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公开(公告)号：US20200089135A1
公开(公告)日：2020-03-19
申请号：US16470905
申请日：2017-11-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus GOORDEN , Nitesh PANDEY , Duygu AKBULUT , Alessandro POLO , Simon Reinald HUISMAN
Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.
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公开(公告)号：US20190113852A1
公开(公告)日：2019-04-18
申请号：US16159080
申请日：2018-10-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Janneke RAVENSBERGEN , Duygu AKBULUT , Nitesh PANDEY , Jin LIAN
CPC classification number: G03F7/70633 , G01B9/02083 , G01B9/0209 , G03F7/70625
Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.
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公开(公告)号：US20200103772A1
公开(公告)日：2020-04-02
申请号：US16611500
申请日：2018-03-06
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus GOORDEN , Simon Reinald HUISMAN , Duygu AKBULUT , Alessandro POLO , Simon Gijsbert Josephus MATHIJSSEN
Abstract: Disclosed is a metrology sensor apparatus and associated method. The metrology sensor apparatus comprises an illumination system operable to illuminate a metrology mark on a substrate with illumination radiation having a first polarization state and an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark. The metrology mark comprises a main structure and changes, relative to the first polarization state, at least one of a polarization state of a first portion of the scattered radiation predominately resultant from scattering by the main structure and a polarization state of a second portion of radiation predominately resultant from scattering by one or more features other than the main structure, such that the polarization state of the first portion of the scattered radiation is different to the polarization state of the second portion of the scattered radiation. The metrology sensor apparatus further comprises an optical filtering system which filters out the second portion of the scattered radiation based on its polarization state.
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公开(公告)号：US20190212658A1
公开(公告)日：2019-07-11
申请号：US16325471
申请日：2017-06-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Simon Reinald HUISMAN , Simon Gijsbert Josephus MATHIJSSEN , Sebastianus Adrianus GOORDEN , Duygu AKBULUT , Alessandro POLO
Abstract: An alignment sensor for a lithographic apparatus has an optical system configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system and the radiation of the second waveband is processed by a second processing sub-system. The processing subsystems in one example include self-referencing interferometers. The radiation of the second waveband allows marks to be measured through an opaque layer. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.
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公开(公告)号：US20240184218A1
公开(公告)日：2024-06-06
申请号：US18441772
申请日：2024-02-14
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY , Arie Jeffrey DEN BOEF , Duygu AKBULUT , Marinus Johannes Maria VAN DAM , Hans BUTLER , Hugo Augustinus Joseph CRAMER , Engelbertus Antonius Fransiscus VAN DER PASCH , Ferry ZIJP , Jeroen Arnoldus Leonardus Johannes RAAYMAKERS , Marinus Petrus REIJNDERS
IPC: G03F7/00 , G01N21/956
CPC classification number: G03F7/70625 , G01N21/956 , G03F7/7015 , G03F7/70633
Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
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Patent Agency Ranking
公开(公告)号：US20200004165A1
公开(公告)日：2020-01-02
申请号：US16562869
申请日：2019-09-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Janneke RAVENSBERGEN , Duygu AKBULUT , Nitesh PANDEY , Jin LIAN
Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.
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公开(公告)号：US20180120714A1
公开(公告)日：2018-05-03
申请号：US15569086
申请日：2016-04-19
Applicant: ASML Netherlands B.V.
Inventor： Ferry ZIJP , Duygu AKBULUT , Peter Danny VAN VOORST , Jeroen Johan Maarten VAN DE WIJDEVEN , Koos VAN BERKEL
CPC classification number: G03F7/70641 , G01B11/14 , G01N21/956 , G02B5/3025 , G02B21/0016 , G03F7/70308 , G03F7/70591 , G03F7/70625 , G03F7/70633
Abstract: A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.
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公开(公告)号：US20210364936A1
公开(公告)日：2021-11-25
申请号：US16963273
申请日：2018-12-20
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY , Duygu AKBULUT , Alessandro POLO , Sebastianus Adrianus GOORDEN
Abstract: A sensor is disclosed, wherein a transducer generates acoustic waves, which are received by a lens assembly. The lens assembly transmits and directs at least a part of the acoustic waves to a target. The lens assembly then receives at least a part of acoustic waves, after interaction with the target. The sensor further comprises an optical detector that comprises at least one optically reflective member located at a surface of the lens assembly, which surface is arranged opposite to a surface of the lens assembly which faces a focal plane of the lens assembly, wherein the at least one optically reflective member is mechanically displaced in response to the acoustic waves, which are received and transmitted by the lens assembly.
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公开(公告)号：US20180031977A1
公开(公告)日：2018-02-01
申请号：US15660498
申请日：2017-07-26
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus GOORDEN , Nitesh PANDEY , Duygu AKBULUT , Teunis Willem TUKKER , Johannes Matheus Marie DE WIT
CPC classification number: G03F7/7015 , G01N21/8806 , G01N21/9501 , G01N2021/8822 , G01N2201/0631 , G02B6/262 , G02B6/4204 , G02B6/4296 , G03F7/70075 , G03F7/70583 , G03F7/70616 , G03F7/70625 , G03F7/70633
Abstract: Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes.
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公开(公告)号：US20160246189A1
公开(公告)日：2016-08-25
申请号：US15052201
申请日：2016-02-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Koos VAN BERKEL , Duygu AKBULUT , Jeroen Johan Maarten VAN DE WIJDEVEN , Ferry ZIJP
CPC classification number: G03F7/70775 , G01N21/956 , G02B21/0016 , G03F7/70625 , G03F7/70633 , G03F9/7019
Abstract: A method and apparatus for position control of a component relative to a surface is disclosed. The method may include calculating an estimated effect of, or derived from, Casimir force acting between the component and the surface, and compensating positioning of the component relative to the surface using the estimated effect.
Abstract translation: 公开了一种用于相对于表面的部件的位置控制的方法和装置。 该方法可以包括计算在组件和表面之间作用的卡西米力的估计效果或来自其的估计效果，以及使用估计效果来补偿部件相对于表面的定位。
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