公开(公告)号：US20150193918A1

公开(公告)日：2015-07-09

申请号：US14665880

申请日：2015-03-23

Applicant: NuFlare Technology, Inc. ,  KABUSHIKI KAISHA TOSHIBA

Inventor： Takanao TOUYA ,  Shuichi Tamamushi ,  Hidenori Sato ,  Hiroyuki Tanizaki ,  Takeshi Fujiwara ,  Eiji Sawa ,  Kentaro Okuda ,  Hiroyuki Ikeda ,  Hiromu Inoue ,  Hiroshi Tsukada

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G01N21/9501 ,  G01N21/9503 ,  G01N21/956 ,  G06T7/0004 ,  G06T7/0006 ,  G06T7/70 ,  G06T7/74 ,  G06T2207/10004 ,  G06T2207/30141 ,  G06T2207/30148

Abstract: A method and system for imaging an object to be inspected and obtaining an optical image; creating a reference image from design pattern data; preparing an inspection recipe including one or more templates and parameter settings necessary for the inspection; checking the pattern and the template against each other, and selecting the reference image which corresponds to the template; detecting first and second edges in the selected reference image in accordance with the parameter setting using determined coordinates as a reference; detecting first and second edges in the optical image, this optical image corresponds to the selected reference image; and determining an inspection value by acquiring the difference between the line width of the optical image and the reference image using the first edge and second edge of the reference image and the first edge and second edges of the optical image.

Abstract translation: 一种用于对待检查对象进行成像并获得光学图像的方法和系统; 从设计模式数据创建参考图像; 准备包括一个或多个模板和检查所需的参数设置的检查配方; 检查图案和模板，并选择与模板对应的参考图像; 根据使用确定的坐标作为参考的参数设置来检测所选参考图像中的第一和第二边缘; 检测光学图像中的第一和第二边缘，该光学图像对应于所选择的参考图像; 以及通过使用参考图像的第一边缘和第二边缘以及光学图像的第一边缘和第二边缘获取光学图像的线宽和参考图像之间的差来确定检查值。

公开(公告)号：US20130216953A1

公开(公告)日：2013-08-22

申请号：US13768258

申请日：2013-02-15

Applicant: NuFlare Technology, Inc.

Inventor： Takanao TOUYA ,  Takahito NAKAYAMA

IPC: G21K5/08

CPC classification number: G21K5/08 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3174

Abstract: An electron beam writing apparatus comprising a stage that a sample is placed on, an electron optical column, an electron gun emitting an electron beam disposed in the optical column, an electrostatic lens provided with electrodes aligned in an axial direction of the electron beam disposed in the optical column, and a voltage supply device for applying positive voltage constantly to the electrostatic lens. A shield plate is disposed between the XY stage and the electron optical column to block reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam. The electrostatic lens is disposed immediately above the shield plate to change a focal position of the electron beam. A voltage supply device applies a positive voltage constantly to the electrostatic lens.

Abstract translation: 一种电子束写入装置，包括放置样品的电极，电子光学柱，发射设置在光学柱中的电子束的电子枪，设置有沿着电子束的轴向排列的电极的静电透镜， 光学柱，以及用于向静电透镜恒定施加正电压的电压供给装置。 屏蔽板设置在XY平台和电子光学柱之间以阻挡通过用电子束照射到样品产生的反射电子或二次电子。 静电透镜设置在屏蔽板的正上方，以改变电子束的焦点位置。 电压供给装置将静电透镜恒定地施加正电压。

公开(公告)号：US20130149646A1

公开(公告)日：2013-06-13

申请号：US13706903

申请日：2012-12-06

Applicant: NuFlare Technology, Inc.

Inventor： Takanao TOUYA ,  Munehiro Ogasawara

IPC: G21K5/08

CPC classification number: G21K5/08 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3174 ,  H01J2237/31774 ,  H01J2237/31776

Abstract: Provided is a charged particle beam writing apparatus including a stage which a sample can be mounted thereon, an irradiation unit which emits a charged particle beam to be irradiated on the sample, and an aperture plate which includes a first opening portion to shape the charged particle beam. The aperture plate has a stacked structure of a first member and a second member, and a position of an end portion of the first opening portion in the second member is recessed from the position of the end portion of the first opening portion in the first member.

Abstract translation: 本发明提供了一种带电粒子束书写装置，包括可以将样品安装在其上的阶段，发射照射在样本上的带电粒子束的照射单元和包括第一开口部分以形成带电粒子的孔板 光束。 孔板具有第一构件和第二构件的堆叠结构，并且第二构件中的第一开口部的端部的位置从第一构件中的第一开口部的端部的位置凹陷 。