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    Method and apparatus for inspecting pattern defects
    13.
    发明申请
    Method and apparatus for inspecting pattern defects 有权
    检查图案缺陷的方法和装置

    公开(公告)号：US20030210391A1

    公开(公告)日：2003-11-13

    申请号：US10223422

    申请日：2002-08-20

    Inventor： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

    IPC: G01N021/00

    CPC classification number: G01N21/956 ,  G01N21/94 ,  G01N2021/9513 ,  G01N2201/10 ,  G01N2201/1045

    Abstract: A pattern defect inspection apparatus capable of detecting defects without being affected by non-uniform thickness of a thin film formed on a sample even when using monochromatic light such as a laser. The apparatus comprises a laser to illuminate a sample, coherence suppression optics to reduce laser beam coherence, a condenser means to condense the laser beam onto a pupil plane of an objective lens, and a detector means to detect the light reflected from a circuit pattern formed on a sample. The condenser means is designed so that light intensity illuminating the sample under test can be partially adjusted according to the type of laser beam illumination condensed on the pupil of the objective lens. Variations in reflected light intensity caused by non-uniform film thickness on the surface of the sample are therefore reduced and shading minimized in the detected image to allow detecting fine defects.

    Abstract translation: 即使在使用激光等单色光的情况下，也能够在不影响样品上形成的薄膜的不均匀的情况下检测缺陷的图案缺陷检查装置。 该装置包括用于照亮样品的激光器，用于减少激光束相干性的相干抑制光学器件，将激光束冷凝到物镜的光瞳平面上的聚光器装置，以及用于检测从形成的电路图案反射的光的检测器装置 在样品上 聚光装置被设计成使得照射被测试样品的光强度可以根据在物镜的光瞳上聚集的激光束照射的类型而被部分调节。 因此，由于样品表面的不均匀膜厚引起的反射光强度的变化在检测图像中减少并且阴影最小化，从而能够检测出细小的缺陷。

    Egg candling system
    14.
    发明授权
    Egg candling system 失效
    蛋烛系统

    公开(公告)号：US5615777A

    公开(公告)日：1997-04-01

    申请号：US373158

    申请日：1995-01-17

    Applicant: Frank L. Weichman ,  Jelle van der Schoot ,  Daniel J. Kenway ,  Alan J. Hughes ,  Carl S. Flatman

    Inventor： Frank L. Weichman ,  Jelle van der Schoot ,  Daniel J. Kenway ,  Alan J. Hughes ,  Carl S. Flatman

    IPC: G01N21/952 ,  G01N33/08 ,  A01K43/04 ,  G01N21/00

    CPC classification number: G01N33/085 ,  G01N21/951 ,  G01N2201/1045 ,  Y10S209/938

    Abstract: A light beam such a laser beam is used to scan the surface of an egg for flaws such as pin holes, cracks, thinned shell regions, etc. The light beam is vibrated with a rocking/rotating movement to describe a closed curve such as a circle, ellipse or an ellipse so narrow that it is effectively a straight line. The utilization of such a light beam allows identification of types of flaws due to the character of the progression of light emanating from the egg. The invention includes apparatus for rotating the egg about its longitudinal axis in the path of the beam or beams. The apparatus also includes apparatus for forming the vibrating beam such as mirrors vibrated by out of phase electro-magnetic vibration or piezo electric actuators.

    Abstract translation: 使用诸如激光束的光束来扫描鸡蛋表面，例如针孔，裂纹，变薄的壳区等。光束以摇摆/旋转运动振动以描述闭合曲线，例如 圆，椭圆或椭圆如此狭窄，使其实际上是一条直线。 这种光束的利用允许鉴定由于从蛋发出的光的进展的特征的缺陷的类型。 本发明包括用于在梁或梁的路径中围绕其纵轴旋转鸡蛋的装置。 该装置还包括用于形成振动束的装置，例如通过异相电磁振动或压电致动器振动的反射镜。

    System for checking defects on a flat surface of an object
    15.
    发明授权
    System for checking defects on a flat surface of an object 失效
    用于检查物体平坦表面上的缺陷的系统

    公开(公告)号：US4508450A

    公开(公告)日：1985-04-02

    申请号：US362621

    申请日：1982-03-29

    Applicant: Ken Ohshima ,  Masaharu Sakamoto

    Inventor： Ken Ohshima ,  Masaharu Sakamoto

    IPC: G01N21/88 ,  G01N21/95 ,  G11B7/0037

    CPC classification number: G01N21/9506 ,  G11B7/00375 ,  G01N2021/8861 ,  G01N2021/8874 ,  G01N21/9501 ,  G01N2201/1045

    Abstract: A checking system for checking defects on an optically flat surface of an object to be checked is adapted to spirally scan the surface of the object with a laser beam which is projected from an optical head. The laser beam is reflected from the surface of the object and converted by a photodetector to an electric signal. The level of the electric signal is compared with a reference level to produce a defect signal. The rotation of the object is detected by a position sensor. A counter counts a position signal in response to the defect signal and the contents of the counter is stored, as data representing a defect start position, in a defect position memory. The length data of the defect signal is counted and stored in a defect length memory. Predetermined defect position data is read out of a defect position memory, while defect length data corresponding to the defect position data is read out of the defect length memory. Position data associated with an area to be displayed is compared with defect position data. When both data coincide with each other, the corresponding defect length data is counted down. During the down count period, defect picture element data is stored in a refresh memory. The picture element data stored in the refresh memory is delivered to a CRT where it is displayed as defect data.

    Abstract translation: 用于检查待检查物体的光学平坦表面上的缺陷的检查系统适于用从光学头投影的激光束螺旋地扫描物体的表面。 激光束从物体的表面反射并由光电检测器转换成电信号。 将电信号的电平与参考电平进行比较以产生缺陷信号。 物体的旋转由位置传感器检测。 计数器响应于缺陷信号对位置信号进行计数，并且将计数器的内容作为表示缺陷开始位置的数据存储在缺陷位置存储器中。 将缺陷信号的长度数据计数并存储在缺陷长度存储器中。 从缺陷位置存储器中读出预定缺陷位置数据，同时从缺陷位置数据读出与缺陷位置数据对应的缺陷长度数据。 与要显示的区域相关联的位置数据与缺陷位置数据进行比较。 当两个数据彼此一致时，相应的缺陷长度数据被倒计数。 在向下计数期间，将缺陷像素数据存储在刷新存储器中。 存储在刷新存储器中的图像元素数据被传送到CRT，其被显示为缺陷数据。

    High resolution object inspection apparatus using terahertz wave
    17.
    发明授权
    High resolution object inspection apparatus using terahertz wave 有权
    使用太赫兹波的高分辨率物体检测装置

    公开(公告)号：US09239287B2

    公开(公告)日：2016-01-19

    申请号：US14385033

    申请日：2012-04-10

    Applicant: Hyang-Sook Chun ,  Sung-Wook Choi ,  Hyun-Joo Chang ,  Na-Ri Lee ,  Gyeong-Sik Ok

    Inventor： Hyang-Sook Chun ,  Sung-Wook Choi ,  Hyun-Joo Chang ,  Na-Ri Lee ,  Gyeong-Sik Ok

    IPC: G01J5/02 ,  G01N21/3581 ,  H01Q15/08 ,  G01N21/88 ,  G02B3/00

    CPC classification number: G01N21/3581 ,  G01N21/8806 ,  G01N21/94 ,  G01N2201/06113 ,  G01N2201/1045 ,  G01N2201/105 ,  G02B3/00 ,  H01Q15/08

    Abstract: An object inspection apparatus includes a terahertz wave supplying unit for generating a terahertz wave and moving a path of the terahertz wave according to time so that the terahertz wave is supplied to an object to be inspected, a focusing lens located between the terahertz wave supplying unit and the object to be inspected to focus the terahertz wave supplied by the terahertz wave supplying unit, a rotating plate having a plate shape and including a plurality of the focusing lenses with different distances from the center thereof, the rotating plate rotating in the circumferential direction so that one of the focusing lenses is located at a path of the terahertz wave according to the path movement of the terahertz wave, and a terahertz wave detecting unit for collecting and detecting a terahertz wave incident to the object to be inspected.

    Abstract translation: 物体检查装置包括：太赫兹波提供单元，用于产生太赫兹波，并根据时间移动太赫兹波的路径，使得太赫兹波被提供给被检测物体;聚焦透镜，位于太赫波提供单元 以及要被检查的物体聚焦太赫兹波供给单元提供的太赫兹波，具有板形的旋转板，并且包括多个离其中心距离不同的聚焦透镜，旋转板沿圆周方向旋转 使得一个聚焦透镜根据太赫兹波的路径移动位于太赫兹波的路径，以及用于收集和检测入射到待检查对象的太赫兹波的太赫兹波检测单元。

    Defect inspection method and defect inspection apparatus
    18.
    发明授权
    Defect inspection method and defect inspection apparatus 有权
    缺陷检查方法和缺陷检查装置

    公开(公告)号：US08922764B2

    公开(公告)日：2014-12-30

    申请号：US13976178

    申请日：2011-10-21

    Applicant: Yuta Urano ,  Toshifumi Honda ,  Yukihiro Shibata

    Inventor： Yuta Urano ,  Toshifumi Honda ,  Yukihiro Shibata

    IPC: G01N21/956 ,  G01N21/95 ,  G01B11/06 ,  G01N21/88

    CPC classification number: G01N21/956 ,  G01B11/0608 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8854 ,  G01N2201/1045

    Abstract: A defect inspection method includes: illuminating an area on surface of a specimen as a test object under a specified illumination condition; scanning a specimen to translate and rotate the specimen; detecting scattering lights to separate each of scattering lights scattered in different directions from the illuminated area on the specimen into pixels to be detected according to a scan direction at the scanning a specimen and a direction approximately orthogonal to the scan direction; and processing to perform an addition process on each of scattering lights that are detected at the step and scatter approximately in the same direction from approximately the same area of the specimen, determine presence or absence of a defect based on scattering light treated by the addition process, and compute a size of the determined defect using at least one of the scattering lights corresponding to the determined defect.

    Abstract translation: 缺陷检查方法包括：在规定的照明条件下照射作为被检体的试样表面的面积; 扫描样品以平移和旋转样品; 检测散射光，根据扫描样本的扫描方向和与扫描方向大致正交的方向，将从样本上的照射区域向不同方向散射的散射光分离成要检测的像素; 对在步骤中检测到的每个散射光进行加法处理，并且从与样本的大致相同的区域大致相同的方向散射，基于通过加法处理的散射光确定缺陷的存在或不存在 并且使用与所确定的缺陷相对应的散射光中的至少一个来计算确定的缺陷的大小。

    System and method of two-stepped laser scattering defect inspection
    19.
    发明授权
    System and method of two-stepped laser scattering defect inspection 有权
    两阶激光散射缺陷检测系统及方法

    公开(公告)号：US08339593B2

    公开(公告)日：2012-12-25

    申请号：US12571791

    申请日：2009-10-01

    Applicant: Eiji Kamiyama ,  Takehiro Tsunemori ,  Kazuhiro Yamamoto ,  Kenji Aoki

    Inventor： Eiji Kamiyama ,  Takehiro Tsunemori ,  Kazuhiro Yamamoto ,  Kenji Aoki

    IPC: G01N21/00

    CPC classification number: G01N21/9501 ,  G01N2201/1045 ,  G01N2201/106

    Abstract: A laser scattering defect inspection system includes: a stage unit that rotates a workpiece W and transports the workpiece W in one direction; a laser light source that emits a laser beam LB toward the workpiece W mounted on the stage unit; an optical deflector that scans the laser beam LB emitted from the laser light source on the workpiece W; an optical detector that detects the laser beam LB scattered from the surface of the workpiece W; a storage unit that stores defect inspection conditions for each inspection step of a manufacturing process of the workpiece W, where the conditions include the rotation speed and the moving speed of the workpiece W by the stage unit, the scan width on the workpiece W and the scan frequency by the optical deflector; and a control unit that reads the defect inspection conditions stored for each inspection step in the storage unit and controls the driving of the stage unit and the optical deflector under the conditions.

    Abstract translation: 激光散射缺陷检查系统包括：台架单元，其使工件W旋转并沿一个方向输送工件W; 激光光源，其向安装在平台单元上的工件W发射激光束LB; 光学偏转器，其对从工件W上的激光源发射的激光束LB进行扫描; 检测从工件W的表面散射的激光束LB的光检测器; 存储单元，其存储工件W的制造过程的每个检查步骤的缺陷检查条件，其中条件包括工件W的工件W的转速和移动速度，工件W上的扫描宽度和 扫描频率由光学偏转器; 以及控制单元，其读取存储单元中的每个检查步骤存储的缺陷检查条件，并且在条件下控制台单元和光偏转器的驱动。

    System for detecting anomalies and/or features of a surface
    20.
    发明申请
    System for detecting anomalies and/or features of a surface 有权

    公开(公告)号：US20060038984A9

    公开(公告)日：2006-02-23

    申请号：US10360512

    申请日：2003-02-06

    Applicant: Mehdi Vaez-Iravani ,  Guoheng Zhao ,  Stanley Stokowski

    Inventor： Mehdi Vaez-Iravani ,  Guoheng Zhao ,  Stanley Stokowski

    IPC: G01N21/00

    CPC classification number: G01N21/95623 ,  G01N21/47 ,  G01N21/94 ,  G01N2201/1045

    Abstract: A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam. For inspecting surface with a pattern thereon, the light from the surface is first passed through a spatial filter before it is imaged onto the charge-coupled devices. The spatial filter includes stripes of scattering regions that shift in synchronism with relative motion between the beam and the surface to block Fourier components from the pattern. The spatial filter may be replaced by reflective strips that selectively reflects scattered radiation to the detector, where the reflective strips also shifts in synchronism with the relative motion.

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