公开(公告)号：US20240213000A1

公开(公告)日：2024-06-27

申请号：US18421988

申请日：2024-01-25

Applicant: Tokyo Electron Limited

Inventor： Kazuya NAGASEKI ,  Kazuki MOYAMA ,  Shinji HIMORI ,  Masanobu HONDA ,  Satoru TERUUCHI

IPC: H01J37/32 ,  H01L21/683

CPC classification number: H01J37/32724 ,  H01J37/3244 ,  H01L21/6833 ,  H01J2237/2065

Abstract: A processing method for performing plasma processing on a substrate includes placing a temperature adjustment target onto a support surface of a substrate support in a decompressible processing, forming a heat transfer layer by supplying, through the substrate support, a heat transfer medium including at least one of a liquid medium or a solid medium with fluidity to between the support surface of the substrate support and a back surface of the temperature adjustment target, performing plasma processing on the substrate on the support surface on which the heat transfer layer is formed, and separating the temperature adjustment target from the support surface after the plasma processing.

公开(公告)号：US20220301825A1

公开(公告)日：2022-09-22

申请号：US17834948

申请日：2022-06-08

Applicant: Tokyo Electron Limited

Inventor： Shinji KUBOTA ,  Kazuya NAGASEKI ,  Shinji HIMORI ,  Koichi NAGAMI

IPC: H01J37/32

Abstract: A disclosed plasma processing method includes generating plasma in a chamber of a plasma processing apparatus by supplying radio frequency power from a radio frequency power source in a first period. The plasma processing method further includes stopping supply of the radio frequency power from the radio frequency power source in a second period following the first period. The plasma processing method further includes applying a negative direct-current voltage from a bias power source to a substrate support in a third period following the second period. In the third period, the radio frequency power is not supplied. In the third period, the negative direct-current voltage is set to generate ions in a chamber by secondary electrons that are emitted by causing ions in the chamber to collide with a substrate.

公开(公告)号：US20210268670A1

公开(公告)日：2021-09-02

申请号：US17186857

申请日：2021-02-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazuki MOYAMA ,  Kazuya NAGASEKI ,  Toshiya MATSUDA

IPC: B25J21/00 ,  B25J19/00 ,  B25J5/00

Abstract: A part transporting device for transporting a consumable part includes a part housing, a container, a robot arm, and a moving mechanism. The part housing accommodates an unused consumable part and a used consumable part. The container has an opening to be connected to a processing device and a gate valve for opening or closing the opening, the container being configured to accommodate the part housing. The robot arm is provided in the container and has at least one end effector at a tip end thereof, the robot arm transferring the used consumable part from the processing device through the opening to accommodate the used consumable part in the part housing and transferring the unused consumable part from the part housing to load the unused consumable part into the processing device through the opening. The moving mechanism has a power source and is configured to move the part transporting device.

公开(公告)号：US20200373166A1

公开(公告)日：2020-11-26

申请号：US16881073

申请日：2020-05-22

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazuki MOYAMA ,  Kazuya NAGASEKI

IPC: H01L21/3065

Abstract: A substrate processing method includes a first expanding step, a first gas supplying step, a first plasma processing step, and a first power stopping step. The first expanding step increases the volume of a gas diffusion chamber. The first gas supplying step supplies a first gas into the gas diffusion chamber. The first plasma processing step supplies radio-frequency power from a radio-frequency power supply to generate plasma in a processing chamber accommodating a substrate and reduces the volume of the gas diffusion chamber. The first power stopping step stops the supply of the radio-frequency power after the first plasma processing step.

公开(公告)号：US20190172689A1

公开(公告)日：2019-06-06

申请号：US16205558

申请日：2018-11-30

Applicant: Tokyo Electron Limited

Inventor： Kazuya NAGASEKI ,  Kazuki MOYAMA ,  Toshiya MATSUDA ,  Naokazu FURUYA ,  Tatsuro OHSHITA

IPC: H01J37/32 ,  H01L21/673 ,  C23C16/44 ,  C23C16/455 ,  C23C16/52

Abstract: An exhaust device including an exhaust mechanism and an exhaust unit is provided. The exhaust mechanism includes a first blade unit and a second blade unit provided in an exhaust space of a processing vessel including a processing space of a vacuum atmosphere for applying a process to a workpiece. The first blade unit and the second blade unit are arranged coaxially with a periphery of the workpiece, and at least one of the first blade unit and the second blade unit is rotatable. The exhaust unit is provided at a downstream side of the exhaust mechanism and communicates with the exhaust space. The exhaust unit is configured to exhaust gas in the processing vessel.

公开(公告)号：US20190148155A1

公开(公告)日：2019-05-16

申请号：US16183945

申请日：2018-11-08

Applicant: TOKYO ELECTRON LIMITED

Inventor： Shinji KUBOTA ,  Kazuya NAGASEKI ,  Akihiro YOKOTA ,  Gen TAMAMUSHI

IPC: H01L21/3065 ,  H01L21/67 ,  H01J37/32

Abstract: In a substrate processing method, electrons having a first energy are supplied from an electron beam generator into an inner space of a chamber body of a substrate processing apparatus to generate negative ions by attaching the electrons to molecules in a processing gas supplied to the inner space. Then a positive bias voltage is applied to an electrode of a supporting table that supports a substrate mounted on thereon in the inner space to attract the negative ions to the substrate.

公开(公告)号：US20250108525A1

公开(公告)日：2025-04-03

申请号：US18979706

申请日：2024-12-13

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazuki MOYAMA ,  Kazuya NAGASEKI ,  Toshiya MATSUDA

IPC: B25J21/00 ,  B25J5/00 ,  B25J19/00

Abstract: A part transporting device for transporting a consumable part includes a part housing, a container, a robot arm, and a moving mechanism. The part housing accommodates an unused consumable part and a used consumable part. The container has an opening to be connected to a processing device and a gate valve for opening or closing the opening, the container being configured to accommodate the part housing. The robot arm is provided in the container and has at least one end effector at a tip end thereof, the robot arm transferring the used consumable part from the processing device through the opening to accommodate the used consumable part in the part housing and transferring the unused consumable part from the part housing to load the unused consumable part into the processing device through the opening. The moving mechanism has a power source and is configured to move the part transporting device.

公开(公告)号：US20240068921A1

公开(公告)日：2024-02-29

申请号：US18505066

申请日：2023-11-08

Applicant: Tokyo Electron Limited

Inventor： Satoru TERUUCHI ,  Jun HIROSE ,  Kazuya NAGASEKI ,  Shinji HIMORI

IPC: G01N15/02

CPC classification number: G01N15/0227 ,  G01N15/0211 ,  G01N2015/1087

Abstract: A particle monitoring system includes a light emitting device for irradiating an inside of a plasma processing apparatus with light, and a monitoring device to be placed on a stage in the plasma processing apparatus. The monitoring device includes a base substrate, a plurality of imaging devices, and a control device. The base substrate has a plate shape. The plurality of imaging devices have optical axes facing upward on the base substrate, and are disposed apart from each other to capture images including scattered light from the particle irradiated with the light. The control device discriminates the particle in the images captured by the plurality of imaging devices.

公开(公告)号：US20210319988A1

公开(公告)日：2021-10-14

申请号：US17228222

申请日：2021-04-12

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazuki MOYAMA ,  Kazuya NAGASEKI

IPC: H01J37/32

Abstract: A substrate support stage includes a substrate mounting surface on which a substrate is mounted and a ring mount on which an edge ring is mounted. The edge ring is disposed so as to surround the substrate mounted on the substrate mounting surface. The ring mount is provided with a plurality of gas ejection ports configured to eject a gas toward a lower surface side of the edge ring to levitate the edge ring while the edge ring is being mounted on the ring mount, thereby allowing the gas to flow out from a gap between inner and outer peripheries of the lower surface side of the edge ring and the ring mount.

公开(公告)号：US20210296102A1

公开(公告)日：2021-09-23

申请号：US17342668

申请日：2021-06-09

Applicant: Tokyo Electron Limited

Inventor： Kazuya NAGASEKI ,  Kazuki MOYAMA ,  Toshiya MATSUDA ,  Naokazu FURUYA ,  Tatsuro OHSHITA

IPC: H01J37/32 ,  H01L21/673 ,  C23C16/44 ,  C23C16/52 ,  C23C16/455 ,  H01L21/67

Abstract: An exhaust device including an exhaust mechanism and an exhaust unit is provided. The exhaust mechanism includes a first blade unit and a second blade unit provided in an exhaust space of a processing vessel including a processing space of a vacuum atmosphere for applying a process to a workpiece. The first blade unit and the second blade unit are arranged coaxially with a periphery of the workpiece, and at least one of the first blade unit and the second blade unit is rotatable. The exhaust unit is provided at a downstream side of the exhaust mechanism and communicates with the exhaust space. The exhaust unit is configured to exhaust gas in the processing vessel.