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公开(公告)号：US20210132509A1
公开(公告)日：2021-05-06
申请号：US17049707
申请日：2019-04-03
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Reinald HUISMAN , Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Yuxiang LIN , Vu Quang TRAN , Sebastianus Adrianus GOORDEN , Justin Lloyd KREUZER , Christopher John MASON , Igor Matheus Petronella AARTS , Krishanu SHOME , Irit TZEMAH
Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.
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公开(公告)号：US20220035257A1
公开(公告)日：2022-02-03
申请号：US17277353
申请日：2019-08-27
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus GOORDEN , Simon Reinald HUISMAN , Simon Gijsbert Josephus MATHIJSSEN , Henricus Petrus Maria PELLEMANS
IPC: G03F7/20
Abstract: Disclosed is a metrology device (1600) configured to produce measurement illumination comprising a plurality of illumination beams, each of said illumination beams being spatially incoherent or pseudo-spatially incoherent and comprising multiple pupil points in an illumination pupil of the metrology device. Each pupil point in each one of said plurality of illumination beams has a corresponding pupil point in at least one of the other illumination beams of said plurality of illumination beams thereby defining multiple sets of corresponding pupil points, and the pupil points of each set of corresponding pupil points are spatially coherent with respect to each other.
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公开(公告)号：US20220121128A1
公开(公告)日：2022-04-21
申请号：US17565422
申请日：2021-12-29
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: Disclosed is a method of metrology comprising using measurement illumination to measure a target, said measurement illumination comprising a plurality of illumination conditions. The method comprises performing a first measurement capture with a first subset of said plurality of illumination conditions, e.g., each comprising a positive weighting, to obtain a first parameter value and performing a second measurement capture with a second subset of said plurality of illumination conditions, e.g., each comprising a negative weighting, to obtain a second parameter value. An optimized parameter value is determined as a weighted combination of at least the first parameter value and the second parameter value.
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公开(公告)号：US20200089135A1
公开(公告)日：2020-03-19
申请号：US16470905
申请日：2017-11-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus GOORDEN , Nitesh PANDEY , Duygu AKBULUT , Alessandro POLO , Simon Reinald HUISMAN
Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.
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公开(公告)号：US20190302570A1
公开(公告)日：2019-10-03
申请号：US16307376
申请日：2017-06-01
Applicant: ASML Netherlands B.V.
Inventor： Nitish KUMAR , Simon Reinald HUISMAN
Abstract: A supercontinuum radiation source for an alignment mark measurement system comprises: a radiation source; illumination optics; a plurality of waveguides; and collection optics. The radiation source is operable to produce a pulsed radiation beam. The illumination optics is arranged to receive the pulsed pump radiation beam and to form a plurality of pulsed sub-beams, each pulsed sub-beam comprising a portion of the pulsed radiation beam. Each of the plurality of waveguides is arranged to receive at least one of the plurality of pulsed sub-beams beam and to broaden a spectrum of that pulsed sub-beam so as to generate a supercontinuum sub-beam. The collection optics is arranged to receive the supercontinuum sub-beam from each of the plurality of waveguides and to combine them so as to form a supercontinuum radiation beam.
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Patent Agency Ranking
公开(公告)号：US20240241454A1
公开(公告)日：2024-07-18
申请号：US18619839
申请日：2024-03-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Simon Reinald HUISMAN , Sebastianus Adrianus GOORDEN , Harm Jan Willem BELT , Filippo ALPEGGIANI , Irwan Dani SETIJA , Henricus Petrus Maria PELLEMANS
CPC classification number: G03F9/7019 , G03F7/70633 , G03F7/70641 , G03F7/706839 , G03F7/70725 , G03F9/7049 , G03F9/7088
Abstract: Disclosed is a method for measuring a parameter of interest from a target and associated apparatuses. The method comprises obtaining measurement acquisition data relating to measurement of a target on a production substrate during a manufacturing phase; obtaining a calibration correction database and/or a trained model having been trained on said calibration correction database, operable to correct for effects in the measurement acquisition data; correcting for effects in the measurement acquisition data using first correction data from said calibration correction database and/or using said trained model so as to obtain corrected measurement data and/or a corrected parameter of interest which is/are corrected for at least said effects; and updating said calibration correction data and/or said trained model with said corrected measurement data and/or corrected parameter of interest.
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公开(公告)号：US20240094643A1
公开(公告)日：2024-03-21
申请号：US18269983
申请日：2021-12-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Filippo ALPEGGIANI , Harm Jan Willem BELT , Sebatianus Adrianus GOORDEN , Irwan Dani SETIJA , Simon Reinald HUISMAN , Henricus Petrus Maria PELLEMANS
IPC: G03F7/00
CPC classification number: G03F7/706845 , G03F7/70633 , G03F7/70641 , G03F7/706839
Abstract: A method for measuring a parameter of interest from a target and associated apparatuses. The method includes obtaining measurement acquisition data relating to measurement of the target and finite-size effect correction data and/or a trained model operable to correct for at least finite-size effects in the measurement acquisition data. At least finite-size effects in the measurement acquisition data is corrected for using the finite-size effect correction data and/or the trained model to obtain corrected measurement data and/or obtain a parameter of interest; and where the correcting does not directly determine the parameter of interest, determining the parameter of interest from the corrected measurement data.
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公开(公告)号：US20220397832A1
公开(公告)日：2022-12-15
申请号：US17773384
申请日：2020-10-19
Applicant: ASML Netherlands B.V.
Inventor： Filippo ALPEGGIANI , Henricus Petrus Maria PELLEMANS , Sebastianus Adrianus GOORDEN , Simon Reinald HUISMAN
Abstract: Disclosed is a method of metrology such as alignment metrology. The method comprises obtaining pupil plane measurement dataset at a pupil plane relating to scattered radiation resultant from a measurement of a structure. The method comprises determining a measurement value or correction therefor using the pupil plane measurement dataset and a sensor term relating to sensor optics used to perform said measurement.
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公开(公告)号：US20220057718A1
公开(公告)日：2022-02-24
申请号：US17415671
申请日：2019-11-19
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus GOORDEN , Simon Reinald HUISMAN , Sergei SOKOLOV
Abstract: Disclosed is an illumination system for delivering incoherent radiation to a metrology sensor system. Also disclosed is an associated metrology system and method. The illumination system comprises a spatial filter system for selective spatial filtering of a beam of said incoherent radiation outside of a module housing of the metrology sensor system. At least one optical guide is provided for guiding the spatially filtered beam of incoherent radiation to the metrology sensor system, the at least one optical guide being such that the radiation guided has a substantially similar output angle as input angle.
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公开(公告)号：US20210382404A1
公开(公告)日：2021-12-09
申请号：US17284009
申请日：2019-09-24
Applicant: ASML Netherlands B.V.
Inventor： Simon Reinald HUISMAN
Abstract: A detection system for an alignment sensor, and an alignment sensor and lithographic projection apparatus comprising such a detection system is disclosed. The detection system comprises at least one detection circuit; and a plurality of optical fiber cores for transporting a measurement signal to the at least one detection circuit. At least as subset of the plurality of optical fiber cores are selectively switchable between a detection state and a non-detection state, thereby defining a configurable detection spot.
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