公开(公告)号：US20190115411A1

公开(公告)日：2019-04-18

申请号：US16133936

申请日：2018-09-18

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Kwang Woo PARK ,  Jeong Won KIM ,  Dong Ki LEE ,  Jin Ho JU

IPC: H01L27/32 ,  H01L51/52 ,  G06F3/044

CPC classification number: H01L27/3272 ,  G06F3/0412 ,  G06F3/0416 ,  G06F3/044 ,  G06F3/0443 ,  G06F3/0446 ,  G06F2203/04111 ,  G06F2203/04112 ,  H01L27/3218 ,  H01L27/323 ,  H01L27/3248 ,  H01L51/524 ,  H01L51/5253 ,  H01L51/5281 ,  H01L51/5284

Abstract: A display device includes a substrate including a display region including a plurality of pixels and a non-display region at one side of the display region; at least one transistor on the substrate; a light emitting element connected to the transistor; a thin film encapsulation layer covering the light emitting element; a plurality of light blocking patterns on the thin film encapsulation layer, the plurality of light blocking patterns corresponding to at least a portion of a non-emission region of each pixel, and a planarization layer covering the light blocking patterns; and a touch sensor including a plurality of touch electrodes on the planarization layer. None of the light blocking patterns overlap touch electrodes.

公开(公告)号：US20160170295A1

公开(公告)日：2016-06-16

申请号：US14671822

申请日：2015-03-27

Applicant: Samsung Display Co., Ltd.

Inventor： Kwang Woo PARK ,  Jun Hyuk WOO ,  Jeong Won KIM ,  Seung Bo SHIM ,  Jin Ho JU

IPC: G03F1/38 ,  G03F7/32 ,  G03F7/36 ,  G03F7/20

CPC classification number: G03F1/54 ,  G03F7/2024 ,  G03F7/203

Abstract: A photomask is provided. A photomask, comprising: a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough.

Abstract translation: 提供光掩模。 一种光掩模，包括：透明基板; 以及设置在所述透明基板上的多个滤光层，其中所述滤光层包括选择性地透射第一波长光的第一滤光层以及选择性地透过第二波长光的第二滤光层。

公开(公告)号：US20140162177A1

公开(公告)日：2014-06-12

申请号：US14180234

申请日：2014-02-13

Applicant: Samsung Display Co., Ltd.

Inventor： Bong-Yeon KIM ,  Min KANG ,  Jeong Won KIM ,  Jin Ho JU ,  Jun Hyuk WOO ,  Hyun Joo LEE

IPC: G03F1/38

CPC classification number: G03F1/32 ,  G03F1/38

Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 μm, and a transmission ratio of the halftone layer may range from about 10% to about 50%.

Abstract translation: 提供了用于形成图案的光学掩模。 光掩模包括：基板，其包括形成在基板的部分上的遮光图案，其中遮光图案包括形成在半色调层上的半色调层和遮光层，并且半色调层和遮光层与该重叠部分重叠 至少露出半色调层的边缘部分。 遮光图案的间距可以为约6μm，并且网版层的透射率可以在约10％至约50％的范围内。