AXIAL FLOW FAN
    13.
    发明申请
    AXIAL FLOW FAN 有权
    轴流风扇

    公开(公告)号:US20130101420A1

    公开(公告)日:2013-04-25

    申请号:US13643452

    申请日:2010-05-13

    CPC classification number: F04D19/002 F04D29/384 F05D2240/307

    Abstract: An axial flow fan, with which effective work of blades is ensured and blade tip vortices are suppressed, thereby reducing noise. The axial flow fan includes blades, which are each formed such that a chord centerline connecting chord center points from inner to outer peripheral ends of the blade is curved so as to protrude toward a downstream side in a whole region.

    Abstract translation: 一种轴流风扇,确保了叶片的有效作用,并抑制了叶片尖端涡流,从而降低了噪音。 轴流风扇包括叶片,它们各自形成为使得连接弦中心的弦中心线从叶片的内周到外周端指向弯曲,以朝向整个区域中的下游侧突出。

    DISPLAY DEVICE
    14.
    发明申请
    DISPLAY DEVICE 有权
    显示设备

    公开(公告)号:US20080170015A1

    公开(公告)日:2008-07-17

    申请号:US11972333

    申请日:2008-01-10

    CPC classification number: G02F1/133603 G02F2001/133628

    Abstract: A display device includes a substrate having light emitting elements for display on a front surface; a substrate supporting body having an opening in the center and positioned on the back surface side of the substrate to support a peripheral region of the substrate; a case body positioned on the back surface side of the substrate supporting body and covering a part of the center opening; a fan unit arranged in the case body; a wind path plate arranged between the fan unit and the back surface of the substrate and forming a wind path to pass airflow generated by driving the fan unit only on the back surface side of the substrate; and a power supply arranged in the case body and on the back surface of the wind path plate; and wherein the airflow impinges the wind path plate through the fan, thereafter passes through the wind path and is discharged to the outside from the back side of the wind path plate. According to the present invention, it is possible to cool down a substrate uniformly and efficiently in a display device using light emitting elements arranged on the substrate without raising cost or complicating the structure.

    Abstract translation: 显示装置包括具有用于在前表面上显示的发光元件的基板; 基板支撑体,其具有位于所述基板的所述背面侧的中心的开口,以支撑所述基板的周边区域; 壳体,其位于所述基板支撑体的背面侧并覆盖所述中心开口的一部分; 布置在所述壳体中的风扇单元; 风道板,布置在所述风扇单元和所述基板的所述背面之间,并且形成风路,以仅通过在所述基板的背面侧驱动所述风扇单元而产生的气流; 以及布置在所述壳体中和所述风路板的后表面上的电源; 并且其中所述气流冲击所述风路板通过所述风扇,然后通过所述风道并从所述风路板的后侧排出到外部。 根据本发明,可以在使用布置在基板上的发光元件的显示装置中均匀且有效地冷却基板,而不会增加成本或使结构复杂化。

    Axial flow fan
    15.
    发明授权
    Axial flow fan 有权
    轴流风机

    公开(公告)号:US09394911B2

    公开(公告)日:2016-07-19

    申请号:US13643452

    申请日:2010-05-13

    CPC classification number: F04D19/002 F04D29/384 F05D2240/307

    Abstract: An axial flow fan, with which effective work of blades is ensured and blade tip vortices are suppressed, thereby reducing noise. The axial flow fan includes blades, which are each formed such that a chord centerline connecting chord center points from inner to outer peripheral ends of the blade is curved so as to protrude toward a downstream side in a whole region.

    Abstract translation: 一种轴流风扇,确保了叶片的有效作用,并抑制了叶片尖端涡流,从而降低了噪音。 轴流风扇包括叶片,它们各自形成为使得连接弦中心的弦中心线从叶片的内周到外周端指向弯曲,以朝向整个区域中的下游侧突出。

    DISPLAY DEVICE
    18.
    发明申请
    DISPLAY DEVICE 有权
    显示设备

    公开(公告)号:US20110026224A1

    公开(公告)日:2011-02-03

    申请号:US12674009

    申请日:2007-08-20

    CPC classification number: H05K7/20972 Y10S345/905

    Abstract: An air duct plate is provided on the back of a substrate on the surface of which a light emitting element group for display as well as an integrated circuit are disposed; a fan acts to send an air into a space surrounded by a case body extending over and around the air duct plate and the air duct plate; and a plurality of openings acting to blow a cooling air having been generated by the fan to a predetermined portion on the side of the substrate are formed in the air duct plate.

    Abstract translation: 在其表面上设置有用于显示的发光元件组和集成电路的基板的背面上的通风管板; 风扇用于将空气送入由空气导管板和空气导管板之间和周围延伸的外壳体包围的空间中; 并且在空气管道板中形成有用于将由风扇产生的冷却空气吹送到基板侧的预定部分的多个开口。

    Method of fabricating X-ray mask and method of fabricating semiconductor device using the X-ray mask
    19.
    发明授权
    Method of fabricating X-ray mask and method of fabricating semiconductor device using the X-ray mask 失效
    使用X射线掩模制造X射线掩模的方法和制造半导体器件的方法

    公开(公告)号:US07197108B2

    公开(公告)日:2007-03-27

    申请号:US10627611

    申请日:2003-07-28

    CPC classification number: G03F1/22

    Abstract: In fabricating an X-ray mask, a chromium oxide film serving as an etching stopper is formed on a diamond film serving as an X-ray transmitter. Then, a diamond layer serving as a first X-ray absorber is formed on the chromium oxide film. Thereafter, a tungsten layer serving as a second X-ray absorber is formed on the diamond layer. Consequently, the diamond layer and the tungsten layer form an X-ray absorber having a laminated structure. When the X-ray absorber has a laminated structure including substances having different compositions, the transmittance and the phase shift quantity of the overall X-ray absorber can be readily adjusted. Thus, a method of fabricating an X-ray mask providing improved resolution of the pattern of a semiconductor device or the like is obtained.

    Abstract translation: 在制造X射线掩模时,在用作X射线发射器的金刚石膜上形成用作蚀刻阻挡层的氧化铬膜。 然后,在氧化铬膜上形成用作第一X射线吸收体的金刚石层。 此后,在金刚石层上形成用作第二X射线吸收体的钨层。 因此,金刚石层和钨层形成具有层叠结构的X射线吸收体。 当X射线吸收体具有包含不同成分的物质的层叠结构时,可以容易地调节整个X射线吸收体的透射率和相移量。 因此,获得了制造提供半导体器件等的图案的改进的分辨率的X射线掩模的方法。

    X-ray mask and method of manufacturing the same
    20.
    发明授权
    X-ray mask and method of manufacturing the same 失效
    X射线掩模及其制造方法

    公开(公告)号:US06190808B1

    公开(公告)日:2001-02-20

    申请号:US09271297

    申请日:1999-03-17

    CPC classification number: G03F1/78 G03F1/22 G03F7/2051 G03F7/70383 G03F7/707

    Abstract: An X-ray mask including a transfer pattern having high accuracy is obtained. In a method of manufacturing the X-ray mask, an X-ray absorber film preventing transmission of an X-ray is formed on a substrate. A resist film is formed on the X-ray absorber film. The substrate is placed on a movable member. Steps of moving the movable member and irradiating the resist film with an energy beam are repeated for carrying out a drawing step of drawing a pattern on the resist film. Between the step of placing the substrate on the movable member and the drawing step, a step of holding a mask member including the resist film, the X-ray absorber film and the substrate to be in a state substantially identical to thermal equilibrium in the drawing step is carried out.

    Abstract translation: 获得包括高精度的转印图案的X射线掩模。 在制造X射线掩模的方法中,在基板上形成防止透射X射线的X射线吸收膜。 在X射线吸收膜上形成抗蚀剂膜。 将基板放置在可动构件上。 重复移动可动件并用能量束照射抗蚀剂膜的步骤,以进行在抗蚀剂膜上绘制图案的拉伸步骤。 在将基板放置在可移动部件上的步骤和拉伸步骤之间,将包括抗蚀剂膜,X射线吸收膜和基板的掩模部件保持在与图中的热平衡基本相同的状态的步骤 一步进行。

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