公开(公告)号：US20140253716A1

公开(公告)日：2014-09-11

申请号：US14201327

申请日：2014-03-07

Applicant: GIGAPHOTON INC.

Inventor： Takashi SAITO ,  Naoyoshi IMACHI ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/005 ,  H05G2/008

Abstract: A chamber for an extreme ultraviolet light generation apparatus is a chamber into which droplets are sequentially outputted, and may include an image capturing unit configured to repeatedly capture images of the droplets during an image capturing time set so that images of two adjacent droplets that have been outputted do not overlap.

Abstract translation: 用于极紫外光发生装置的室是依次输出液滴的室，并且可以包括图像捕获单元，其被配置为在设置的图像捕获时间期间反复捕获液滴的图像，使得已经存在两个相邻液滴的图像 输出不重叠。

公开(公告)号：US20200301285A1

公开(公告)日：2020-09-24

申请号：US16894652

申请日：2020-06-05

Applicant: Gigaphoton Inc.

Inventor： Shinji NAGAI ,  Takashi SAITO

IPC: G03F7/20 ,  B82Y10/00

Abstract: An extreme ultraviolet light generation device configured to generate extreme ultraviolet light by irradiating a target containing tin with a pulse laser beam includes a chamber container, a hydrogen gas supply unit configured to supply hydrogen gas into the chamber container, a heat shield disposed between the chamber container and a predetermined region in which the target is irradiated with the pulse laser beam inside the chamber container, a first cooling medium flow path disposed in the chamber container, a second cooling medium flow path disposed in the heat shield, and a cooling device configured to supply a first cooling medium to the first cooling medium flow path and supply a second cooling medium to the second cooling medium flow path so that a temperature of the heat shield becomes lower than a temperature of the chamber container.

公开(公告)号：US20160087389A1

公开(公告)日：2016-03-24

申请号：US14960579

申请日：2015-12-07

Applicant: GIGAPHOTON INC.

Inventor： Motoki NIWANO ,  Takashi SAITO

IPC: H01S3/00 ,  G02F1/03 ,  H01S3/13 ,  H01S3/23 ,  H05G2/00 ,  H01S3/10

CPC classification number: H01S3/0085 ,  G02F1/03 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/10015 ,  H01S3/1301 ,  H01S3/2316 ,  H05G2/003 ,  H05G2/008

Abstract: A laser system capable of appropriately controlling the energy of a laser beam pulse is provided. An exemplary laser system of the present disclosure may control an optical isolator to switch from a closed state to an open state and then to return to the closed state for each of the laser beam pulses repeatedly outputted from a master oscillator. The laser system may control the optical attenuator to set an optical transmittance of the optical attenuator for each of the laser beam pulses repeatedly outputted from the master oscillator.

Abstract translation: 提供能够适当地控制激光束脉冲的能量的激光系统。 本公开的示例性激光系统可以控制光隔离器从关闭状态切换到打开状态，然后对于从主振荡器重复输出的每个激光束脉冲返回关闭状态。 激光系统可以控制光衰减器以对从主振荡器重复输出的每个激光束脉冲设置光衰减器的光透射率。

公开(公告)号：US20160066401A1

公开(公告)日：2016-03-03

申请号：US14937332

申请日：2015-11-10

Applicant: GIGAPHOTON INC.

Inventor： Takayuki YABU ,  Takashi SAITO ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/2006 ,  G03F7/70033 ,  H05G2/006

Abstract: There is provided an extreme ultraviolet light generating system. The extreme ultraviolet light generating system may include: a laser apparatus configured to provide pulsed laser light inside a chamber in which EUV light is generated; an optical shutter disposed on an optical path of the pulsed laser light; and a controller configured to open or close the optical shutter, based on a generation signal supplied from an external unit, the generation signal instructing generation of the EUV light.

Abstract translation: 提供了一种极紫外光发生系统。 所述极紫外光发生系统可以包括：激光装置，被配置为在其内产生EUV光的室内提供脉冲激光; 设置在所述脉冲激光的光路上的光学快门; 以及控制器，其被配置为基于从外部单元提供的生成信号来打开或关闭所述光学快门，所述生成信号指示所述EUV光的产生。

公开(公告)号：US20150188277A1

公开(公告)日：2015-07-02

申请号：US14657640

申请日：2015-03-13

Applicant: Gigaphoton Inc.

Inventor： Krzysztof NOWAK ,  Takashi SUGANUMA ,  Takashi SAITO ,  Yasufumi KAWASUJI

IPC: H01S3/034 ,  H01S3/23 ,  H01S3/223

CPC classification number: H01S3/034 ,  H01S3/03 ,  H01S3/076 ,  H01S3/0971 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2366 ,  H01S3/2375 ,  H01S2301/02 ,  H05G2/008

Abstract: There is provided a slab amplifier including an optical system (48, 51) provided in a chamber (47) to allow a seed beam having entered from a first window into the space between a pair of electrodes (42, 43) to be repeatedly reflected between the space so that the seed beam is amplified to be an amplified beam; a first aperture plate (61) provided between the first window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the seed beam and equal to or smaller than a dimension of the first window; and a second aperture plate (62) provided between the second window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the amplified beam and equal to or smaller than a dimension of the second window.

Abstract translation: 提供了一种平板放大器，包括设置在室（47）中的光学系统（48,51），以允许从第一窗口进入的种子束进入一对电极（42,43）之间的空间中，以反复反射 在空间之间，使得种子束被放大为放大的光束; 设置在所述第一窗口和所述电极之间并且具有等于或大于所述种子束的横截面的尺寸的开口并且等于或小于所述第一窗口的尺寸的第一孔板（61） 以及设置在第二窗口和电极之间并具有等于或大于放大光束的横截面的尺寸的开口并且等于或小于第二窗口的尺寸的第二孔板（62）。