公开(公告)号：US09741827B2

公开(公告)日：2017-08-22

申请号：US14508858

申请日：2014-10-07

Applicant: Samsung Display Co., Ltd. ,  DONGWOO FINE-CHEM Co., Ltd.

Inventor： Jong-Hyun Choung ,  In-Bae Kim ,  Hong-Sick Park ,  Seon-Il Kim ,  In-Seol Kuk ,  Gi-Yong Nam ,  Young-Chul Park ,  In-Ho Yu ,  Young-Jin Yoon ,  Suck-Jun Lee

IPC: C23F1/18 ,  H01L29/66 ,  H01L27/12 ,  H01L21/3213 ,  C23F1/02 ,  C23F1/26 ,  H01L29/45 ,  H01L29/49

CPC classification number: H01L29/66765 ,  C23F1/02 ,  C23F1/18 ,  C23F1/26 ,  H01L21/32134 ,  H01L27/124 ,  H01L27/1259 ,  H01L29/458 ,  H01L29/4908

Abstract: An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a N (nitrogen atom)-containing heterocyclic compound from 0.5 to 5 wt %; a chloride compound from 0.1 to 5 wt %; a copper salt from 0.05 to 3 wt %; an organic acid or an organic acid salt from 0.1 to 10 wt %; an electron-donating compound from at 0.1 to 5 wt %; and a solvent of the residual amount. Also provided is a method of manufacturing a display device by using the same.

公开(公告)号：US20160109745A1

公开(公告)日：2016-04-21

申请号：US14982317

申请日：2015-12-29

Applicant: Samsung Display Co., Ltd.

Inventor： Hong Sick PARK ,  Seon-Il Kim ,  Min Ho Moon ,  Hyang-Shik KONG ,  Yeun Tae KIM ,  Chang Oh JEONG

IPC: G02F1/1345 ,  G02F1/1341 ,  G02F1/1362 ,  G02F1/1368 ,  G02F1/1333

CPC classification number: G02F1/13458 ,  G02F1/133305 ,  G02F1/133377 ,  G02F1/1341 ,  G02F1/136286 ,  G02F1/1368

Abstract: The present invention relates to a display device and a manufacturing method thereof, wherein a spoilage layer generated in a manufacturing process is removed, and a manufacturing method of a display device according to an exemplary embodiment of the present invention includes: forming a thin film transistor on a substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in the pixel area; forming a sacrificial layer on the pixel electrode; forming a barrier layer on the sacrificial layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode; patterning the barrier layer, the common electrode, and the roof layer to exposed a portion of the sacrificial layer thereby forming an injection hole; removing the sacrificial layer to form a microcavity for a plurality of pixel areas; removing the barrier layer.

Abstract translation: 本发明涉及一种显示装置及其制造方法，其中在制造过程中产生的腐败层被去除，并且根据本发明的示例性实施例的显示装置的制造方法包括：形成薄膜晶体管 在包括多个像素区域的基板上; 在所述像素区域中形成连接到所述薄膜晶体管的像素电极; 在像素电极上形成牺牲层; 在牺牲层上形成阻挡层; 在阻挡层上形成公共电极; 在公共电极上形成屋顶层; 图案化阻挡层，公共电极和屋顶层，以暴露部分牺牲层，从而形成注入孔; 去除所述牺牲层以形成用于多个像素区域的微腔; 去除阻挡层。