公开(公告)号：US09680277B2

公开(公告)日：2017-06-13

申请号：US14657640

申请日：2015-03-13

Applicant: Gigaphoton Inc.

Inventor： Krzysztof Nowak ,  Takashi Suganuma ,  Takashi Saito ,  Yasufumi Kawasuji

IPC: H01S3/034 ,  H01S3/07 ,  H01S3/09 ,  H01S3/23 ,  H01S3/223 ,  H01S3/22 ,  H01S3/0971 ,  H01S3/03 ,  H05G2/00

CPC classification number: H01S3/034 ,  H01S3/03 ,  H01S3/076 ,  H01S3/0971 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2366 ,  H01S3/2375 ,  H01S2301/02 ,  H05G2/008

Abstract: There is provided a slab amplifier including an optical system (48, 51) provided in a chamber (47) to allow a seed beam having entered from a first window into the space between a pair of electrodes (42, 43) to be repeatedly reflected between the space so that the seed beam is amplified to be an amplified beam; a first aperture plate (61) provided between the first window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the seed beam and equal to or smaller than a dimension of the first window; and a second aperture plate (62) provided between the second window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the amplified beam and equal to or smaller than a dimension of the second window.

公开(公告)号：US09439276B2

公开(公告)日：2016-09-06

申请号：US14937332

申请日：2015-11-10

Applicant: GIGAPHOTON INC.

Inventor： Takayuki Yabu ,  Takashi Saito ,  Osamu Wakabayashi

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/2006 ,  G03F7/70033 ,  H05G2/006

Abstract: There is provided an extreme ultraviolet light generating system. The extreme ultraviolet light generating system may include: a laser apparatus configured to provide pulsed laser light inside a chamber in which EUV light is generated; an optical shutter disposed on an optical path of the pulsed laser light; and a controller configured to open or close the optical shutter, based on a generation signal supplied from an external unit, the generation signal instructing generation of the EUV light.

Abstract translation: 提供了一种极紫外光发生系统。 所述极紫外光发生系统可以包括：激光装置，被配置为在其内产生EUV光的室内提供脉冲激光; 设置在所述脉冲激光的光路上的光学快门; 以及控制器，其被配置为基于从外部单元提供的生成信号来打开或关闭所述光学快门，所述生成信号指示所述EUV光的产生。