公开(公告)号：US20210310968A1

公开(公告)日：2021-10-07

申请号：US16841301

申请日：2020-04-06

Applicant: KLA Corporation

Inventor： Alexander Kuznetsov ,  Boxue Chen ,  Nikolay Artemiev

IPC: G01N23/20008 ,  G21K1/10 ,  G21K1/06 ,  G01N23/201

Abstract: Optical elements that efficiently propagate x-ray radiation over a desired energy range and reject radiation outside the desired energy range are presented herein. In one aspect, one or more optical elements of an x-ray based system include an integrated optical filter including one or more material layers that absorb radiation having energy outside the desired energy band. In general, the integrated filter improves the optical performance of an x-ray based system by suppressing reflectivity within infrared (IR), visible (vis), ultraviolet (UV), extreme ultraviolet (EUV) portions of the spectrum, or any other undesired wavelength region. In a further aspect, one or more diffusion barrier layers prevent degradation of the integrated optical filter, prevent diffusion between the integrated optical filter and other material layers, or both. In some embodiments, the thickness of one or more material layers of an integrated optical filter vary over the spatial area of the filter.

公开(公告)号：US20210207956A1

公开(公告)日：2021-07-08

申请号：US17137840

申请日：2020-12-30

Applicant: KLA Corporation

Inventor： Andrei V. Shchegrov ,  Nadav Gutman ,  Alexander Kuznetsov ,  Antonio Arion Gellineau

IPC: G01B15/00 ,  G03F7/20

Abstract: Methods and systems for performing overlay and edge placement errors based on Soft X-Ray (SXR) scatterometry measurement data are presented herein. Short wavelength SXR radiation focused over a small illumination spot size enables measurement of design rule targets or in-die active device structures. In some embodiments, SXR scatterometry measurements are performed with SXR radiation having energy in a range from 10 to 5,000 electronvolts. As a result, measurements at SXR wavelengths permit target design at process design rules that closely represents actual device overlay. In some embodiments, SXR scatterometry measurements of overlay and shape parameters are performed simultaneously from the same metrology target to enable accurate measurement of Edge Placement Errors. In another aspect, overlay of aperiodic device structures is estimated based on SXR measurements of design rule targets by calibrating the SXR measurements to reference measurements of the actual device target.

公开(公告)号：US11796390B2

公开(公告)日：2023-10-24

申请号：US17856660

申请日：2022-07-01

Applicant: KLA Corporation

Inventor： Tianhan Wang ,  Aaron Rosenberg ,  Dawei Hu ,  Alexander Kuznetsov ,  Manh Dang Nguyen ,  Stilian Pandev ,  John Lesoine ,  Qiang Zhao ,  Liequan Lee ,  Houssam Chouaib ,  Ming Di ,  Torsten R. Kaack ,  Andrei V. Shchegrov ,  Zhengquan Tan

IPC: G01J3/18 ,  G01J3/28 ,  G01N21/55 ,  G01N21/956 ,  G01N21/21 ,  G01N21/25 ,  G01N21/88 ,  G01N21/84

CPC classification number: G01J3/18 ,  G01J3/28 ,  G01N21/21 ,  G01N21/25 ,  G01N21/55 ,  G01N21/8422 ,  G01N21/8851 ,  G01N21/956 ,  G01J2003/2836 ,  G01N2021/8883

Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.

公开(公告)号：US20210404979A1

公开(公告)日：2021-12-30

申请号：US17468489

申请日：2021-09-07

Applicant: KLA Corporation

Inventor： Alexander Kuznetsov ,  Boxue Chen ,  Nikolay Artemiev

IPC: G01N23/20008 ,  G21K1/06 ,  G21K1/10 ,  G01N23/201

Abstract: Optical elements that efficiently propagate x-ray radiation over a desired energy range and reject radiation outside the desired energy range are presented herein. In one aspect, one or more optical elements of an x-ray based system include an integrated optical filter including one or more material layers that absorb radiation having energy outside the desired energy band. In general, the integrated filter improves the optical performance of an x-ray based system by suppressing reflectivity within infrared (IR), visible (vis), ultraviolet (UV), extreme ultraviolet (EUV) portions of the spectrum, or any other undesired wavelength region. In a further aspect, one or more diffusion barrier layers prevent degradation of the integrated optical filter, prevent diffusion between the integrated optical filter and other material layers, or both. In some embodiments, the thickness of one or more material layers of an integrated optical filter vary over the spatial area of the filter.

公开(公告)号：US20210055237A1

公开(公告)日：2021-02-25

申请号：US17079243

申请日：2020-10-23

Applicant: KLA Corporation

Inventor： Andrei V. Shchegrov ,  Alexander Kuznetsov ,  Oleg Khodykin

IPC: G01N23/223 ,  G01N23/2273 ,  G01N23/083 ,  G01N23/207 ,  G02B27/09 ,  H05G1/30

Abstract: Methods and systems for measuring structural and material characteristics of semiconductor structures based on combined x-ray reflectometry (XRR) and x-ray photoelectron spectroscopy (XPS) are presented herein. A combined XRR and XPS system includes an x-ray illumination source and x-ray illumination optics shared by both the XRR and XPS measurement subsystems. This increases throughput and measurement accuracy by simultaneously collecting XRR and XPS measurement data from the same area of the wafer. A combined XRR and XPS system improves measurement accuracy by employing XRR measurement data to improve measurements performed by the XPS subsystem, and vice-versa. In addition, a combined XRR and XPS system enables simultaneous analysis of both XRR and XPS measurement data to more accurately estimate values of one of more parameters of interest. In a further aspect, any of measurement spot size, photon flux, beam shape, beam diameter, and illumination energy are independently controlled.

公开(公告)号：US20240288388A1

公开(公告)日：2024-08-29

申请号：US18657427

申请日：2024-05-07

Applicant: KLA Corporation

Inventor： Alexander Kuznetsov ,  Boxue Chen ,  Nikolay Artemiev

IPC: G01N23/20008 ,  G01N23/201 ,  G21K1/06 ,  G21K1/10

CPC classification number: G01N23/20008 ,  G01N23/201 ,  G21K1/062 ,  G21K1/10 ,  G01N2223/6116

Abstract: Optical elements that efficiently propagate x-ray radiation over a desired energy range and reject radiation outside the desired energy range are presented herein. In one aspect, one or more optical elements of an x-ray based system include an integrated optical filter including one or more material layers that absorb radiation having energy outside the desired energy band. In general, the integrated filter improves the optical performance of an x-ray based system by suppressing reflectivity within infrared (IR), visible (vis), ultraviolet (UV), extreme ultraviolet (EUV) portions of the spectrum, or any other undesired wavelength region. In a further aspect, one or more diffusion barrier layers prevent degradation of the integrated optical filter, prevent diffusion between the integrated optical filter and other material layers, or both. In some embodiments, the thickness of one or more material layers of an integrated optical filter vary over the spatial area of the filter.

公开(公告)号：US12025575B2

公开(公告)日：2024-07-02

申请号：US17468489

申请日：2021-09-07

Applicant: KLA Corporation

Inventor： Alexander Kuznetsov ,  Boxue Chen ,  Nikolay Artemiev

IPC: G01N23/20008 ,  G01N23/201 ,  G21K1/06 ,  G21K1/10

CPC classification number: G01N23/20008 ,  G01N23/201 ,  G21K1/062 ,  G21K1/10 ,  G01N2223/6116

Abstract: Optical elements that efficiently propagate x-ray radiation over a desired energy range and reject radiation outside the desired energy range are presented herein. In one aspect, one or more optical elements of an x-ray based system include an integrated optical filter including one or more material layers that absorb radiation having energy outside the desired energy band. In general, the integrated filter improves the optical performance of an x-ray based system by suppressing reflectivity within infrared (IR), visible (vis), ultraviolet (UV), extreme ultraviolet (EUV) portions of the spectrum, or any other undesired wavelength region. In a further aspect, one or more diffusion barrier layers prevent degradation of the integrated optical filter, prevent diffusion between the integrated optical filter and other material layers, or both. In some embodiments, the thickness of one or more material layers of an integrated optical filter vary over the spatial area of the filter.

公开(公告)号：US11536674B2

公开(公告)日：2022-12-27

申请号：US17079243

申请日：2020-10-23

Applicant: KLA Corporation

Inventor： Andrei V. Shchegrov ,  Alexander Kuznetsov ,  Oleg Khodykin

IPC: G01N23/223 ,  G01N23/2273 ,  G01N23/083 ,  G01N23/207 ,  G02B27/09 ,  H05G1/30

Abstract: Methods and systems for measuring structural and material characteristics of semiconductor structures based on combined x-ray reflectometry (XRR) and x-ray photoelectron spectroscopy (XPS) are presented herein. A combined XRR and XPS system includes an x-ray illumination source and x-ray illumination optics shared by both the XRR and XPS measurement subsystems. This increases throughput and measurement accuracy by simultaneously collecting XRR and XPS measurement data from the same area of the wafer. A combined XRR and XPS system improves measurement accuracy by employing XRR measurement data to improve measurements performed by the XPS subsystem, and vice-versa. In addition, a combined XRR and XPS system enables simultaneous analysis of both XRR and XPS measurement data to more accurately estimate values of one of more parameters of interest. In a further aspect, any of measurement spot size, photon flux, beam shape, beam diameter, and illumination energy are independently controlled.

公开(公告)号：US20220357673A1

公开(公告)日：2022-11-10

申请号：US17488010

申请日：2021-09-28

Applicant: KLA Corporation

Inventor： Stilian Pandev ,  Min-Yeong Moon ,  Andrei V. Shchegrov ,  Jonathan Madsen ,  Dimitry Sanko ,  Liran Yerushalmi ,  Alexander Kuznetsov ,  Mahendra Dubey

IPC: G03F7/20

Abstract: A self-calibrating overlay metrology system may receive device overlay data from device targets on a sample, determine preliminary device overlay measurements for the device targets including device-scale features using an overlay recipe with the device overlay data as inputs, receive assist overlay data from sets of assist targets on the sample including device-scale features, where a particular set of assist targets includes one or more target pairs formed with two overlay targets having programmed overlay offsets of a selected value with opposite signs along a particular measurement direction. The system may further determine self-calibrating assist overlay measurements for the sets of assist targets based on the assist overlay data, where the self-calibrating assist overlay measurements are linearly proportional to overlay on the sample, and generate corrected overlay measurements for the device targets by adjusting the preliminary device overlay measurements based on the self-calibrating assist overlay measurements.

公开(公告)号：US11143604B1

公开(公告)日：2021-10-12

申请号：US16841301

申请日：2020-04-06

Applicant: KLA Corporation

Inventor： Alexander Kuznetsov ,  Boxue Chen ,  Nikolay Artemiev

IPC: G01N23/20008 ,  G21K1/10 ,  G01N23/201 ,  G21K1/06

Abstract: Optical elements that efficiently propagate x-ray radiation over a desired energy range and reject radiation outside the desired energy range are presented herein. In one aspect, one or more optical elements of an x-ray based system include an integrated optical filter including one or more material layers that absorb radiation having energy outside the desired energy band. In general, the integrated filter improves the optical performance of an x-ray based system by suppressing reflectivity within infrared (IR), visible (vis), ultraviolet (UV), extreme ultraviolet (EUV) portions of the spectrum, or any other undesired wavelength region. In a further aspect, one or more diffusion barrier layers prevent degradation of the integrated optical filter, prevent diffusion between the integrated optical filter and other material layers, or both. In some embodiments, the thickness of one or more material layers of an integrated optical filter vary over the spatial area of the filter.