Abstract:
Electron optical aberrations of an energy filtering system of an energy filtering transmission electron microscope (EFTEM) are automatically corrected under computer control to set up the EFTEM for use. Optics of the electron microscope preceding an energy filter are used to scan the beam at the entrance to the filter in a pattern corresponding to a defined geometry. The beam can either be finely focused to yield a spot at each position visited during the pattern scan, or the beam can be spread out and imprinted with a well-defined intensity distribution, such as normally occurs due to passage of the beam through a specimen, so that its relative scanned displacements can be assessed using cross-correlation techniques. In the case of the finely focused beam, electron images of the scanned pattern directly yield a spot pattern image. Deviation of the recorded spot pattern image from the defined scan geometry reflect the imaging aberrations introduced by the energy filter. In the case of the spread out beam, post-filter electron images of the scanned beam are cross-correlated with an image of the beam taken without scanning yielding cross-correlation peak images that give the effective displacement of each scanned beam position due to the aberrations/distortions of the filter. Summing the cross-correlation peak images again yields a spot pattern image that is equivalent to that obtained in the focused beam case. Deviations of the recorded spot pattern image from the defined scan geometry are analyzed to assess and subsequently correct aberrations introduced by the energy filter.
Abstract:
A charged particle filter such as a Wien filter in which components used as the pole pieces and electrodes are precisely and reliably secured to a supporting structure through which they extend and to which they are brazed. Electrical insulating gaps in the magnetic circuit are located very remotely from the pole faces of the pole pieces so as to minimize any adverse effect of the gaps on the produced magnetic field.
Abstract:
The invention relates to an electron energy filter with magnetic deflection regions and a substantially W-shaped beam path. The energy filter has at least four magnetic deflection regions, that are respectively separated from each other by drift paths in the space free from magnetic fields. The whole filter is thus symmetrical with respect to a midplane (M). The total deflection angle in the first and last deflection region is at least 135°, and all the deflection regions together effect a deflection of the optical axis through an angle between 90° and 210°, preferably through 180°. The energy filter has a large Helmholtz length that is greater than double the average value of the deflection radii in the deflection regions.
Abstract:
An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet mounted in a passageway along the path of an ion beam, a power source adapted to provide an electric field in the passageway, and a magnetic device adapted to provide a multi-cusped magnetic field in the passageway, which may include a plurality of magnets mounted along at least a portion of the passageway. The power source and the magnets may cooperatively interact to provide an electron cyclotron resonance (ECR) condition along at least a portion of the passageway. The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway to interact with an electric field of a known RF or microwave frequency for a given low energy ion beam. The invention further comprises a mass analyzer waveguide adapted to couple the electric field to the beam plasma consistently along the length of the mass analyzer passageway to thereby improve the creation of the ECR condition. The invention thus provides enhancement of beam plasma within a mass analyzer dipole magnetic field for low energy ion beams without the introduction of externally generated plasma. The invention further includes a method of providing ion beam containment in a low energy ion implantation system, as well as an ion implantation system.
Abstract:
A device for imaging a beam of particles composed of charged particles with a certain energy and angle distribution on a detector device using a device, including a deflection unit with at least one deceleration lens provided for forming essentially parallel particle paths in the particle beam, whose reciprocal distances correspond to the angle distribution of the particles, and a filtering unit, which is located between the deflection unit and the detector facility, whereby the filtering unit may be biased with a potential for formation of a braking field and is adapted to be energy-selectively permeable for the particles, on the sample side before the deflection unit, an entry window in the form of an axial-symmetrical staged aperture or an entry grid is located, which is electrically separated from the deflection unit and at ground potential.
Abstract:
A compact magnetic energy filter having at least four magnetic fields to deflect the trajectory of an electron beam from the entrance window to the exit slit. A rotational symmetry axis is located midway between the second and third magnetic fields. The magnetic fields on the opposite sides of the rotational symmetry axis are opposite in polarity.
Abstract:
The invention relates to a particle-optical apparatus for particle-optical mask projection. According to the invention, an energy filter is used, by which particles which are inelastically scattered in a mask plane are separated from particles which are elastically scattered in the mask plane. Particles from a selected energy range are used for the particle-optical imaging of the mask in the final image plane. The energy filter is an imaging energy filter, the mask plane being coincident with the input image plane of the energy filter or being imaged in it. The output image plane of the energy filter is imaged, reduced in scale, by a following imaging system on a wafer arranged in the projection plane. Beam deflection systems are provided in addition, by which the particle beam is deflectable in the mask plane and onto out-of-axis regions, so that different regions of the mask plane can be imaged in the image plane at successive times.
Abstract:
A monochrometer mounted with the electron gun of an electron microscope or the like. This monochrometer does not need movement of a slit. An electron source consisting of any one of a thermal emission-type electron source (such as an LaB6 electron source or a tungsten hairpin), a Schottky emission-type electron source, and a tunneling field emission-type electron source is used. The slit is made of a single metal plate and mounted in position fixedly. Electrons are emitted from the electron source and dispersed within a plane including the slit according to energies. The slit is so positioned that it passes only those of the dispersed electrons which have energies close to the peak energy and blocks electrons having energies higher or lower than the peak energy.
Abstract:
An irradiation electron beam emitted from an electron gun is deflected by an energy filter, and passes through a first projective lens and an objective lens, and then irradiated onto a sample to produce secondary electrons. The secondary electron beam accelerated by a negative voltage applied to the sample passes through the objective lens and the first projective lens, and deflected by the energy filter to be energy dispersed. Only the secondary electrons having a specified energy pass through energy selecting aperture, and further pass through a second projective lens to form a projected image of the secondary electrons on an imager. Such an electron-optical system may be used for dimension evaluation or inspection of semiconductor substrates.
Abstract:
The invention relates to an electron energy filter for electron microscopes as well as to an electron microscope equipped with such a filter. The filter comprises three sector magnets with the deflection field in the first sector magnet being homogeneous. The deflection field in each of the two other sector magnets is an inhomogeneous gradient field. To generate the gradient field, the pole pieces of the two other sector magnets have the form of segments of truncated double cones. The electron beam passes the first homogeneous sector magnet twice. Multipole elements are arranged in front of, behind and between the three sector magnets. The filter has a large dispersion also for high-energy electrons while at the same time providing a compact configuration. All second-order aberrations and the significant second-rank aberrations are corrected by means of the multiple elements.