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公开(公告)号：US10345717B2
公开(公告)日：2019-07-09
申请号：US15959115
申请日：2018-04-20
Applicant: ASML Netherlands B.V.
Inventor： Günes Nakiboglu , Suzanne Johanna Antonetta Geertruda Cosijns , Anne Willemijn Bertine Quist , Lukasz Sosniak , Frank Johannes Jacobus Van Boxtel , Engelbertus Antonius Fransiscus Van Der Pasch
IPC: G03F7/20
Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.
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公开(公告)号：US10222707B2
公开(公告)日：2019-03-05
申请号：US15054010
申请日：2016-02-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Wilhelmus Polet , Henrikus Herman Marie Cox , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Jimmy Matheus Wilhelmus Van De Winkel , Gregory Martin Mason Corcoran , Frank Johannes Jacobus Van Boxtel
IPC: G03F7/20
Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.
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公开(公告)号：US09977348B2
公开(公告)日：2018-05-22
申请号：US15502466
申请日：2015-06-25
Applicant: ASML Netherlands B.V.
Inventor： Günes Nakiboglu , Suzanne Johanna Antonetta Geertruda Cosijns , Anne Willemijn Bertine Quist , Lukasz Sosniak , Frank Johannes Jacobus Van Boxtel , Engelbertus Antonius Fransiscus Van Der Pasch
IPC: G03F7/20
CPC classification number: G03F7/7085 , G03F7/70775 , G03F7/709
Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.
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公开(公告)号：US11762304B2
公开(公告)日：2023-09-19
申请号：US15570934
申请日：2016-03-29
Applicant: ASML Netherlands B.V.
Inventor： Güneş Nak{dot over (i)}boğlu , Maarten Holtrust , Martinus Van Duijnhoven , Francis Fahrni , Frank Johannes Jacobus Van Boxtel , Anne Willemijn Bertine Quist , Bart Dinand Paarhuis , Daan Daniel Johannes Antonius Van Sommeren
CPC classification number: G03F7/70858 , G03F7/709 , G03F7/70308 , G03F7/70883 , G03F7/70891
Abstract: A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.
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公开(公告)号：US11009800B2
公开(公告)日：2021-05-18
申请号：US16071380
申请日：2017-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang Nienhuys , Güneş Nakiboğlu , Rita Marguerite Albin Lambertine Petit , Hermen Folken Pen , Remco Yuri Van De Moesdijk , Frank Johannes Jacobus Van Boxtel , Borgert Kruizinga
Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.
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Patent Agency Ranking
公开(公告)号：US10788763B2
公开(公告)日：2020-09-29
申请号：US15354821
申请日：2016-11-17
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Jan Steven Christiaan Westerlaken , Ruud Hendrikus Martinus Johannes Bloks , Peter A. Delmastro , Thibault Simon Mathieu Laurent , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Justin Matthew Verdirame , Samir A. Nayfeh
Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
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公开(公告)号：US10133197B2
公开(公告)日：2018-11-20
申请号：US15325987
申请日：2015-06-08
Applicant: ASML Netherlands B.V.
Inventor： Günes Nakiboglu , Frank Johannes Jacobus Van Boxtel , Thomas Petrus Hendricus Warmerdam , Jan Steven Christiaan Westerlaken , Johannes Pieter Kroes
Abstract: A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.
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公开(公告)号：US10114299B2
公开(公告)日：2018-10-30
申请号：US15311544
申请日：2015-05-07
Applicant: ASML Netherlands B.V.
Inventor： Günes Nakiboglu , Mark Constant Johannes Baggen , Gerard Johannes Boogaard , Nicolaas Rudolf Kemper , Sander Kerssemakers , Robertus Mathijs Gerardus Rijs , Frank Johannes Jacobus Van Boxtel , Erwin Antonius Henricus Franciscus Van Den Boogaert , Marc Wilhelmus Maria Van Der Wijst , Martinus Van Duijnhoven , Jessica Henrica Anna Verdonschot , Hendrikus Herman Marie Cox
IPC: G10K11/168 , G03F7/20 , G10K11/16
Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.
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19.发明授权公开(公告)号：US09977351B2
公开(公告)日：2018-05-22
申请号：US15649161
申请日：2017-07-13
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
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20.发明授权公开(公告)号：US09766557B2
公开(公告)日：2017-09-19
申请号：US15438376
申请日：2017-02-21
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
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