公开(公告)号：US09481608B2

公开(公告)日：2016-11-01

申请号：US14088216

申请日：2013-11-22

Applicant: Applied Materials, Inc.

Inventor： Ashish Bhatnagar ,  Laxman Murugesh ,  Padma Gopalakrishnan

IPC: C04B41/00 ,  B23K26/00 ,  H01L21/67 ,  H01L21/683 ,  C03B25/02

CPC classification number: C04B41/0036 ,  B23K26/352 ,  C03B25/02 ,  H01L21/67115 ,  H01L21/6831 ,  Y10T428/131

Abstract: A method of fabricating a processing chamber component comprises forming a processing chamber component having a structural body with surface regions having microcracks, and directing a laser beam onto the microcracks of the surface regions of the structural body for a sufficient time to heal and close off the microcracks by themselves.

Abstract translation: 一种制造处理室部件的方法包括形成具有结构体的处理室部件，该结构体具有具有微裂纹的表面区域，并且将激光束引导到结构体的表面区域的微裂纹上足够的时间来愈合和闭合 微裂纹自己

公开(公告)号：US09227297B2

公开(公告)日：2016-01-05

申请号：US14219913

申请日：2014-03-19

Applicant: Applied Materials, Inc.

Inventor： Irfanulla Khuddus Rahmathullah ,  Bopanna Ichettira Vansantha ,  Padma Gopalakrishnan ,  Abraham Palaty ,  Aswathnarayanaiah Ravi ,  Ashish Bhatnagar ,  Young J. Paik ,  Stacy Meyer ,  Daniel Martin

IPC: B24B37/30 ,  B24B37/32

CPC classification number: B24B37/32

Abstract: A retaining ring includes a generally annular upper portion having a top surface configured to be connected to a base of a carrier head and a lower surface, and a plurality of substantially identical arcuate segments detachably secured to the upper portion to form an annular lower portion. Each of the arcuate segments has an upper surface that abuts the lower surface of the upper portion and a bottom surface for contacting a polishing pad during polishing.

Abstract translation: 保持环包括大致环形的上部，其具有构造成连接到承载头和下表面的基部的顶表面，以及可拆卸地固定到上部以形成环形下部的多个基本相同的弧形段。 每个弧形段具有邻接上部下表面的上表面和用于在抛光过程中接触抛光垫的底表面。

公开(公告)号：US09168631B2

公开(公告)日：2015-10-27

申请号：US13907658

申请日：2013-05-31

Applicant: Applied Materials, Inc.

Inventor： Irfanulla Khuddus Rahmathullah ,  Bopanna Ichettira Vansantha ,  Padma Gopalakrishnan ,  Aswathnarayanaiah Ravi ,  Abraham Palaty ,  Young J. Paik ,  Stacy Meyer ,  James Klingler ,  Ashish Bhatnagar

IPC: B24B37/32

CPC classification number: B24B37/32

Abstract: A retaining ring includes an annular lower portion and an annular upper portion. The annular lower portion has a main body with a bottom surface for contacting a polishing pad during polishing, an inner rim projecting upward from the main body, an outer rim projecting upward from the main body and separated from the inner rim by a gap, and a plurality of azimuthally separated interlock features positioned between the inner rim and the outer rim, each interlock feature projecting upwardly from the main body. The annular upper portion has a top surface and a bottom surface and a plurality of azimuthally separated recesses in the bottom surface, the recesses defining thin portions of the upper portion, the plurality of interlock features fitting into the plurality of recesses. The lower portion is a plastic and the upper portion is a material that is more rigid than the plastic.

Abstract translation: 保持环包括环形下部和环形上部。 环形下部具有主体，其具有用于在抛光期间接触抛光垫的底面，从主体向上突出的内边缘，从主体向上突出并与内边缘分开的外缘间隙， 位于内缘和外缘之间的多个方位分离的互锁特征，每个互锁特征从主体向上突出。 环形上部具有顶表面和底表面以及在底表面中的多个方位分离的凹槽，所述凹部限定上部的薄部分，多个互锁特征装配到多个凹部中。 下部是塑料，上部是比塑料更硬的材料。

公开(公告)号：US12172264B2

公开(公告)日：2024-12-24

申请号：US18351260

申请日：2023-07-12

Applicant: Applied Materials, Inc.

Inventor： Young J. Paik ,  Ashish Bhatnagar ,  Kadthala Ramaya Narendrnath

IPC: B24B37/30 ,  B24B37/32 ,  H01L21/321

Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.

公开(公告)号：US10168229B2

公开(公告)日：2019-01-01

申请号：US15719205

申请日：2017-09-28

Applicant: Applied Materials, Inc.

Inventor： Govinda Raj ,  Bopanna Ichettria Vasantha ,  Ashish Bhatnagar ,  Cariappa Baduvamanda

IPC: G01K7/00 ,  G01K7/02 ,  G01K1/08

Abstract: Embodiments disclosed herein generally relate to a temperature sensor disposed in an apparatus. In many semiconductor, liquid crystal display, solar panel or organic light emitting display fabrication processes, RF power is utilized to either ignite a plasma within the processing chamber or to provide supplemental energy to the process. Temperature control during many processes may be beneficial in order to produce a consistent product. Temperature sensors or thermocouples are sometimes utilized to measure the temperature of a substrate within a processing chamber. The RF power may have a negative impact on the temperature sensor. By coating the temperature sensor with a nanoparticle based metal coating, such as a silver coating, the negative impacts of the RF power on the temperature sensor may be reduced without contaminating the process, and an accurate temperature measurement may be obtained.

公开(公告)号：US20170243779A1

公开(公告)日：2017-08-24

申请号：US15592038

申请日：2017-05-10

Applicant: Applied Materials, Inc.

Inventor： Young J. Paik ,  Melvin Barrentine ,  Abhijit Y. Desai ,  Hai Nguyen ,  Ashish Bhatnagar ,  Rajkumar Alagarsamy

IPC: H01L21/683 ,  B24B37/30

CPC classification number: H01L21/6838 ,  B24B37/30 ,  H01L21/0201 ,  H01L21/30625 ,  Y10T428/24355 ,  Y10T428/24612

Abstract: A method and apparatus for planarizing a substrate are provided. A substrate carrier head with an improved cover for holding the substrate securely is provided. The cover may have a bead that is larger than the recess into which it fits, such that the compression forms a conformal seal inside the recess. The bead may also be left uncoated to enhance adhesion of the bead to the surface of the groove. The surface of the cover may be roughened to reduce adhesion of the substrate to the cover without using a non-stick coating.