公开(公告)号：US11094502B2

公开(公告)日：2021-08-17

申请号：US16064193

申请日：2016-12-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Bernardo Kastrup ,  Johannes Catharinus Hubertus Mulkens ,  Marinus Aart Van Den Brink ,  Jozef Petrus Henricus Benschop ,  Erwin Paul Smakman ,  Tamara Druzhinina ,  Coen Adrianus Verschuren

IPC: H01J37/26 ,  H01J37/15 ,  H01J37/02 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.

公开(公告)号：US10928736B2

公开(公告)日：2021-02-23

申请号：US16064274

申请日：2016-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Willem Herman De Jager ,  Coen Adrianus Verschuren ,  Erwin Paul Smakman ,  Erwin John Van Zwet ,  Wouter Frans Willem Mulckhuyse ,  Pieter Verhoeff ,  Robert Albertus Johannes Van Der Werf

IPC: G03F7/20 ,  G03B27/42

Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.