公开(公告)号：US20140377692A1

公开(公告)日：2014-12-25

申请号：US14303738

申请日：2014-06-13

Applicant: CARL ZEISS SMT GMBH

Inventor： Michael Patra ,  Markus Deguenther

IPC: G03F1/38 ,  G03F7/20

CPC classification number: G03F1/38 ,  G03F1/42 ,  G03F1/68 ,  G03F7/70058 ,  G03F7/70475

Abstract: A mask for microlithography comprises a substrate; a first pattern area on the substrate, the first pattern area comprising a first pattern extending over a first length in a mask scanning direction and a first width in a direction perpendicular to the mask scan direction; and a second pattern area on the substrate adjacent to the first pattern area in the mask scanning direction, the second pattern area comprising a second pattern extending over a second length in the mask scanning direction and a second width identical to the first width in the direction perpendicular to the mask scan direction.

Abstract translation: 用于微光刻的掩模包括基底; 所述第一图案区域包括在掩模扫描方向上在第一长度上延伸的第一图案和在垂直于所述掩模扫描方向的方向上的第一宽度; 以及在掩模扫描方向上与第一图案区域相邻的基板上的第二图案区域，第二图案区域包括在掩模扫描方向上延伸第二长度的第二图案和与沿着掩模扫描​​方向的第一长度相同的第二宽度 垂直于掩模扫描方向。

公开(公告)号：US20140043665A1

公开(公告)日：2014-02-13

申请号：US14044048

申请日：2013-10-02

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Deguenther

IPC: G02B26/08

CPC classification number: G02B26/08 ,  G02B26/0808 ,  G02B26/0816 ,  G03F7/70058

Abstract: An illumination system of a microlithographic projection exposure apparatus comprises an optical raster plate having a light entrance surface. An irradiance distribution on the light entrance surface determines an angular light distribution of projection light when it impinges on a mask to be illuminated. The illumination system further comprises a control unit and a spatial light modulator which produces on the light entrance surface of the optical raster plate a plurality of light spots whose positions can be varied. At least some of the light spots have, along a reference direction (X), a spatial irradiance distribution comprising a portion in which the irradiance varies periodically with a spatial period P.

Abstract translation: 微光刻投影曝光装置的照明系统包括具有光入射面的光栅板。 光入射表面上的辐照度分布决定了投影光照射在要照明的掩模上时的角度光分布。 照明系统还包括控制单元和空间光调制器，其在光栅板的光入射表面上产生可以改变其位置的多个光点。 至少一些光点沿着参考方向（X）具有空间辐照度分布，其包括辐射度随着空间周期P周期性变化的部分。

公开(公告)号：US20130293862A1

公开(公告)日：2013-11-07

申请号：US13933159

申请日：2013-07-02

Applicant: Carl Zeiss SMT GmbH

Inventor： Damian Fiolka ,  Markus Deguenther

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G02B7/008 ,  G02B27/286 ,  G03B27/72 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70891 ,  G03F7/70966

Abstract: A microlithography optical system includes a projection objective and an illumination system that includes a temperature compensated polarization-modulating optical element. The temperature compensated polarization-modulating optical element includes a first polarization-modulating optical element of optically active material, the first polarization-modulating optical element having a first specific rotation with a sign. The temperature compensated polarization-modulating optical element includes also includes a second polarization-modulating optical element of optically active material, the second polarization-modulating optical element having a second specific rotation with a sign opposite to the sign of the first specific rotation.

Abstract translation: 微光刻光学系统包括投影物镜和包括温度补偿偏振调制光学元件的照明系统。 温度补偿偏振调制光学元件包括光学活性材料的第一偏振调制光学元件，第一偏振调制光学元件具有带符号的第一特定旋转。 温度补偿偏振调制光学元件还包括光学活性材料的第二偏振调制光学元件，第二偏振调制光学元件具有与第一特定旋转的符号相反的符号的第二特定旋转。

公开(公告)号：US11262660B2

公开(公告)日：2022-03-01

申请号：US16987504

申请日：2020-08-07

Applicant: Carl Zeiss SMT GmbH

Inventor： Jan Horn ,  Ulrich Bihr ,  Andy Zott ,  Markus Deguenther

IPC: G03F7/20

Abstract: An image sensor for a position sensor apparatus for ascertaining a position of at least one mirror of a lithography apparatus includes: a plurality of integrated optical waveguides; a plurality of incoupling areas; a multiplexer apparatus; and an image reconstruction apparatus.

公开(公告)号：US20210263420A1

公开(公告)日：2021-08-26

申请号：US17315885

申请日：2021-05-10

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Deguenther

IPC: G03F7/20

Abstract: In an optical system for a projection exposure apparatus, the angle space of the illumination radiation of the projection optical unit at the reticle is twice as large in a first direction as the angle space of the illuminating radiation of the illuminating optical unit.

公开(公告)号：US11061334B2

公开(公告)日：2021-07-13

申请号：US16921841

申请日：2020-07-06

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Deguenther

IPC: G03F7/20

Abstract: In an optical system for a projection exposure apparatus, the angle space of the illumination radiation of the projection optical unit at the reticle is twice as large in a first direction as the angle space of the illuminating radiation of the illuminating optical unit.

公开(公告)号：US11003086B2

公开(公告)日：2021-05-11

申请号：US16924702

申请日：2020-07-09

Applicant: Carl Zeiss SMT GmbH

Inventor： Stig Bieling ,  Markus Deguenther

IPC: G03F7/20

Abstract: An illumination optical unit for projection lithography illuminates an object field. The illumination optical unit has an optical rod with an entrance area and an exit area for illumination light. The optical rod is configured so that the illumination light is mixed and homogenized at lateral walls of the optical rod by multiple in-stances of total internal reflection. At least one correction area serves to correct a field dependence of an illumination angle distribution when illuminating the object field. The correction area is disposed in the region of the exit area of the optical rod. This can result in an illumination optical unit, in which an unwanted field dependence of a specified illumination angle distribution is reduced or entirely avoided, even in the case of illumination angle distributions with illumination angles deviating extremely from a normal incidence on the object field.

公开(公告)号：US10599041B2

公开(公告)日：2020-03-24

申请号：US14529844

申请日：2014-10-31

Applicant: Carl Zeiss SMT GmbH

Inventor： Stig Bieling ,  Markus Deguenther ,  Johannes Wangler

IPC: G03B27/54 ,  G03F7/20 ,  G02B19/00 ,  G02B17/00 ,  G02B5/08 ,  G02B5/18

Abstract: Illumination optical unit for illuminating an object field in a projection exposure apparatus, comprising a first facet mirror with a structure, which has a spatial frequency of at least 0.2 mm−1 in at least one direction, and a second facet mirror, comprising a multiplicity of facets, wherein the facets are respectively provided with a mechanism for damping spatial frequencies of the structure of the first facet mirror.

公开(公告)号：US10394129B2

公开(公告)日：2019-08-27

申请号：US16208662

申请日：2018-12-04

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Deguenther ,  Stig Bieling

IPC: G03F7/20 ,  F21V8/00

Abstract: A microlithographic illumination unit for post-exposure of a photoresist provided on a wafer in a microlithography process, has at least one light source and a light-guiding and light-mixing element for coupling the electromagnetic radiation generated by the light source into the photoresist. This light-guiding and light-mixing element has a first pair of mutually opposite side faces, the maximum spacing of which has a first value. Multiple reflections of the electromagnetic radiation on these side faces take place, wherein the light-guiding and light-mixing element has a second pair of mutually opposite side faces, the maximum spacing of which has a second value. The maximum extent of the light-guiding and light-mixing element in the light propagation direction of the electromagnetic radiation has a third value. This third value is greater than the first value and is smaller than the second value.

公开(公告)号：US10254466B2

公开(公告)日：2019-04-09

申请号：US15608390

申请日：2017-05-30

Applicant: Carl Zeiss SMT GmbH

Inventor： Christian Wald ,  Stefan Schaff ,  Markus Deguenther ,  Daniel Runde

IPC: G02B6/26 ,  F21V8/00 ,  G02B27/09 ,  G03F7/20

Abstract: An optical waveguide serves for guiding illumination light. The waveguide has a waveguide main body for guiding the illumination light between a main body entrance region and a main body exit region. At least one coupling-out device is provided in the main body exit region. Via the coupling-out device, at least one coupling-out illumination light partial beam is coupled out from the illumination light emerging from the waveguide main body. This is done such that the coupling-out illumination light partial beam can be separated from the rest of the illumination light beam emerging from the waveguide main body. This results in a waveguide having improved possibilities for use when guiding illumination light.