公开(公告)号：US11415900B2

公开(公告)日：2022-08-16

申请号：US17022910

申请日：2020-09-16

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Nitesh Pandey ,  Vasco Tomas Tenner ,  Willem Marie Julia Marcel Coene ,  Patrick Warnaar

IPC: G03F7/20 ,  G01B11/06 ,  G01B11/02 ,  G01N21/47 ,  G01N21/95 ,  G03F9/00

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US11125806B2

公开(公告)日：2021-09-21

申请号：US16527142

申请日：2019-07-31

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Patrick Warnaar ,  Vasco Tomas Tenner ,  Maurits Van der Schaar

IPC: G01R31/265

Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.

公开(公告)号：US11009343B2

公开(公告)日：2021-05-18

申请号：US16277317

申请日：2019-02-15

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Vasco Tomas Tenner ,  Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Patrick Warnaar ,  Grzegorz Grzela ,  Martin Jacobus Johan Jak

IPC: G01B11/25 ,  G03F7/20 ,  G02B27/42 ,  G03H1/00 ,  G03H1/04

Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.

公开(公告)号：US20190265028A1

公开(公告)日：2019-08-29

申请号：US16277317

申请日：2019-02-15

Applicant: Stichting VU ,  Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  Universiteit van Amsterdam ,  ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Vasco Tomas Tenner ,  Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Patrick Warnaar ,  Grzegorz Grzela ,  Martin Jacobus Johan Jak

IPC: G01B11/25 ,  G03F7/20

Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.