公开(公告)号：US11232930B2

公开(公告)日：2022-01-25

申请号：US17212307

申请日：2021-03-25

Applicant: APPLIED Materials, Inc.

Inventor： Morgan Evans ,  Charles T. Carlson ,  Rutger Meyer Timmerman Thijssen ,  Ross Bandy ,  Ryan Magee

IPC: H01J37/305 ,  G02B5/18 ,  H01L21/3065 ,  H01L21/308 ,  B81C1/00

Abstract: A carrier proximity mask and methods of assembling and using the carrier proximity mask may include providing a first carrier body, second carrier body, and set of one or more clamps. The first carrier body may have one or more openings formed as proximity masks to form structures on a first side of a substrate. The first and second carrier bodies may have one or more contact areas to align with one or more contact areas on a first and second sides of the substrate. The set of one or more clamps may clamp the substrate between the first carrier body and the second carrier body at contact areas to suspend work areas of the substrate between the first and second carrier bodies. The openings to define edges to convolve beams to form structures on the substrate.

公开(公告)号：US20210210307A1

公开(公告)日：2021-07-08

申请号：US16734746

申请日：2020-01-06

Applicant: APPLIED Materials, Inc.

Inventor： Costel Biloiu ,  Michael Honan ,  Robert B. Vopat ,  David Blahnik ,  Charles T. Carlson ,  Frank Sinclair ,  Paul Murphy

IPC: H01J37/30 ,  H01J37/317

Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

公开(公告)号：US11985756B2

公开(公告)日：2024-05-14

申请号：US17505977

申请日：2021-10-20

Applicant: Applied Materials, Inc.

Inventor： Robert B. Vopat ,  Charles T. Carlson

IPC: H05H7/22 ,  H01J37/317 ,  H05H9/00

CPC classification number: H05H7/22 ,  H01J37/3171 ,  H05H9/00 ,  H01J2237/0473 ,  H01J2237/141 ,  H01J2237/31701

Abstract: Embodiments herein are directed to a linear accelerator assembly for an ion implanter, wherein the linear accelerator includes a jacketed resonator coil. In some embodiments, a linear accelerator assembly may include a first fluid conduit and a coil resonator coupled to the first fluid conduit, wherein the coil resonator is operable to receive a first fluid via the first fluid conduit, wherein the coil resonator comprises a first coil conduit adjacent a second coil conduit, and wherein a first fluid channel defined by the first coil conduit is operable to receive the first fluid.

公开(公告)号：US20240064888A1

公开(公告)日：2024-02-22

申请号：US17980894

申请日：2022-11-04

Applicant: Applied Materials, Inc.

Inventor： Robert B. Vopat ,  Charles T. Carlson

IPC: H05H9/00 ,  H01J37/317 ,  H05H7/18

CPC classification number: H05H9/00 ,  H01J37/3171 ,  H05H7/18

Abstract: An apparatus may include a resonator chamber, arranged in a vacuum enclosure; an RF electrode assembly, arranged within the vacuum enclosure; and a resonator coil, disposed within the resonator chamber, the resonator coil having a high voltage end, directly connected to at least one RF electrode of the RF electrode assembly.

公开(公告)号：US11443973B2

公开(公告)日：2022-09-13

申请号：US16922727

申请日：2020-07-07

Applicant: Applied Materials, Inc.

Inventor： Jason M. Schaller ,  Luke Bonecutter ,  Charles T. Carlson ,  Rajkumar Thanu ,  Karuppasamy Muthukamatchi ,  Jeff Hudgens ,  Benjamin Riordon

IPC: H01L21/68 ,  H01L21/687 ,  B65G47/90 ,  H01L21/67

Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft counter-rotatable with the first shaft. The transfer apparatus may include an eccentric hub extending at least partially through the central hub, and which is radially offset from a central axis of the central hub. The transfer apparatus may also include an end effector coupled with the eccentric hub. The end effector may include a plurality of arms having a number of arms equal to the number of substrate supports of the plurality of substrate supports.

公开(公告)号：US20210013084A1

公开(公告)日：2021-01-14

申请号：US16922727

申请日：2020-07-07

Applicant: Applied Materials, Inc.

Inventor： Jason M. Schaller ,  Luke Bonecutter ,  Charles T. Carlson ,  Rajkumar Thanu ,  Karuppasamy Muthukamatchi ,  Jeff Hudgens ,  Benjamin Riordon

IPC: H01L21/687 ,  H01L21/67 ,  B65G47/90

Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft counter-rotatable with the first shaft. The transfer apparatus may include an eccentric hub extending at least partially through the central hub, and which is radially offset from a central axis of the central hub. The transfer apparatus may also include an end effector coupled with the eccentric hub. The end effector may include a plurality of arms having a number of arms equal to the number of substrate supports of the plurality of substrate supports.

公开(公告)号：US12279359B2

公开(公告)日：2025-04-15

申请号：US18431579

申请日：2024-02-02

Applicant: Applied Materials, Inc.

Inventor： David T. Blahnik ,  Charles T. Carlson ,  Robert B. Vopat ,  Frank Sinclair ,  Paul J. Murphy ,  Krag R. Senior

IPC: H05H7/22

Abstract: Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, a LINAC may include a coil resonator and a plurality of drift tubes coupled to the coil resonator by a set of flexible leads.

公开(公告)号：US12170220B2

公开(公告)日：2024-12-17

申请号：US17940369

申请日：2022-09-08

Applicant: Applied Materials, Inc.

Inventor： Jason M. Schaller ,  Luke Bonecutter ,  Charles T. Carlson ,  Rajkumar Thanu ,  Karuppasamy Muthukamatchi ,  Jeff Hudgens ,  Benjamin Riordon

IPC: H01L21/67 ,  B65G47/90 ,  H01L21/687

Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft counter-rotatable with the first shaft. The transfer apparatus may include an eccentric hub extending at least partially through the central hub, and which is radially offset from a central axis of the central hub. The transfer apparatus may also include an end effector coupled with the eccentric hub. The end effector may include a plurality of arms having a number of arms equal to the number of substrate supports of the plurality of substrate supports.

公开(公告)号：US11825590B2

公开(公告)日：2023-11-21

申请号：US17473015

申请日：2021-09-13

Applicant: Applied Materials, Inc.

Inventor： William Davis Lee ,  Charles T. Carlson

IPC: H05H9/04 ,  H05H7/22 ,  H05H7/00

CPC classification number: H05H9/042 ,  H05H7/001 ,  H05H7/22 ,  H05H2007/007 ,  H05H2007/222

Abstract: A drift tube may include a middle portion, arranged as a hollow cylinder, and coupled to receive an RF voltage signal. The drift tube may include a first end portion, adjacent to and electrically connected to the middle portion. The middle portion and the first end portion may define a central opening to conduct an ion beam therethrough, along a direction of beam propagation. The first end portion may include a first focus assembly, and a second focus assembly, where the first focus assembly and the second focus assembly are movable with respect to one another along the direction of beam propagation, from a first configuration to a second configuration.

公开(公告)号：US11812539B2

公开(公告)日：2023-11-07

申请号：US17506185

申请日：2021-10-20

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  David T. Blahnik ,  Wai-Ming Tam ,  Charles T. Carlson ,  Frank Sinclair

IPC: H05H7/02 ,  H05H7/12 ,  H05H9/00

CPC classification number: H05H7/02 ,  H05H7/12 ,  H05H9/00 ,  H05H2007/025

Abstract: An exciter for a high frequency resonator. The exciter may include an exciter coil inner portion, extending along an exciter axis, an exciter coil loop, disposed at a distal end of the exciter coil inner portion. The exciter may also include a drive mechanism, including at least a rotation component to rotate the exciter coil loop around the exciter axis.