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40 条记录 (耗时 0.025 秒)

    Method of scanning a substrate in an ion implanter
    23.
    发明申请
    Method of scanning a substrate in an ion implanter 有权
    在离子注入机中扫描基板的方法

    公开(公告)号：US20080169434A1

    公开(公告)日：2008-07-17

    申请号：US11652645

    申请日：2007-01-12

    申请人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore H. Smick

    发明人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore H. Smick

    IPC分类号： G21K5/10

    CPC分类号： H01J37/3171 ,  H01J37/3023 ,  H01J2237/20214 ,  H01J2237/30483

    摘要： This invention relates to a method of scanning a substrate through an ion beam in an ion implanter to provide uniform dosing of the substrate. The method comprises causing relative motion between the substrate and the ion beam such that the ion beam passes over all of the substrate and rotating the substrate substantially about its centre while causing the relative motion. Rotating the substrate while causing the relative motion between the substrate and the ion beam has several advantages including avoiding problematic angular effects, increasing uniformity, increasing throughput and allowing a greater range of ion beam profiles to be tolerated.

    摘要翻译： 本发明涉及一种通过离子注入机中的离子束扫描基底以提供基底的均匀计量的方法。 该方法包括引起衬底和离子束之间的相对运动，使得离子束通过所有衬底并且基本上围绕其中心旋转衬底，同时引起相对运动。 旋转衬底同时导致衬底和离子束之间的相对运动具有几个优点，包括避免有问题的角度影响，增加均匀性，增加生产量并允许允许更大范围的离子束分布。

    Ion beam diagnostics
    24.
    发明申请
    Ion beam diagnostics 失效
    离子束诊断

    公开(公告)号：US20080142727A1

    公开(公告)日：2008-06-19

    申请号：US11589156

    申请日：2006-10-30

    申请人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

    发明人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

    IPC分类号： G01K1/08

    CPC分类号： H01J37/3171 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578

    摘要： This invention relates to a method of measuring a property of an ion beam, for example an ion beam current profile or the emittance of an ion beam. A Faraday array comprising an array of ion beam current sensors is employed. The array can provide an ion beam current profile at the plane of the array. The Faraday array is also used in conjunction with an occluding element that may be moved through the ion beam upstream of the Faraday array, there obscuring varying portions of the ion beam from the Faraday array. Suitable manipulation of the signals from the Faraday allows the ion beam current profile to be determined for the plane of the occluding element, and also for the emittance of the ion beam at the plane of the occluding element to be determined.

    摘要翻译： 本发明涉及一种测量离子束的性质的方法，例如离子束电流分布或离子束的发射率。 采用包括离子束电流传感器阵列的法拉第阵列。 该阵列可以在阵列的平面处提供离子束电流分布。 法拉第阵列还与可以通过法拉第阵列上游的离子束移动的阻塞元件结合使用，这掩盖了来自法拉第阵列的离子束的变化部分。 适当地操纵来自法拉第的信号允许针对封闭元件的平面确定离子束电流轮廓，并且还确定待确定的阻塞元件平面处的离子束的发射率。

    Ion implant dose control
    27.
    发明授权
    Ion implant dose control 失效
    离子注入剂量控制

    公开(公告)号：US06870170B1

    公开(公告)日：2005-03-22

    申请号：US10792394

    申请日：2004-03-04

    申请人： Marvin Farley ,  Takao Sakase

    发明人： Marvin Farley ,  Takao Sakase

    IPC分类号： H01J37/304 ,  H01J37/317 ,  H01L21/265

    CPC分类号： H01J37/3171 ,  H01J2237/30455 ,  H01J2237/30488 ,  H01J2237/31703

    摘要： This invention is concerned with the control of implanting ions into a substrate, such as doping semiconductor wafers. The ion beam is measured to ensure waters are implanted with the correct, uniform ion dose. The incident ion beam comprises ions and neutrals, yet detectors measure only ions. The ions/neutrals ratio varies with the ion implanter's chamber pressure that in turn is known to rise and fall when the ion beam is on and off the wafer respectively, according to a characteristic time constant. This invention provides methods of correcting measured ionic currents to account for neutrals using the time constant. Initially an assumed time constant is used that is later improved by measuring the ionic current after a delay sufficient to allow the chamber pressure to recover to its base value. The time constant may also be improved by removing any quadratic variation in already determined true beam current values.

    摘要翻译： 本发明涉及将离子注入衬底的控制，例如掺杂半导体晶片。 测量离子束以确保以正确的均匀离子剂量注入水。 入射离子束包括离子和中性粒子，而检测器仅测量离子。 离子/中性比随着离子注入机的腔室压力而变化，根据特征时间常数，当离子束分别离开晶片和离开晶片时，其已知会上升和下降。 本发明提供了使用时间常数校正测量的离子电流以解决中性的方法。 最初使用假设时间常数，后来通过在足以允许室压恢复到其基值的延迟之后测量离子电流来改进。 时间常数也可以通过去除已经确定的真实束电流值中的任何二次变化来改善。

    Ion extraction assembly
    28.
    发明授权
    Ion extraction assembly 有权
    离子提取组件

    公开(公告)号：US06501078B1

    公开(公告)日：2002-12-31

    申请号：US09527031

    申请日：2000-03-16

    申请人： Geoffrey Ryding ,  Theodore H. Smick ,  Marvin Farley ,  Takao Sakase

    发明人： Geoffrey Ryding ,  Theodore H. Smick ,  Marvin Farley ,  Takao Sakase

    IPC分类号： H01J3715

    CPC分类号： H01J37/15 ,  H01J37/08 ,  H01J49/28 ,  H01J2237/31701

    摘要： An ion electrode extraction assembly comprising an ion source 20 and at least one electrode 50 having a gap through which a beam of extracted ions passes in use. An electrode manipulator assembly 55 is provided to move the electrode so as to vary the width of the gap transversely to the ion beam, move the electrode transversely to the ion beam, and move the electrode in the direction of the ion beam. The three degrees of movement being carried out independently of one another.

    摘要翻译： 一种离子电极提取组件，其包括离子源20和至少一个具有间隙的电极50，所提取的离子束在使用中通过该间隙通过。 提供电极操纵器组件55以移动电极，以便横向于离子束改变间隙的宽度，将电极横向于离子束移动，并且沿着离子束的方向移动电极。 三个运动方式彼此独立地进行。

    Apparatus for reducing distortion in fluid bearing surfaces
    29.
    发明授权
    Apparatus for reducing distortion in fluid bearing surfaces 有权
    减少流体轴承表面变形的装置

    公开(公告)号：US06271530B1

    公开(公告)日：2001-08-07

    申请号：US09293954

    申请日：1999-04-19

    申请人： Theodore H. Smick ,  Marvin Farley ,  Takao Sakase ,  Geoffrey Ryding

    发明人： Theodore H. Smick ,  Marvin Farley ,  Takao Sakase ,  Geoffrey Ryding

    IPC分类号： H01J3720

    CPC分类号： F16C32/0603 ,  F16C32/0662 ,  F16C32/067 ,  F16C33/748 ,  F16C2300/62 ,  Y10S277/913

    摘要： A fluid bearing and seal for an ion implanter is disclosed. The fluid bearing has a stator attached to a base and a moving member provided over the stator so that a fluid bearing can be formed between the opposing surfaces of the stator and the moving member. Either the base or the stator has a locating member extending normal to the bearing surface and the other one of either the base or the stator has a recess shaped to receive the locating member. A fluid seal enables the member to slide in the recess in the normal direction to seal off an enclosed volume between the member and the other one of either the stator or the base. A plurality of fixtures are distributed at points in a plane parallel to the bearing surface to fix the locating member and the other one of either the stator or the base together at these points to form the enclosed volume. The number of the fixtures is the minimum necessary so that the bearing surface of the stator remains undistorted. A fluid controller controls the supply of a fluid to the enclosed volume to maintain the planar bearing surface undistorted under the loading of the moving member.

    摘要翻译： 公开了用于离子注入机的流体轴承和密封件。 流体轴承具有附接到基座的定子和设置在定子上方的移动构件，使得可以在定子和移动构件的相对表面之间形成流体轴承。 基座或定子都具有垂直于支承表面延伸的定位构件，底座或定子中的另一个具有成形为容纳定位构件的凹部。 流体密封使得构件能够在凹部中在正常方向上滑动以密封构件和定子或基座中的另一个之间的封闭容积。 多个夹具分布在平行于支承表面的平面上的点处，以将定位构件和定子或底座中的另一个固定在这些点上以形成封闭的容积。 固定装置的数量是必需的最小值，使定子的支承面保持不变。 流体控制器控制向封闭容积供应流体，以在移动构件的载荷下使平面支承表面保持不变。