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公开(公告)号：US10028366B2
公开(公告)日：2018-07-17
申请号：US15645295
申请日：2017-07-10
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Fumio Iwamoto , Kazukiyo Kamikanna
Abstract: An EUV light generation device generates EUV light stably. The EUV light generation device may include a chamber in which extreme ultraviolet light is generated when a target is irradiated with laser light in a predetermined region inside the chamber, a target supply device configured to output the target to the predetermined region in the chamber to thereby supply the target to the predetermined region, and a target recovery apparatus configured to recover the target output from the target supply device and not irradiated with the laser light. The target recovery apparatus may include a receiver disposed to be inclined with respect to a trajectory of the target output from the target supply device, the receiver being configured to receive the target by allowing the target not irradiated with the laser light to collide with the receiver, and an excitation device configured to vibrate the receiver.
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公开(公告)号：US10582600B2
公开(公告)日：2020-03-03
申请号：US16244492
申请日：2019-01-10
Applicant: Gigaphoton Inc.
Inventor： Kazukiyo Kamikanna , Fumio Iwamoto
IPC: H05G2/00
Abstract: A droplet collection device may include a collecting container, a collision plate arranged in the collecting container and configured such that a droplet supplied from the opening to the collecting container is to collide with the collision plate, and a buffer member arranged on an opening side with respect to the collision plate and configured to mitigate impact of the droplet colliding with the collision plate. The buffer member may have a wire rod bundle configured such that multiple wire rods are bundled and fixed to a plate member. The wire rods may be made of carbon, and the plate member may be made of graphite. The wire rods may be fixed to the plate member with a graphitized adhesive with the wire rods being arranged in one direction.
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公开(公告)号：US10225917B2
公开(公告)日：2019-03-05
申请号：US16001441
申请日：2018-06-06
Applicant: GIGAPHOTON INC.
Inventor： Takahisa Fujimaki , Takayuki Yabu , Yuta Takashima , Fumio Iwamoto , Yutaka Shiraishi
Abstract: A target supply device may include a nozzle configured to output a liquid target substance contained in a tank, an excitation element, a droplet detection unit configured to detect a droplet output from the nozzle, a passage time interval measurement unit configured to measure a passage time interval of droplets, and a control unit. The control unit may be configured to set a proper range of the passage time interval, change the duty value of the electric signal to be input to the excitation element, store the passage time interval measurement values of the droplets generated with respect to a plurality of duty values and variation thereof in association with the duty values, and determine an operation duty value based on the variation from among the duty values with which the passage time interval measurement values are within the proper range, among the duty values.
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公开(公告)号：US10143074B2
公开(公告)日：2018-11-27
申请号：US14992477
申请日：2014-06-13
Applicant: GIGAPHOTON INC.
Inventor： Tomohide Ichinose , Fumio Iwamoto , Yutaka Shiraishi , Tsukasa Hori , Hideo Hoshino
Abstract: A filter may include: a first member having a first surface provided with a channel; and a second member set with a second surface thereof covering the channel. The first member may include a first passable portion that allows a fluid to pass between the first surface and a first space, which is defined beside a surface of the first member opposite to the first surface, through a first area of the channel. The second member may include a second passable portion that allows the fluid to pass between the second surface and a second space, which is defined beside a surface of the second member opposite to the second surface, through a second area of the channel distanced from the first area.
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公开(公告)号：US11659646B2
公开(公告)日：2023-05-23
申请号：US17493407
申请日：2021-10-04
Applicant: Gigaphoton Inc.
Inventor： Koji Yamasaki , Fumio Iwamoto
IPC: H05G2/00
Abstract: A target supply device may include a tank configured to store a target substance, a pressure adjuster configured to adjust a pressure in the tank, a filter configured to filter the target substance in the tank, a nozzle configured to output a droplet of the target substance having passed through the filter, a droplet detector configured to detect outputting of the droplet from the nozzle, and a processor configured to control the pressure adjuster so that a pressure-increasing speed of the pressure in the tank is higher after detection of outputting of the droplet than before detection of outputting of the droplet, during a period in which the pressure in the tank is increased to a target pressure from a pressure at which outputting of the droplet is detected by the droplet detector for the first time after installation of the target supply device.
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Patent Agency Ranking
公开(公告)号：US09949354B2
公开(公告)日：2018-04-17
申请号：US14879754
申请日：2015-10-09
Applicant: Gigaphoton Inc.
Inventor： Takashi Saito , Fumio Iwamoto , Osamu Wakabayashi , Takayuki Yabu
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus includes a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a parameter for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on the parameter measured by the droplet measurement unit.
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公开(公告)号：US09894744B2
公开(公告)日：2018-02-13
申请号：US15062896
申请日：2016-03-07
Applicant: Gigaphoton Inc.
Inventor： Fumio Iwamoto , Yutaka Shiraishi , Tsukasa Hori , Takuya Ishii
CPC classification number: H05G2/008 , G03F7/70908 , H05G2/005
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of greater than 90 degrees with the target.
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8.发明授权公开(公告)号：US09699877B2
公开(公告)日：2017-07-04
申请号：US15096769
申请日：2016-04-12
Applicant: GIGAPHOTON INC.
Inventor： Tsukasa Hori , Fumio Iwamoto , Hiroshi Umeda
IPC: H05G2/00
Abstract: In an example of the present invention is an extreme ultraviolet light generation apparatus including: a droplet supply device configured to successively supply droplets; a charging electrode being configured to control charging of droplets supplied from the droplet supply unit; and a target controller configured to control electric polarities of the droplets supplied from the droplet supply unit by controlling potential of the charging electrode in such a way that successive droplets join together to become a target droplet, wherein the droplets controlled in charging by the charging electrode include a plurality of groups each composed of successive droplets, and, in each of the groups, a droplet at one end is charged positively or negatively, a droplet at the other end is uncharged or charged in a polarity being the same as a polarity of an adjacent droplet in a group adjacent to the droplet at the other end.
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9.发明授权公开(公告)号：US12185449B2
公开(公告)日：2024-12-31
申请号：US17934469
申请日：2022-09-22
Applicant: Gigaphoton Inc.
Inventor： Fumio Iwamoto , Yutaka Shiraishi
Abstract: An EUV light generation apparatus to generate EUV light by irradiating a target with pulse laser light to turn the target into plasma includes a chamber, a target supply unit configured to supply the target to a plasma generation region in the chamber, a pulse laser device configured to generate pulse laser light to be radiated to the target, and a processor configured to change a generation frequency of the target generated by the target supply unit to a natural number multiple of an irradiation frequency of the pulse laser light based on a size of the target or related information related to the size of the target.
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公开(公告)号：US11360391B2
公开(公告)日：2022-06-14
申请号：US16925567
申请日：2020-07-10
Applicant: Gigaphoton Inc.
Inventor： Fumio Iwamoto , Yutaka Shiraishi , Tsukasa Hori
Abstract: A target supply device includes a tank body portion holding a target substance; a communication portion connected to the tank body portion and including a filter that filters the melted target substance and a nozzle that discharges the target substance having passed through the filter; a main heater that heats the tank body portion; a sub-heater that heats the communication portion; and a control unit, the control unit being configured to set the main heater to a temperature higher than a melting point of the target substance before the target substance is melted, to set the sub-heater to a temperature lower than the melting point of the target substance until the target substance in the tank body portion is melted, and to set the sub-heater to a temperature higher than the melting point of the target substance after the target substance in the tank body portion is melted.
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