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公开(公告)号：US10136509B2
公开(公告)日：2018-11-20
申请号：US15616167
申请日：2017-06-07
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Yutaka Shiraishi , Shinya Ikesaka , Takanobu Ishihara , Toshiro Umeki
IPC: H05G2/00
Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
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公开(公告)号：US09894744B2
公开(公告)日：2018-02-13
申请号：US15062896
申请日：2016-03-07
Applicant: Gigaphoton Inc.
Inventor： Fumio Iwamoto , Yutaka Shiraishi , Tsukasa Hori , Takuya Ishii
CPC classification number: H05G2/008 , G03F7/70908 , H05G2/005
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of greater than 90 degrees with the target.
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13.发明授权公开(公告)号：US09699877B2
公开(公告)日：2017-07-04
申请号：US15096769
申请日：2016-04-12
Applicant: GIGAPHOTON INC.
Inventor： Tsukasa Hori , Fumio Iwamoto , Hiroshi Umeda
IPC: H05G2/00
Abstract: In an example of the present invention is an extreme ultraviolet light generation apparatus including: a droplet supply device configured to successively supply droplets; a charging electrode being configured to control charging of droplets supplied from the droplet supply unit; and a target controller configured to control electric polarities of the droplets supplied from the droplet supply unit by controlling potential of the charging electrode in such a way that successive droplets join together to become a target droplet, wherein the droplets controlled in charging by the charging electrode include a plurality of groups each composed of successive droplets, and, in each of the groups, a droplet at one end is charged positively or negatively, a droplet at the other end is uncharged or charged in a polarity being the same as a polarity of an adjacent droplet in a group adjacent to the droplet at the other end.
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公开(公告)号：US09497842B2
公开(公告)日：2016-11-15
申请号：US14992506
申请日：2016-01-11
Applicant: GIGAPHOTON INC
Inventor： Tsukasa Hori , Kouji Kakizaki , Tatsuya Yanagida , Osamu Wakabayashi , Hakaru Mizoguchi
CPC classification number: H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号：US09167678B2
公开(公告)日：2015-10-20
申请号：US14201671
申请日：2014-03-07
Applicant: GIGAPHOTON INC.
Inventor： Tsukasa Hori , Kouji Kakizaki , Tatsuya Yanagida , Osamu Wakabayashi
CPC classification number: H05G2/008 , H01S3/02 , H01S3/094026 , H01S3/10061 , H01S3/1106 , H01S3/131 , H01S3/1636 , H01S3/1643 , H01S3/2232 , H01S3/2316 , H01S3/2383 , H05G2/003 , H05G2/005
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
Abstract translation: 一种系统，包括：室，激光束装置，被配置为产生要被引入到所述腔室中的激光束;激光控制器，用于激光束装置至少控制激光束的光束强度和输出定时;以及目标 供给单元，被配置为将目标材料供应到所述室中，所述目标材料被所述激光束照射以产生极紫外光。
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Patent Agency Ranking
公开(公告)号：US10251255B2
公开(公告)日：2019-04-02
申请号：US16137312
申请日：2018-09-20
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Kouji Kakizaki , Tatsuya Yanagida , Osamu Wakabayashi , Hakaru Mizoguchi
IPC: H05G2/00 , H01S3/23 , H01S3/104 , H01S3/16 , H01S3/223 , H01S3/11 , H01S3/09 , H01S3/00 , H01S3/102
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号：US10251253B2
公开(公告)日：2019-04-02
申请号：US15888110
申请日：2018-02-05
Applicant: Gigaphoton Inc.
Inventor： Fumio Iwamoto , Tsukasa Hori , Toshiyuki Hirashita
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation device may include a chamber in which a target is irradiated with laser light and extreme ultraviolet light is generated, and a target supply unit configured to eject a target into the chamber. The target supply unit may be provided with a nozzle member including an ejection face having an ejection port configured to eject the target into the chamber. An angle θ1 defined by the ejection face and the gravity axis may satisfy a condition of “0 degrees
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公开(公告)号：US10237961B2
公开(公告)日：2019-03-19
申请号：US16155192
申请日：2018-10-09
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Yutaka Shiraishi , Shinya Ikesaka , Takanobu Ishihara , Toshiro Umeki
IPC: H05G2/00
Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
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19.发明授权公开(公告)号：US10028365B2
公开(公告)日：2018-07-17
申请号：US15697954
申请日：2017-09-07
Applicant: Gigaphoton Inc.
Inventor： Takanobu Ishihara , Tsukasa Hori , Takashi Saito , Yutaka Shiraishi
Abstract: A chamber device may include a chamber, and a target generation device assembled into the chamber and configured to supply a target material into the chamber, the target generation device including a tank configured to store the target material, a temperature variable device configured to vary temperature of the target material in the tank, and a nozzle section in which a nozzle hole configured to output the target material in a liquid form is formed, and the chamber device may further include a gas nozzle having an inlet port facing the nozzle section and configured to introduce gas into the chamber, a gas supply source configured to supply gas containing hydrogen to the gas nozzle to supply the gas containing the hydrogen to at least periphery of the nozzle section, and a moisture remover configured to remove moisture at least in the periphery of the nozzle section in the chamber.
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20.发明授权公开(公告)号：US09860967B2
公开(公告)日：2018-01-02
申请号：US15210296
申请日：2016-07-14
Applicant: Gigaphoton Inc.
Inventor： Hirokazu Hosoda , Tsukasa Hori
IPC: H05G2/00
Abstract: A target supply apparatus configured to melt a target and supply a molten target into a chamber, the target generating extreme ultraviolet light when the target is irradiated with a laser beam in the chamber, may include: a pair of electrodes spaced from one another and configured to sandwich the target; and a power source configured to supply a current to a solid target sandwiched between the pair of electrodes via the pair of electrodes to melt the solid target to a core of the solid target.
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