公开(公告)号：US10663866B2

公开(公告)日：2020-05-26

申请号：US15270072

申请日：2016-09-20

Applicant: ASML Netherlands B.V.

Inventor： Alexander Anthony Schafgans ,  Igor Vladimirovich Fomenkov ,  Yezheng Tao ,  Rostislav Rokitski ,  Robert Jay Rafac ,  Daniel John William Brown ,  Cory Alan Stinson

IPC: G03F7/20 ,  G02B5/28 ,  G02B5/20 ,  G02B27/14 ,  G02B27/42 ,  H01S3/00 ,  H01S3/23 ,  H01S3/223

Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.