公开(公告)号：US20190020167A1

公开(公告)日：2019-01-17

申请号：US16020595

申请日：2018-06-27

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC: H01S3/036 ,  B01D53/04 ,  B01D53/68 ,  B01D53/86 ,  B01D53/82 ,  B01D53/34 ,  H01S3/225 ,  H01S3/104

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US20180241170A1

公开(公告)日：2018-08-23

申请号：US15953835

申请日：2018-04-16

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Masanori YASHIRO ,  Osamu WAKABAYASHI

IPC: H01S3/036 ,  H01S3/134

CPC classification number: H01S3/036 ,  H01S3/134 ,  H01S3/2251 ,  H01S3/2256

Abstract: A laser gas purifying system to purify laser gas emitted from a laser apparatus and return purified gas to the laser apparatus may include a first pipe configured to pass the laser gas emitted from the laser apparatus, a purifying apparatus connected to the first pipe and configured to purify the laser gas emitted from the laser apparatus, a second pipe connected to the purifying apparatus and configured to return the purified gas purified by the purifying apparatus to the laser apparatus, and an exhausting device provided in at least one of the first pipe, the purifying apparatus, and the second pipe.

公开(公告)号：US20170288361A1

公开(公告)日：2017-10-05

申请号：US15631676

申请日：2017-06-23

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC: H01S3/036 ,  H01S3/225 ,  B01D53/68 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  H01S3/104 ,  B01D53/04

CPC classification number: H01S3/036 ,  B01D53/0446 ,  B01D53/346 ,  B01D53/685 ,  B01D53/82 ,  B01D53/86 ,  B01D2251/404 ,  B01D2251/602 ,  B01D2253/108 ,  B01D2255/20753 ,  B01D2255/20761 ,  B01D2257/2027 ,  B01D2258/0216 ,  B01D2259/40003 ,  H01S3/104 ,  H01S3/225

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.