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    Test apparatus for reflective cavity characterization
    11.
    发明授权
    Test apparatus for reflective cavity characterization 有权
    用于反射腔表征的测试装置

    公开(公告)号：US09140647B2

    公开(公告)日：2015-09-22

    申请号：US14543649

    申请日：2014-11-17

    Applicant: Applied Materials, Inc.

    Inventor： Joseph M. Ranish ,  Joseph Johnson ,  Mehran Behdjat

    IPC: G01N21/55 ,  G01N21/47

    CPC classification number: G01N21/55 ,  G01N21/4738 ,  G01N2201/08

    Abstract: An apparatus for reflectivity measurement is provided. The apparatus generally measures reflectivity characteristics of a reflective surface, such as a reflective cavity of a light array. The apparatus generally comprises a body defining a volume and a light emitting element disposed outside the volume. A sensor coupled to the body detects light reflected from a reflective surface. Various embodiments provide positioning of the apparatus relative to a light array having a reflective cavity.

    Abstract translation: 提供了一种用于反射率测量的装置。 该装置通常测量反射表面的反射率特性，例如光阵列的反射腔。 该装置通常包括限定体积的体和设置在体积外的发光元件。 耦合到身体的传感器检测从反射表面反射的光。 各种实施例提供了装置相对于具有反射腔的光阵列的定位。

    Slit valve door with moving mating part
    12.
    发明授权
    Slit valve door with moving mating part 有权

    公开(公告)号：US10453718B2

    公开(公告)日：2019-10-22

    申请号：US14035829

    申请日：2013-09-24

    Applicant: Applied Materials, Inc.

    Inventor： Mehran Behdjat ,  Shinichi Kurita ,  John M. White ,  Suhail Anwar ,  Makoto Inagawa

    IPC: H01L21/67 ,  F16K51/02

    Abstract: Embodiments disclosed herein generally relate to a slit valve door assembly for sealing an opening in a chamber. A slit valve door that is pressed against the chamber to seal the slit valve opening moves with the chamber as the slit valve opening shrinks so that an o-ring pressed between the slit valve door and the chamber may move with the slit valve door and the chamber. Thus, less rubbing of the o-ring against the chamber may occur. With less rubbing, fewer particles may be generated and the o-ring lifetime may be extended. With a longer lifetime for the o-ring, substrate throughput may be increased.

    Apparatus for reducing the effect of contamination on a rapid thermal process
    16.
    发明授权
    Apparatus for reducing the effect of contamination on a rapid thermal process 有权
    用于减少污染对快速热过程的影响的装置

    公开(公告)号：US09514969B2

    公开(公告)日：2016-12-06

    申请号：US14550781

    申请日：2014-11-21

    Applicant: Applied Materials, Inc.

    Inventor： Aaron Miller ,  Mehran Behdjat ,  Norman L. Tam ,  Michael Liu

    IPC: H01L21/67 ,  H01L21/66 ,  H01L21/324 ,  H01L21/687

    CPC classification number: H01L21/67115 ,  H01L21/67248 ,  H01L21/68792

    Abstract: Embodiments of the present disclosure provide a cover assembly that includes a cover disposed between a device side surface of a substrate and a reflector plate, which are disposed within a thermal processing chamber. The presence of the cover between the device side surface of a substrate and a reflector plate has many advantages over conventional thermal processing chamber designs, which include an improved temperature uniformity during processing, a reduced chamber down time and an improved cost-of-ownership of the processes performed in the thermal processing chamber. In some configurations, the cover includes two or more ports that are formed therein and are positioned to deliver a gas, from a space formed between the reflector plate and the cover, to desired regions of the substrate during processing to reduce the temperature variation across the substrate.

    Abstract translation: 本公开的实施例提供一种盖组件，其包括设置在基板的装置侧表面和反射板之间的盖，所述盖设置在热处理室内。 衬底的器件侧表面与反射板之间的存在与常规热处理室设计相比具有许多优点，其包括在处理期间改进的温度均匀性，减少的室停机时间和改进的拥有成本 在热处理室中进行的处理。 在一些构造中，盖包括形成在其中的两个或更多个端口，并且被定位成在处理期间将气体从形成在反射板和盖之间的空间传送到基板的期望区域，以减少横跨 基质。

    Support cylinder for thermal processing chamber
    17.
    发明授权
    Support cylinder for thermal processing chamber 有权
    支撑筒用于热处理室

    公开(公告)号：US09385004B2

    公开(公告)日：2016-07-05

    申请号：US14298389

    申请日：2014-06-06

    Applicant: Applied Materials, Inc.

    Inventor： Mehran Behdjat ,  Aaron Muir Hunter ,  Joseph M. Ranish ,  Norman Tam ,  Jeffrey Tobin ,  Jiping Li ,  Martin Tran

    IPC: H01L21/683 ,  H01L21/324 ,  F16C13/00 ,  B05D7/22 ,  H01L21/67 ,  H01L21/687

    CPC classification number: H01L21/68735 ,  H01L21/324 ,  H01L21/67115 ,  H01L21/68757

    Abstract: Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder comprises a ring body having an inner peripheral surface and an outer peripheral surface, wherein the ring body comprises an opaque quartz glass material and wherein the ring body is coated with an optical transparent layer. The optical transparent layer has a coefficient of thermal expansion that is substantially matched or similar to the opaque quartz glass material to reduce thermal expansion mismatch that may cause thermal stress under high thermal loads. In one example, the opaque quartz glass material is synthetic black quartz and the optical transparent layer comprises a clear fused quartz material.

    Abstract translation: 本公开的实施例一般涉及在热处理室中使用的支撑筒。 在一个实施例中，支撑筒包括具有内周表面和外周表面的环体，其中环体包括不透明的石英玻璃材料，并且其中环体涂覆有光学透明层。 光学透明层的热膨胀系数基本上与不透明的石英玻璃材料匹配或类似，以减少在高热负荷下可能引起热应力的热膨胀失配。 在一个实例中，不透明石英玻璃材料是合成黑色石英，光学透明层包括透明的熔融石英材料。

    Support ring with masked edge
    18.
    发明授权
    Support ring with masked edge 有权
    支撑环带有遮光边

    公开(公告)号：US09330955B2

    公开(公告)日：2016-05-03

    申请号：US14218597

    申请日：2014-03-18

    Applicant: Applied Materials, Inc.

    Inventor： Mehran Behdjat ,  Norman L. Tam ,  Aaron Muir Hunter ,  Joseph M. Ranish ,  Koji Nakanishi ,  Toshiyuki Nakagawa

    IPC: B23Q3/00 ,  H01L21/687

    CPC classification number: H01L21/68757 ,  C23C16/50 ,  H01L21/67115 ,  H01L21/68735 ,  H01L2221/683

    Abstract: A support ring for semiconductor processing is provided. The support ring includes a ring shaped body defined by an inner edge and an outer edge. The inner edge and outer edge are concentric about a central axis. The ring shaped body further includes a first side, a second side, and a raised annular shoulder extending from the first side of the ring shaped body at the inner edge. The support ring also includes a coating on the first side. The coating has an inner region of reduced thickness region abutting the raised annular shoulder.

    Abstract translation: 提供了用于半导体处理的支撑环。 支撑环包括由内边缘和外边缘限定的环形体。 内边缘和外边缘围绕中心轴线是同心的。 环形体还包括在内边缘处从环形体的第一侧延伸的第一侧，第二侧和凸起的环形肩部。 支撑环还包括在第一侧上的涂层。 涂层具有邻近凸起的环形肩部的厚度减小的内部区域。

    Test apparatus for reflective cavity characterization
    19.
    发明授权
    Test apparatus for reflective cavity characterization 有权
    用于反射腔表征的测试装置

    公开(公告)号：US08896837B1

    公开(公告)日：2014-11-25

    申请号：US13922712

    申请日：2013-06-20

    Applicant: Applied Materials, Inc.

    Inventor： Joseph M. Ranish ,  Joseph Johnson ,  Mehran Behdjat

    IPC: G01N21/55

    CPC classification number: G01N21/55 ,  G01N21/4738 ,  G01N2201/08

    Abstract: An apparatus for reflectivity measurement is provided. The apparatus generally measures reflectivity characteristics of a reflective surface, such as a reflective cavity of a light array. The apparatus generally comprises a body defining a volume and a light emitting element disposed outside the volume. A sensor coupled to the body detects light reflected from a reflective surface. Various embodiments provide positioning of the apparatus relative to a light array having a reflective cavity.

    Abstract translation: 提供了一种用于反射率测量的装置。 该装置通常测量反射表面的反射率特性，例如光阵列的反射腔。 该装置通常包括限定体积的体和设置在体积外的发光元件。 耦合到身体的传感器检测从反射表面反射的光。 各种实施例提供了装置相对于具有反射腔的光阵列的定位。

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