沟道的电流的方向（8）不平行。 然后，提供形成在塑料薄膜基板上的具有稳定均匀电特性的薄膜晶体管。
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公开(公告)号：US20100207484A1
公开(公告)日：2010-08-19
申请号：US12678365
申请日：2008-09-19
Applicant: Chienliu Chang
Inventor： Chienliu Chang
IPC: B06B1/02
CPC classification number: B06B1/0292 , Y10T29/49005
Abstract: In an electromechanical transducer which includes a vibration membrane provided with an upper electrode, a substrate provided with a lower electrode, and a support member adapted to support the vibration membrane in such a manner that a gap is formed between the vibration membrane and the substrate with these electrodes being arranged in opposition to each other, it is constructed such that a part of the vibration membrane and a region of the substrate are kept in contact with each other without application of an external force, and a remaining region of the vibration membrane other than its region in which the contact state is kept is able to vibrate.
Abstract translation: 在包括设置有上电极的振动膜的机电换能器中，设置有下电极的基板和适于以振动膜和基板之间形成间隙的方式支撑振动膜的支撑构件， 这些电极彼此相对布置，其构造使得振动膜的一部分和基板的区域在不施加外力的情况下保持彼此接触，并且其余的区域的振动膜其他 比其保持接触状态的区域能够振动。
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公开(公告)号：US20090315217A1
公开(公告)日：2009-12-24
申请号：US12486749
申请日：2009-06-18
Applicant: Yoshitaka Zaitsu , Chienliu Chang , Masao Majima , Hironobu Maeda
Inventor： Yoshitaka Zaitsu , Chienliu Chang , Masao Majima , Hironobu Maeda
IPC: B29C53/84
CPC classification number: B81C1/00634 , B81B2201/033 , B81B2201/042 , B81B2203/019 , G02B26/0833 , Y10T29/49833 , Y10T29/49861 , Y10T29/49908
Abstract: In a method of fabricating a structure by plastically deforming a processing portion provided at a movable segment, a restraint segment configured to restrain movement of the movable segment is provided before an external force is applied to the processing portion. After processing of the processing portion is completed, the restraint segment is removed.
Abstract translation: 在通过使设置在可移动部分处的处理部分发生塑性变形来制造结构的方法中，在对加工部分施加外力之前，设置限制可动部分的移动的约束部分。 在处理部分的处理完成之后，约束段被去除。
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公开(公告)号：US20090149030A1
公开(公告)日：2009-06-11
申请号：US12305099
申请日：2006-08-01
Applicant: Chienliu Chang
Inventor： Chienliu Chang
IPC: H01L21/306
CPC classification number: H01L31/1804 , C09K13/04 , C09K13/06 , H01L29/78693 , H01L31/022475 , H01L31/022483 , Y02E10/547 , Y02P70/521
Abstract: There is provided an etching method of an amorphous oxide layer containing In and at least one of Ga and Zn, which includes etching the amorphous oxide layer using an etchant containing any one of acetic acid, citric acid, hydrochloric acid, and perchloric acid.
Abstract translation: 提供了包含In和Ga和Zn中的至少一种的无定形氧化物层的蚀刻方法，其包括使用含有任何一种乙酸，柠檬酸，盐酸和高氯酸的蚀刻剂来蚀刻无定形氧化物层。
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