公开(公告)号：US08538138B2

公开(公告)日：2013-09-17

申请号：US12893404

申请日：2010-09-29

Applicant: Shankar Krishnan ,  Pei Yean Lee ,  John Barrett Moore ,  Suresh Venkatasubramanian

Inventor： Shankar Krishnan ,  Pei Yean Lee ,  John Barrett Moore ,  Suresh Venkatasubramanian

IPC: G06K9/00 ,  G06T15/00

CPC classification number: G06K9/00214 ,  G06K9/6211 ,  G06T7/30 ,  G06T17/00 ,  G06T2207/10028

Abstract: A method for registering multiple 3D point sets by determining optimal relative positions and orientations of the 3D point sets. Initial values are determined for the rotation matrices corresponding to the relative orientations of reference frames of the 3D point sets. A registration error cost function is optimized on a product manifold of all of the rotation matrices to determine optimal values of the rotation matrices. The optimal values of the rotation matrices are used to determine optimal values for translation vectors corresponding to the relative positions of the reference frames of the 3D point sets. The 3D point sets are registered on a common reference frame using the optimal rotation matrices and the optimal translation vectors.

Abstract translation: 一种用于通过确定3D点集合的最佳相对位置和取向来登记多个3D点集的方法。 对于与3D点集的参考帧的相对取向相对应的旋转矩阵确定初始值。 在所有旋转矩阵的乘积歧管上优化注册误差成本函数，以确定旋转矩阵的最佳值。 旋转矩阵的最佳值用于确定对应于3D点集的参考帧的相对位置的平移向量的最优值。 使用最佳旋转矩阵和最优平移向量将3D点集登记在公共参考帧上。

公开(公告)号：US20130121568A1

公开(公告)日：2013-05-16

申请号：US13296417

申请日：2011-11-15

Applicant: Shankar Krishnan ,  James Klosowski

Inventor： Shankar Krishnan ,  James Klosowski

IPC: G06K9/32

CPC classification number: G06T3/4053

Abstract: A method includes receiving an image having a first resolution and generating an upsampled image having a second resolution based on the image. A multi-dimensional data structure corresponding to a multi-dimensional image space is generated from the upsampled image. Each node of the data structure is determined based on a weighted sum of values of one or more pixels in the upsampled image. Each of the one or more pixels corresponds to a pixel in the received image and is located within a region of the image space having a vertex defined by the node. A filter modifies the values of the nodes and a second upsampled image is generated based on the modified values of the nodes. Each pixel of the second upsampled image not corresponding to a pixel in the received image is determined based on a weighted sum of the modified values of one or more nodes.

Abstract translation: 一种方法包括接收具有第一分辨率的图像并基于该图像生成具有第二分辨率的上采样图像。 从上采样图像生成对应于多维图像空间的多维数据结构。 基于上采样图像中的一个或多个像素的值的加权和来确定数据结构的每个节点。 一个或多个像素中的每一个对应于接收到的图像中的像素，并且位于具有由该节点定义的顶点的图像空间的区域内。 滤波器修改节点的值，并且基于节点的修改值生成第二上采样图像。 基于一个或多个节点的修改值的加权和来确定不对应于接收图像中的像素的第二上采样图像的每个像素。

公开(公告)号：US20120320377A1

公开(公告)日：2012-12-20

申请号：US13164130

申请日：2011-06-20

Applicant: Johannes D. de Veer ,  Leonid Poslavsky ,  G. Vera Zhuang ,  Shankar Krishnan

Inventor： Johannes D. de Veer ,  Leonid Poslavsky ,  G. Vera Zhuang ,  Shankar Krishnan

IPC: G01J4/00

CPC classification number: G01N21/21 ,  G01J3/504 ,  G01N21/274

Abstract: A method to calibrate a polarizer in polarized optical system at any angle of incidence, by decoupling the calibration from a polarization effect of the system, by providing a calibration apparatus that includes a substrate having a polarizer disposed on a surface thereof, with an indicator on the substrate for indicating a polarization orientation of the polarizer, loading the calibration apparatus in the polarized optical system with the indicator in a desired position, determining an initial angle between the polarization orientation and a reference of the polarized optical system, acquiring spectra using the polarized optical system at a plurality of known angles between the polarization orientation and the reference of the polarized optical system, using the spectra to plot a curve indicating an angle of the polarizer in the polarized optical system, and when the angle of the polarizer is outside of a desired range, adjusting the angle of the polarizer, and repeating the steps of acquiring the spectra, and plotting a curve indicating the angle of the polarizer.

Abstract translation: 一种通过提供校准装置来校准偏振光学系统中任何入射角的偏振器的方法，通过提供校准装置，该校准装置包括具有设置在其表面上的偏振器的衬底， 用于指示偏振器的偏振取向的衬底，将校准装置装载在具有指示器的期望位置的偏振光学系统中，确定极化取向和偏振光学系统的基准之间的初始角度，使用偏振光 光学系统以偏振方向和偏振光学系统的基准之间的多个已知角度，使用光谱绘制指示偏振器在偏振光学系统中的角度的曲线，以及当偏振器的角度在 期望的范围，调节偏振器的角度，并重复以下步骤 获取光谱，并绘制一个指示偏振片角度的曲线。

公开(公告)号：US07755764B2

公开(公告)日：2010-07-13

申请号：US12019592

申请日：2008-01-24

Applicant: Hidong Kwak ,  Shankar Krishnan

Inventor： Hidong Kwak ,  Shankar Krishnan

IPC: G01N21/55

CPC classification number: G01B11/0625 ,  G01B11/0633 ,  G01B11/0641 ,  G01J3/02 ,  G01J3/0224 ,  G01J3/0294 ,  G01J3/447 ,  G01N21/211 ,  G01N21/33 ,  G01N2021/213 ,  G01N2201/0233

Abstract: An optical method and system for measuring characteristics of a sample using a broadband metrology tool in a purge gas flow environment are disclosed. In the method a beam path for the metrology tool is purged with purge gas at a first flow rate. A surface of the sample is illuminated by a beam of source radiation having at least one wavelength component in a vacuum ultraviolet (VUV) range and/or at least one wavelength component in an ultraviolet-visible (UV-Vis) range. A flow rate of a purge gas is adjusted between the first flow rate for metrology measurements made when the source radiation is in the VUV spectral region and a second flow rate for metrology measurements made when the source radiation is in the UV-Vis spectral region. The system includes a light source, illumination optics, collection optics, detector, a purge gas source and a controller. The purge gas source is configured to supply a flow of purge gas to a beam path in the light source and/or illumination optics and/or sample and/or collection optics and/or detector. The controller is configured to control a flow rate of the purged gas flow in response to an output signal from the detector.

Abstract translation: 公开了一种用于在吹扫气体流动环境中使用宽带测量工具测量样品的特性的光学方法和系统。 在该方法中，用第一流量的吹扫气体吹扫计量工具的光束路径。 通过在紫外 - 可见（UV-Vis）范围内具有真空紫外（VUV）范围和/或至少一个波长分量的至少一个波长分量的源辐射束照射样品的表面。 当源辐射处于VUV光谱区域时进行的度量测量的第一流量和当源辐射处于UV-Vis光谱区域时进行度量测量的第二流量时，净化气体的流量被调节。 该系统包括光源，照明光学器件，收集光学器件，检测器，吹扫气体源和控制器。 吹扫气体源被配置为向光源和/或照明光学器件和/或样品和/或收集光学元件和/或检测器中的光束路径提供净化气体流。 控制器被配置为响应于来自检测器的输出信号来控制净化气体流量的流量。

公开(公告)号：US07453562B1

公开(公告)日：2008-11-18

申请号：US11863334

申请日：2007-09-28

Applicant: Torsten R. Kaack ,  Shankar Krishnan ,  Fabio A. Faccini

Inventor： Torsten R. Kaack ,  Shankar Krishnan ,  Fabio A. Faccini

IPC: G01N21/00

CPC classification number: G01N21/33

Abstract: A method of performing a measurement of properties of a sample, by directing a first beam of light at the sample, where a combination of the wavelength, energy, and length of time is sufficient to cause temporary damage to the sample. The first beam is reflected from the sample. The properties of the reflected beam are sensed to create a signal. A length of time is waited, sufficient for the damage to substantially heal, before a second beam of light is directed at the sample, where a combination of the wavelength, energy, and length of time is sufficient to cause temporary damage to the sample. The second beam is reflected from the sample. The properties of the reflected beam are sensed to create a signal. The first and second electrical signals are analyzed to determine the properties of the sample.

Abstract translation: 通过在样品处引入第一光束，其中波长，能量和时间长度的组合足以引起对样品的暂时损坏，来执行样品的性质的测量的方法。 第一个光束从样品反射。 感测反射光束的特性以产生信号。 在第二光束被引导到样品之前等待长度的时间足以使损伤基本上愈合，其中波长，能量和时间长度的组合足以引起对样品的暂时损坏。 第二个光束从样品反射。 感测反射光束的特性以产生信号。 分析第一和第二电信号以确定样品的性质。

公开(公告)号：US07221454B2

公开(公告)日：2007-05-22

申请号：US10504796

申请日：2003-02-13

Applicant: D. Scott Hampton ,  Shankar Krishnan ,  James Rix

Inventor： D. Scott Hampton ,  Shankar Krishnan ,  James Rix

IPC: G01J4/00

CPC classification number: G01J4/04 ,  G01J3/447

Abstract: In a device for measuring the complete polarization state of light over a spectral bandwidth, an optical input signal (41) with wavelengths of light within a spectral band is incident on two or more diffraction gratings (42, 44, 46, 48), or incident from at least two directions on one or more diffraction gratings (72, 74), and the intensity is measured as a function of wavelength for at least four of the diffraction spectra produced by the grating(s). The polarization state of light is then calculated as a function of wavelength over the spectral bandwidth from the intensity measurements.

Abstract translation: 在用于在光谱带宽上测量光的完全偏振状态的装置中，光谱波段内的波长的光输入信号（41）入射到两个或更多个衍射光栅（42,44,46,48）上，或 在一个或多个衍射光栅（72,74）上从至少两个方向入射，并且对于由光栅产生的至少四个衍射光谱，测量强度作为波长的函数。 然后，根据强度测量，光的偏振状态被计算为光谱带宽上的波长的函数。

公开(公告)号：US07006222B2

公开(公告)日：2006-02-28

申请号：US10339518

申请日：2003-01-08

Applicant: Shankar Krishnan

Inventor： Shankar Krishnan

IPC: G01J4/00

CPC classification number: G01J4/00 ,  G01B11/06 ,  G01B11/065

Abstract: A system for performing single wavelength ellipsometry (SWE) on a thin film on a multi-layer substrate such as silicon-on-insulator (SOI) applies a measurement beam having an absorption distance less than the thickness of the superficial layer of the multi-layer substrate. For example, for an SOI substrate, the measurement beam is selected to have a wavelength that results in an absorption distance that is less than the superficial silicon layer thickness. The system can include a cleaning laser to provide concurrent cleaning to enhance measurement accuracy without negatively impacting throughput. The measurement beam source can be configured to provide a measurement beam at one wavelength and a cleaning beam at a longer wavelength, so that the absorption depth of the measurement beam is less than the superficial layer thickness while the absorption depth of the cleaning beam is greater than the superficial layer thickness.

Abstract translation: 在诸如绝缘体上硅（SOI）的多层基板上的薄膜上执行单波长椭偏仪（SWE）的系统应用具有小于多层膜的表层的厚度的吸收距离的测量光束， 层基板。 例如，对于SOI衬底，测量光束被选择为具有导致小于表面硅层厚度的吸收距离的波长。 该系统可以包括清洁激光器以提供同时清洁以提高测量精度，而不会不利地影响生产量。 测量光束源可以被配置为提供一个波长的测量光束和较长波长的清洁光束，使得测量光束的吸收深度小于表面层厚度，而清洁光束的吸收深度更大 比表面层厚度。

公开(公告)号：US20050018189A1

公开(公告)日：2005-01-27

申请号：US10504796

申请日：2003-02-13

Applicant: D. Hampton ,  Shankar Krishnan ,  James Rix

Inventor： D. Hampton ,  Shankar Krishnan ,  James Rix

IPC: G01J3/447 ,  G01J4/04 ,  G01J4/00

CPC classification number: G01J4/04 ,  G01J3/447

Abstract: In a device for measuring the complete polarization state of light over a spectral bandwidth, an optical input signal (41) with wavelengths of light within a spectral band is incident on two or more diffraction gratings (42, 44, 46, 48), or incident from at least two directions on one or more diffraction gratings (72, 74), and the intensity is measured as a function of wavelength for at least four of the diffraction spectra produced by the grating(s). The polarization state of light is then calculated as a function of wavelength over the spectral bandwidth from the intensity measurements.

Abstract translation: 在用于在光谱带宽上测量光的完全偏振状态的装置中，光谱波段内的波长的光输入信号（41）入射到两个或更多个衍射光栅（42,44,46,48）上，或 在一个或多个衍射光栅（72,74）上从至少两个方向入射，并且对于由光栅产生的至少四个衍射光谱，测量强度作为波长的函数。 然后，根据强度测量，光的偏振状态被计算为光谱带宽上的波长的函数。

公开(公告)号：US06710890B1

公开(公告)日：2004-03-23

申请号：US10375554

申请日：2003-02-26

Applicant: Shankar Krishnan ,  Christopher M. Pohlhammer ,  Michael P. Green

Inventor： Shankar Krishnan ,  Christopher M. Pohlhammer ,  Michael P. Green

IPC: G01B1106

CPC classification number: G01B11/0608

Abstract: An apparatus for measuring a thickness of a substrate having an upper surface, without contacting the upper surface of the substrate. A platen having a base surface receives the substrate, and a reference surface is disposed at a known first height from the platen surface. A non contact sensor senses the known first height of the reference surface without making physical contact with the reference surface. The non contact sensor further senses a relative difference between the known first height of the reference surface and a second height of the upper surface of the substrate without making physical contact with the upper surface of the substrate. A controller controls the sensor and determines the thickness of the substrate based at least in part on the known first height of the reference surface and the relative difference between the known first height of the reference surface and the second height of the upper surface of the substrate.

Abstract translation: 一种用于测量具有上表面的基板的厚度而不与基板的上表面接触的装置。 具有基面的台板容纳基板，并且参考表面设置在距压板表面已知的第一高度处。 非接触传感器感测参考表面的已知第一高度，而不与参考表面物理接触。 非接触式传感器进一步感测参考表面的已知第一高度与衬底的上表面的第二高度之间的相对差异，而不与衬底的上表面物理接触。 控制器控制传感器并且至少部分地基于参考表面的已知第一高度和参考表面的已知第一高度与衬底的上表面的第二高度之间的相对差异来确定衬底的厚度 。

公开(公告)号：US20150176915A1

公开(公告)日：2015-06-25

申请号：US14134937

申请日：2013-12-19

Applicant: Shankar Krishnan ,  Brian Jarrett

Inventor： Shankar Krishnan ,  Brian Jarrett

IPC: F28D15/04

CPC classification number: F28D15/04 ,  F28F13/00 ,  F28F2013/006 ,  G06F1/20 ,  H01L23/42 ,  H01L23/427 ,  H01L23/473

Abstract: An apparatus that interfaces thermal transfer components is described. The apparatus includes a soft, thermally conductive metal that enables a capillary flow path with a contact surface of a thermal transfer component and an imbibing thermal interface material. The thermal transfer component is a heat sink. The thermally conductive metal includes large pores that intertwine with smaller pores of the contact surface.

Abstract translation: 描述了接触热转印组件的装置。 该装置包括柔软的导热金属，其能够使具有热传递部件的接触表面和吸收热界面材料的毛细管流动路径。 热转印组件是散热器。 导热金属包括与接触表面的较小孔交织的大孔。