Photoelectric Conversion Layer and Applications Thereof to Solar Cell, Photodiode and Image Sensor
    11.
    发明申请
    Photoelectric Conversion Layer and Applications Thereof to Solar Cell, Photodiode and Image Sensor 审中-公开
    光电转换层及其应用于太阳能电池,光电二极管和图像传感器

    公开(公告)号:US20150083211A1

    公开(公告)日:2015-03-26

    申请号:US14488671

    申请日:2014-09-17

    Abstract: The present disclosure provides a photoelectric conversion layer containing a semiconductor and plural metal-containing minute structures dispersed therein. The minute structures are minute structures (A) comprising metal material (α) or otherwise minute structures (B) comprising metal material (α) and material (β) selected from the group consisting of oxide, nitride and oxynitride of substances and the semiconductor. In the minute structures (B), the material (β) is on the surface of the metal material (α). Each of the minute structures has an equivalent circle diameter of 1 nm to 10 nm inclusive on the basis of the projected area when observed from a particular direction. The closest distance between adjacent two of the minute structures is 3 nm to 50 nm inclusive. The present disclosure also provides applications of the photoelectric conversion layer to a solar cell, a photodiode and an image sensor.

    Abstract translation: 本公开提供了包含分散在其中的半导体和多个含金属的微结构的光电转换层。 微结构是包含金属材料(α)的微小结构(A)或包含金属材料(α)的微结构(B)和选自物质的氧化物,氮化物和氧氮化物的材料(&bgr),半导体 。 在微结构(B)中,材料(“bgr”)在金属材料(α)的表面上。 基于从特定方向观察时的投影面积,每个微小结构具有1nm至10nm的等效圆直径。 相邻的两个微小结构之间的最接近的距离为3nm至50nm(包括端值)。 本公开还提供了光电转换层到太阳能电池,光电二极管和图像传感器的应用。

    PATTERN FORMATION METHOD, MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD, AND FINE PARTICLE DISPERSION
    12.
    发明申请
    PATTERN FORMATION METHOD, MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD, AND FINE PARTICLE DISPERSION 审中-公开
    图案形成方法,磁记录介质制造方法和细颗粒分散

    公开(公告)号:US20150072071A1

    公开(公告)日:2015-03-12

    申请号:US14164593

    申请日:2014-01-27

    CPC classification number: G11B5/855 C09D4/00

    Abstract: According to one embodiment, there is provided a pattern formation method including coating a substrate or mask layer with a fine particle coating solution containing fine particles including a protective group having a close surface polarity and containing, on at least surfaces thereof, a material selected from the group consisting of Al, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Sn, Mo, Ta, W, and oxides thereof, a viscosity modifier, and a solvent for adjusting mixing of the viscosity modifier and the fine particles having the protective group, thereby forming a fine particle layer on the substrate or mask layer.

    Abstract translation: 根据一个实施方案,提供了一种图案形成方法,其包括用包含具有密合表面极性的保护基的细颗粒的细颗粒涂布溶液涂覆基材或掩模层,在至少表面上至少含有选自 由Al,Ti,V,Cr,Mn,Fe,Co,Ni,Zn,Y,Zr,Sn,Mo,Ta,W及其氧化物组成的组,粘度调节剂和用于调节 粘度调节剂和具有保护基的微粒,从而在基材或掩模层上形成微粒层。

    MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD
    13.
    发明申请
    MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD 有权
    磁记录介质制造方法

    公开(公告)号:US20140004272A1

    公开(公告)日:2014-01-02

    申请号:US13658658

    申请日:2012-10-23

    CPC classification number: G11B5/84 G11B5/746 G11B5/855

    Abstract: According to one embodiment, there is provided a magnetic recording medium manufacturing method including forming a resist layer on a magnetic recording layer, patterning the resist layer, forming a magnetic pattern by performing ion implantation through the resist layer, partially modifying the surface of the magnetic recording layer, removing the resist, applying a self-organization material to the surface of the magnetic recording layer and forming a dotted mask pattern, and patterning the magnetic recording layer.

    Abstract translation: 根据一个实施例,提供了一种磁记录介质制造方法,包括在磁记录层上形成抗蚀剂层,图案化抗蚀剂层,通过通过抗蚀剂层进行离子注入形成磁图案,部分改变磁性表面 记录层,去除抗蚀剂,将自组织材料施加到磁记录层的表面并形成虚线掩模图案,并对磁记录层进行构图。

    PATTERN FORMATION METHOD AND MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD
    17.
    发明申请
    PATTERN FORMATION METHOD AND MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD 有权
    图形形成方法和磁记录介质制造方法

    公开(公告)号:US20150069013A1

    公开(公告)日:2015-03-12

    申请号:US14152249

    申请日:2014-01-10

    CPC classification number: G11B5/855

    Abstract: According to one embodiment, a magnetic recording layer is coated with a fine particle coating solution containing fine particles coated with a protective layer containing a first additive including a straight-chain structure for increasing wettability to the magnetic recording layer, and a carboxy group or the like, and a second additive including a carboxy group or the like and a polymerizable functional group, each fine particle having, on at least a surface thereof, a material selected from Al, Si, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Sn, Mo, Ta, W, and oxides thereof, thereby forming a fine particle monolayer, and heat or light energy is applied, thereby curing the protective layer and forming a periodic pattern.

    Abstract translation: 根据一个实施例,磁记录层涂覆有包含涂覆有保护层的细颗粒的细颗粒涂布溶液,该保护层含有包含用于提高对磁记录层的润湿性的直链结构的第一添加剂,以及羧基或 以及包含羧基等的第二添加剂和可聚合官能团,每个细颗粒至少在其表面上具有选自Al,Si,Ti,V,Cr,Mn,Fe,Co的材料 ,Ni,Zn,Y,Zr,Sn,Mo,Ta,W及其氧化物,由此形成细颗粒单层,并施加热能或光能,从而固化保护层并形成周期性图案。

    PATTERN FORMING METHOD, METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING MEDIUM
    18.
    发明申请
    PATTERN FORMING METHOD, METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING MEDIUM 有权
    图案形成方法,制造磁记录介质和磁记录介质的方法

    公开(公告)号:US20150069010A1

    公开(公告)日:2015-03-12

    申请号:US14194458

    申请日:2014-02-28

    CPC classification number: G11B5/84 G11B5/855

    Abstract: A patterning method includes steps of forming a first copolymer layer comprising a first diblock copolymer which has portions which are phase incompatible. The first copolymer layer is annealed to form a first phase pattern including a first phase dispersed in a second surrounding phase. The first copolymer is then etched forming a first topographic pattern that corresponds to the first phase pattern. A second copolymer layer of a second diblock copolymer is then formed over the first topographic pattern, and then annealed to generate a second phase pattern offset from the first topographic pattern. Etching is used to form a second topographic pattern corresponding to the second phase pattern. The first and second topographic patterns are then transferred to the substrate. The patterning method can be used, for example, to form patterned recording layers for magnetic storage devices.

    Abstract translation: 图案化方法包括形成第一共聚物层的步骤,所述第一共聚物层包含具有相位不相容部分的第一二嵌段共聚物。 第一共聚物层被退火以形成包括分散在第二周围相中的第一相的第一相图案。 然后蚀刻第一共聚物,形成对应于第一相图形的第一形貌图案。 然后在第一形貌图上形成第二二嵌段共聚物的第二共聚物层,然后退火以产生偏离第一形貌图案的第二相图案。 蚀刻用于形成对应于第二相图案的第二形貌图案。 然后将第一和第二地形图转移到基底。 图案化方法可以用于例如形成用于磁存储装置的图案化记录层。

    PATTERN FORMING METHOD AND MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM
    19.
    发明申请
    PATTERN FORMING METHOD AND MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM 审中-公开
    磁记录介质的图案形成方法和制造方法

    公开(公告)号:US20140287266A1

    公开(公告)日:2014-09-25

    申请号:US14017217

    申请日:2013-09-03

    CPC classification number: G11B5/743 G11B5/855

    Abstract: According to exemplary embodiments, a pattern forming method includes: forming a diblock copolymer coating film by applying coating liquid containing a diblock copolymer including a chain of a first polymer and a chain of a second polymer which is not compatible with the first polymer, and a homopolymer having affinity with the first polymer, on a substrate, and drying the liquid; and performing phase separation of the first polymer and the second polymer by providing a coating film for solvent annealing using a solvent having compatibility with the second polymer.

    Abstract translation: 根据示例性实施方案,图案形成方法包括:通过涂覆含有包含第一聚合物链和与第一聚合物不相容的第二聚合物链的二嵌段共聚物的涂布液形成二嵌段共聚物涂膜,以及 在第一聚合物上具有亲和力的均聚物,在基材上,并干燥该液体; 并且通过使用与第二聚合物相容的溶剂提供用于溶剂退火的涂膜来进行第一聚合物和第二聚合物的相分离。

    MAGNETIC RECORDING MEDIUM, METHOD OF MANUFACTURING THE SAME, MAGNET RECORDING/REPRODUCTION APPARATUS, AND STAMPER MANUFACTURING METHOD
    20.
    发明申请
    MAGNETIC RECORDING MEDIUM, METHOD OF MANUFACTURING THE SAME, MAGNET RECORDING/REPRODUCTION APPARATUS, AND STAMPER MANUFACTURING METHOD 审中-公开
    磁记录介质,其制造方法,磁记录/再现装置和冲压器制造方法

    公开(公告)号:US20140120375A1

    公开(公告)日:2014-05-01

    申请号:US13752876

    申请日:2013-01-29

    CPC classification number: G11B5/84 G11B5/855

    Abstract: According to one embodiment, a magnetic recording medium manufacturing method includes a step of coating the mask layer with a metal fine particle coating solution containing metal fine particles and a first solvent, thereby forming a metal fine particle coating layer having a multilayered structure of the metal fine particles, and a step of dropping, on the coating layer, a second solvent having a second solubility parameter having a difference of 0 to 12.0 from a first solubility parameter of the first solvent, thereby forming a monolayered metal fine particle film by washing away excessive metal fine particles and changing the multilayered structure of the metal fine particles into a monolayer. The projections pattern is made of the monolayered metal fine particle film.

    Abstract translation: 根据一个实施方案,磁记录介质的制造方法包括用含有金属微粒和第一溶剂的金属细颗粒涂布溶液涂覆掩模层的步骤,由此形成金属微粒涂层,其具有金属的多层结构 以及在第一溶剂的第一溶解度参数下,在涂层上滴加第二溶解度参数为0〜12.0的第二溶剂的步骤,通过洗去形成单层金属微粒膜 过量的金属微粒,并将金属微粒的多层结构变为单层。 突起图案由单层金属微粒膜制成。

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