公开(公告)号：US07326941B2

公开(公告)日：2008-02-05

申请号：US11209476

申请日：2005-08-22

Applicant: Jiong Chen ,  Nicholas R. White

Inventor： Jiong Chen ,  Nicholas R. White

IPC: H01J37/317 ,  H01J37/08 ,  H01J37/147

CPC classification number: H01J49/30 ,  H01J37/05 ,  H01J37/3171

Abstract: This invention discloses an ion implantation apparatus with multiple operating modes. It has an ion source and an ion extraction means for extracting a ribbon-shaped ion beam therefrom. The ion implantation apparatus includes a magnetic analyzer for selecting ions with specific mass-to-charge ratio to pass through a mass slit to project onto a substrate. Multipole lenses are provided to control beam uniformity and collimation. The invention further discloses a two-path beamline in which a second path incorporates a deceleration system incorporating energy filtering. The invention discloses methods of ion implantation in which the mode of implantation may be switched from one-dimensional scanning of the target to two-dimensional scanning, and from a simple path to an s-shaped path with deceleration.

Abstract translation: 本发明公开了一种具有多种工作模式的离子注入装置。 它具有离子源和用于从其提取带状离子束的离子提取装置。 离子注入装置包括用于选择具有特定质荷比的离子的磁分析器，以通过质量狭缝投影到基底上。 提供多极镜头以控制光束的均匀性和准直。 本发明还公开了一种双路束线，其中第二路径包括并入能量过滤的减速系统。 本发明公开了一种离子注入方法，其中注入模式可以从目标的一维扫描切换到二维扫描，并且从简单的路径切换到具有减速的s形路径。

公开(公告)号：US07315024B2

公开(公告)日：2008-01-01

申请号：US11344529

申请日：2006-02-01

Applicant: Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

Inventor： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

IPC: G21K7/00 ,  G01N23/00

CPC classification number: H01J37/05 ,  H01J37/153 ,  H01J37/28

Abstract: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

Abstract translation: 本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。 扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场 在与包含狭缝的表面形成对称镜的位置处。 该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

公开(公告)号：US20070200069A1

公开(公告)日：2007-08-30

申请号：US10571347

申请日：2004-09-02

Applicant: Jürgen Frosien ,  Ralf Degenhardt ,  Stefan Lanio

Inventor： Jürgen Frosien ,  Ralf Degenhardt ,  Stefan Lanio

IPC: G21K1/08

CPC classification number: H01J37/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/05 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/1538

Abstract: The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.

Abstract translation: 本发明涉及例如 用于沿着光轴具有z轴的带电粒子束的带电粒子束能量宽度减小系统以及包括以聚焦和分散方式起作用的第一元件（110）的第一和第二平面，第二元件（ 112），第一四极元件（410）被定位成使得在操作中，第一四极元件的场与以聚焦和分散方式作用的第一元件的场重叠，第二四极元件 四极元件（412）被定位成使得在操作中，第二四极元件的场与以聚焦和分散方式作用的第二元件的场重叠，第一带电粒子选择元件（618）被定位成束 方向，在第一元件以聚焦和分散方式作用之前，第二带电粒子选择元件（616; 716）在光束方向上位于第一元件作用于第一元件 聚焦和分散的方式。 因此，可以实现没有固有分散限制的虚拟色散源状位置。

公开(公告)号：US07250601B2

公开(公告)日：2007-07-31

申请号：US11372057

申请日：2006-03-10

Applicant: Kazutoshi Kaji ,  Takashi Aoyama ,  Shunroku Taya ,  Shigeto Isakozawa

Inventor： Kazutoshi Kaji ,  Takashi Aoyama ,  Shunroku Taya ,  Shigeto Isakozawa

IPC: H01J47/00

CPC classification number: G01N23/2251 ,  H01J37/05 ,  H01J37/244 ,  H01J37/252 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/24495 ,  H01J2237/2487 ,  H01J2237/262 ,  H01J2237/2802 ,  H05H1/0037

Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.

Abstract translation: 电子束检测器检测光谱的峰值，并且当峰值位置偏离电子束检测器上的参考位置时，使用用于控制电子束检测器上的电子束位置的控制器来校正偏差。 测量电子能量损失谱，同时控制校正电子束在样本上的位置与光谱的峰值位置之间的偏差，以及用电子束检测器测量的光谱。

公开(公告)号：US07217924B1

公开(公告)日：2007-05-15

申请号：US11205367

申请日：2005-08-16

Applicant: Marian Mankos ,  Eric Munro

Inventor： Marian Mankos ,  Eric Munro

IPC: H01J37/26 ,  G01N23/225

CPC classification number: H01J37/05 ,  H01J37/147 ,  H01J37/153 ,  H01J37/26 ,  H01J37/29 ,  H01J2237/0044 ,  H01J2237/063 ,  H01J2237/151 ,  H01J2237/2446 ,  H01J2237/262

Abstract: One embodiment relates to an apparatus for generating a dual-energy electron beam. A first electron beam source is configured to generate a lower-energy electron beam, and a second electron beam source is configured to generate a higher-energy electron beam. A holey mirror is biased to reflect the lower-energy electron beam. The holey mirror also includes an opening therein through which passes the higher-energy electron beam, thereby forming the dual-energy electron beam. A prism array combiner introduces a first dispersion between the lower-energy electron beam and the higher-energy electron beam within the dual-energy electron beam. A prism array separator is configured to separate the dual-energy electron beam traveling to a substrate from a scattered electron beam traveling away from the substrate. The prism array separator introduces a second dispersion which compensates for the dispersion of the prism array combiner. Other embodiments are also disclosed.

Abstract translation: 一个实施例涉及一种用于产生双能量电子束的装置。 第一电子束源被配置为产生较低能量的电子束，并且第二电子束源被配置为产生较高能量的电子束。 有孔镜被偏置以反射较低能量的电子束。 多孔镜还包括其中通过高能电子束的开口，从而形成双能电子束。 棱镜阵列组合器在双能电子束内引入低能电子束与高能电子束之间的第一色散。 棱镜阵列分离器被配置为将从衬底传播的散射电子束分离到衬底行进的双能电子束。 棱镜阵列分离器引入补偿棱镜阵列组合器的色散的第二色散。 还公开了其他实施例。

公开(公告)号：US07164139B1

公开(公告)日：2007-01-16

申请号：US11048378

申请日：2005-02-01

Applicant: Gabor D. Toth ,  Douglas K. Masnaghetti ,  Jeffrey Keister ,  Eric Munro

Inventor： Gabor D. Toth ,  Douglas K. Masnaghetti ,  Jeffrey Keister ,  Eric Munro

IPC: H01J1/50

CPC classification number: H01J37/05 ,  H01J2237/057

Abstract: One embodiment disclosed relates to a Wien filter for a charged-particle beam apparatus. The charged-particle beam is transmitted through the Wien filter in a first direction. A magnetic field generation mechanism is configured to generate a magnetic field in a second direction which is perpendicular to the first direction, and an electrostatic field generation mechanism is configured to generate an electrostatic field in a third direction which is perpendicular to the first and second directions. The field generation mechanisms are further configured so as to have an offset between the positions of the magnetic and electrostatic fields along the first direction. Another embodiment disclosed relates to a Wien filter type device wherein the magnetic force is approximately twice in strength compared to the electrostatic force. Other embodiments are also disclosed.

Abstract translation: 公开的一个实施例涉及一种用于带电粒子束装置的维恩滤波器。 带电粒子束在第一方向通过维恩滤波器传输。 磁场产生机构被配置为在与第一方向垂直的第二方向上产生磁场，并且静电场产生机构被配置为在与第一和第二方向垂直的第三方向上产生静电场 。 场产生机构被进一步配置为具有沿着第一方向的磁场和静电场的位置之间的偏移。 所公开的另一实施例涉及一种Wien过滤器型装置，其中与静电力相比，磁力的强度大约是两倍。 还公开了其他实施例。

公开(公告)号：US07126117B2

公开(公告)日：2006-10-24

申请号：US11168728

申请日：2005-06-28

Applicant: Krzysztof Grzelakowski

Inventor： Krzysztof Grzelakowski

IPC: H01J37/05 ,  H01J37/063

CPC classification number: H01J37/05 ,  H01J49/484 ,  H01J2237/151

Abstract: An imaging energy filter for electrons and other charged particles filters an object formed by these particles at the filter inlet by means of an energetic selection of charged particles in the region of a dispersion aperture. The filter includes two concentric and spherical electrodes, which produce an electrostatic field that deflects the charged particles at an angle α that is greater than π and less than 2π. The deflector, operating as a deflecting element that generates a deflection field, is disposed at an intersection point of the inlet axis and the outlet axis and in a plane of symmetry of the angle α, wherein the plane of symmetry simultaneously is an electro-optical plane. The deflection field generated by the deflecting element deflects the charged particles by an angle π−α/2, leading to a total deflection angle of 2π and co-linearity of the inlet axis and outlet axis.

Abstract translation: 用于电子和其他带电粒子的成像能量过滤器通过在分散孔径区域中的带电粒子的能量选择来过滤由过滤器入口处的这些颗粒形成的物体。 滤波器包括两个同心和球形电极，其产生静电场，该电场以大于pi且小于2pi的角度α偏转带电粒子。 作为产生偏转场的偏转元件运行的偏转器设置在入口轴线和出口轴线的交点和角度α的对称平面中，其中对称平面同时为电光 飞机 由偏转元件产生的偏转磁场将带电粒子偏转一个角度pi-α/ 2，导致2π的总偏转角和入口轴线和出口轴线的共线性。

公开(公告)号：US20060113495A1

公开(公告)日：2006-06-01

申请号：US11209484

申请日：2005-08-22

Applicant: Jiong Chen ,  Nicholas White

Inventor： Jiong Chen ,  Nicholas White

IPC: H01J37/08

CPC classification number: H01J37/05 ,  H01J37/3171 ,  H01J49/30 ,  H01J2237/055 ,  H01J2237/057

Abstract: This invention discloses an ion implantation apparatus with multiple operating modes. It has an ion source and an ion extraction means for extracting a ribbon-shaped ion beam therefrom. The ion implantation apparatus includes a magnetic analyzer for selecting ions with specific mass-to-charge ratio to pass through a mass slit to project onto a substrate. Multipole lenses are provided to control beam uniformity and collimation. The invention further discloses a two-path beamline in which a second path incorporates a deceleration system incorporating energy filtering. The invention discloses methods of ion implantation in which the mode of implantation may be switched from one-dimensional scanning of the target to two-dimensional scanning, and from a simple path to an s-shaped path with deceleration.

Abstract translation: 本发明公开了一种具有多种工作模式的离子注入装置。 它具有离子源和用于从其提取带状离子束的离子提取装置。 离子注入装置包括用于选择具有特定质荷比的离子的磁分析器，以通过质量狭缝投影到基底上。 提供多极镜头以控制光束的均匀性和准直。 本发明还公开了一种双路束线，其中第二路径包括并入能量过滤的减速系统。 本发明公开了一种离子注入方法，其中注入模式可以从目标的一维扫描切换到二维扫描，并且从简单的路径切换到具有减速的s形路径。

公开(公告)号：US20060033041A1

公开(公告)日：2006-02-16

申请号：US11203002

申请日：2005-08-11

Applicant: Shian-Jyh Lin ,  Yuan-Song Tai

Inventor： Shian-Jyh Lin ,  Yuan-Song Tai

IPC: B01D59/44

CPC classification number: H01J37/05 ,  H01J37/244 ,  H01J2237/05 ,  H01J2237/24405 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24507 ,  H01J2237/31703

Abstract: An ion beam energy monitor system and method thereof. A physical field generator generates a physical field in a direction not parallel to an ion beam, refracting the ion beam, and a receiving device located on the path of the refracted ion beam receives the ion beam and calculates the energy thereof according to a collision distribution of ions of the ion beam. The output energy of the ion beam is thus being well adjusted.

Abstract translation: 一种离子束能量监测系统及其方法。 物理场发生器在不平行于离子束的方向上产生物理场，折射离子束，位于折射离子束路径上的接收装置接收离子束并根据碰撞分布计算其能量 的离子束离子。 因此，离子束的输出能量被很好地调节。

公开(公告)号：US06960763B2

公开(公告)日：2005-11-01

申请号：US10738966

申请日：2003-12-17

Applicant: G. Martinez Lopez ,  Katsushige Tsuno

Inventor： G. Martinez Lopez ,  Katsushige Tsuno

IPC: H01J37/26 ,  G01Q30/06 ,  H01J37/05 ,  H01J37/153 ,  H01J49/44 ,  H01J40/00 ,  H01J47/00

CPC classification number: H01J37/05 ,  H01J37/153

Abstract: An energy filter with reduced aberration. The energy filter has a first stage of filter for receiving an electron beam entering along the optical axis and for focusing the beam in one direction vertical to the optical axis and a second stage of filter positioned along the optical axis behind the first stage of filter. The beam once focused by the first stage of filter is made to enter the second stage of filter. In the second stage of filter, the orbit of the electron beam is inverted with respect to the focal point. The two stages of filters are identical in length taken along the optical axis. The first and second stages of filters have electric and magnetic quadrupole fields, respectively, along the optical axis. These quadrupole fields make an angle of 45 degrees to the optical axis to achieve astigmatic focusing.

Abstract translation: 具有减小像差的能量滤波器。 能量滤波器具有第一级滤波器，用于接收沿着光轴进入的电子束并且用于在垂直于光轴的一个方向上聚焦光束，以及沿着光轴位于第一级过滤器后面的第二级滤光器。 过滤器第一级聚焦的光束进入第二级过滤器。 在滤波器的第二阶段，电子束的轨道相对于焦点反转。 过滤器的两个阶段沿光轴取长度相同。 滤光器的第一和第二阶段分别具有沿着光轴的电和四极四极场。 这些四极场与光轴成45度的角度，以实现散光聚焦。