公开(公告)号：US20240096715A1

公开(公告)日：2024-03-21

申请号：US18520369

申请日：2023-11-27

Applicant: APPLIED MATERIALS, INC.

Inventor： Keith Berding ,  Blake Erickson ,  Soumendra Barman ,  Zhaozhao Zhu

IPC: H01L21/66 ,  H01J37/32 ,  H01L21/3213

CPC classification number: H01L22/26 ,  H01J37/32963 ,  H01L21/32136 ,  H01L21/32139 ,  H01J2237/334

Abstract: An article includes a device, a first layer deposited on a surface of the device, and a second layer deposited on the first layer. The first layer includes a first sense material deposited on a first portion of the surface and a second sense material deposited on a second portion of the surface. The second layer includes a first etch material deposited on the first sense material and a second etch material deposited on the second sense material. Responsive to the second layer being etched during an etch process performed at a processing chamber of an electronics processing system, at least one of the first sense material or the second sense material can be detected at the surface of the device.

公开(公告)号：US20230298872A1

公开(公告)日：2023-09-21

申请号：US17696791

申请日：2022-03-16

Applicant: Applied Materials, Inc.

Inventor： Jeffrey Yat Shan Au ,  Joshua Thomas Maher ,  Varoujan Chakarian ,  Sidharth Bhatia ,  Patrick Tae ,  Zhaozhao Zhu ,  Blake W. Erickson

IPC: H01J37/32

CPC classification number: H01J37/32972 ,  H01J37/32926 ,  H01J2237/334

Abstract: A method includes receiving, by a processing device, first sensor data indicating a state of a wall corresponding to a first processing chamber. The first sensor data includes optical spectral data. The method further includes determining, by the processing device, a first value based on the first sensor data. The first value corresponds to a first amount of a product disposed along a surface of the wall at a first time. The method further includes determining, by the processing device, a first update to a first process operation associated with the first processing chamber based on the first value. The method further includes performing, by the processing device, one or more of (i) preparing a notification indicating the first update for presentation on a graphical user interface (GUI), or (ii) causing performance of the first process operation in accordance with the first update.

公开(公告)号：US20230258500A1

公开(公告)日：2023-08-17

申请号：US18138914

申请日：2023-04-25

Applicant: Applied Materials, Inc.

Inventor： Blake Erickson ,  Keith Berding ,  Michael Kutney ,  Zhaozhao Zhu ,  Tsung Feng Wu ,  Michael D. Willwerth ,  Jeffrey Ludwig

IPC: G01J3/32 ,  G01J3/02 ,  G01N21/25 ,  G01N21/68 ,  G01N21/95

CPC classification number: G01J3/32 ,  G01J3/0291 ,  G01N21/255 ,  G01N21/68 ,  G01N21/9501

Abstract: An apparatus includes a base component and a plurality of collimators housed within the base component. Each collimator of the plurality of collimators corresponds to a respective location of a plurality of locations of a wafer in an etch chamber. The plurality of locations includes a center location of the wafer, a plurality of inner ring locations along an inner ring of the wafer associated with a first set of radially symmetric optical emission spectroscopy (OES) signal sampling paths, and a plurality of outer ring locations along an outer ring of the wafer associated with a second set of radially symmetric OES signal sampling paths.

公开(公告)号：US11668602B2

公开(公告)日：2023-06-06

申请号：US17234940

申请日：2021-04-20

Applicant: Applied Materials, Inc.

Inventor： Blake Erickson ,  Keith Berding ,  Michael Kutney ,  Zhaozhao Zhu ,  Tsung Feng Wu ,  Michael D. Willwerth ,  Jeffrey Ludwig

IPC: G01J3/32 ,  G01J3/02 ,  G01N21/25 ,  G01N21/68 ,  G01N21/95

CPC classification number: G01J3/32 ,  G01J3/0291 ,  G01N21/255 ,  G01N21/68 ,  G01N21/9501

Abstract: An apparatus includes a base component and collimators housed within the base component. The collimators correspond to collection cylinders for sampling optical emission spectroscopy (OES) signals with respect to locations of a wafer in an etch chamber. The apparatus further includes a guide, operatively coupled to the plurality of collimators, to guide the sampling of the OES signals along paths for sampling the OES signals.

公开(公告)号：USD977504S1

公开(公告)日：2023-02-07

申请号：US29743600

申请日：2020-07-22

Applicant: APPLIED MATERIALS, INC.

Designer： Upendra V. Ummethala ,  Blake Erickson ,  Prashanth Kumar ,  Michael Kutney ,  Steven Trey Tindel ,  Zhaozhao Zhu

公开(公告)号：US20220349833A1

公开(公告)日：2022-11-03

申请号：US17242569

申请日：2021-04-28

Applicant: Applied Materials, Inc.

Inventor： Blake Erickson ,  Keith Berding ,  Michael Kutney ,  Soumendra Barman ,  Zhaozhao Zhu ,  Michelle SanPedro ,  Suresh Polali Narayana Rao

IPC: G01N21/95 ,  G01N21/21 ,  G01B11/06

Abstract: A system includes a memory and at least one processing device operatively coupled to the memory to facilitate an etch recipe development process by performing a number of operations. The operations include receiving a request to initiate an iteration of an etch process using an etch recipe to etch a plurality of materials each located at a respective one of a plurality of reflectometry measurement points, obtaining material thickness data for each of the plurality of materials resulting from the iteration of the etch process, and determining one or more etch parameters based on the material thickness data.

公开(公告)号：US20220028716A1

公开(公告)日：2022-01-27

申请号：US17379677

申请日：2021-07-19

Applicant: APPLIED MATERIALS, INC.

Inventor： Upendra V. Ummethala ,  Blake Erickson ,  Prashanth Kumar ,  Michael Kutney ,  Steven Trey Tindel ,  Zhaozhao Zhu

IPC: H01L21/67 ,  G01N21/25 ,  G01N21/95 ,  G01B11/00

Abstract: A method for a substrate measurement subsystem is provided. An indication is received that a substrate being processed at a manufacturing system has been loaded into a substrate measurement subsystem. First positional data of the substrate within the substrate measurement subsystem is determined. One or more portions of the substrate to be measured by one or more sensing components of the substrate measurement subsystem are determined based on the first positional data of the substrate and a process recipe for the substrate. Measurements of each of the determined portions of the substrate are obtained by one or more sensing components of the substrate measurement subsystem. The obtained measurements of each of the determined portions of the substrate are transmitted to a system controller.

公开(公告)号：US12148647B2

公开(公告)日：2024-11-19

申请号：US17584322

申请日：2022-01-25

Applicant: Applied Materials, Inc.

Inventor： Patricia Schulze ,  Gregory John Freeman ,  Michael Kutney ,  Arunkumar Ramachandraiah ,  Chih Chung Chou ,  Zhaozhao Zhu ,  Ozkan Celik

IPC: H01L21/68 ,  G01B11/24 ,  H01L21/683 ,  H01L21/687

Abstract: An apparatus includes a substrate holder, a first actuator to rotate the substrate holder, a second actuator to move the substrate holder linearly, a first sensor to generate one or more first measurements or images of the substrate, a second sensor to generate one or more second measurements of target positions on the substrate, and a processing device. The processing device estimates a position of the substrate on the substrate holder and causes the first actuator to rotate the substrate holder about a first axis. The rotation causes an offset between a field of view of the second sensor and a target position on the substrate due to the substrate not being centered on the substrate holder. The processing device causes the second actuator to move the substrate holder linearly along a second axis to correct the offset. The processing device determines a profile across a surface of the substrate based on the one or more second measurements of the target positions.

公开(公告)号：USD1045923S1

公开(公告)日：2024-10-08

申请号：US29907878

申请日：2024-01-09

Applicant: Applied Materials, Inc.

Designer： Sidharth Bhatia ,  Zhaozhao Zhu ,  Jeffrey Yat Shan Au ,  Shawn Levesque ,  Michael Howells ,  Raja Sekhar Jetti

Abstract: FIG. 1 is a front view of a first image in a sequence of a portion of a display panel with a graphical user interface; and,
FIG. 2 is a second image thereof.
The broken line showing of various regions of a graphical user interface in each of the views form no part of the claimed design. The broken line showing of the display screen is for illustrative purposes only and forms no part of the claimed design.
The appearance of the transitional image sequentially transitions between the images shown in FIGS. 1-2. The process or period in which one image transitions to another image forms no part of the claimed design.

公开(公告)号：US20240128100A1

公开(公告)日：2024-04-18

申请号：US18485009

申请日：2023-10-11

Applicant: Applied Materials, Inc.

Inventor： Hsinyi Tsai ,  Thomas Li ,  Zhaozhao Zhu ,  Michael Kutney ,  Upendra V. Ummethala

IPC: H01L21/67 ,  H01L21/66

CPC classification number: H01L21/67253 ,  H01L21/67294 ,  H01L22/26

Abstract: Spectral data associated with one or more regions of a surface of a substrate is identified. The substrate has been processed according to one or more first operations of a process recipe that is unknown to a system controller for the manufacturing system. The spectral data is provided as input to a machine learning model that is trained to predict, based on given spectral data, a respective process recipe associated with the substrate and one or more operations of the respective process recipe that have already been performed. A determination is made, based on one or more outputs of the machine learning model, that the substrate is associated with the process recipe and that one or more second operations are yet to be performed. The substrate is caused to be processed according to the one or more second operations of the process recipe.