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    METROLOGY SYSTEM AND COHERENCE ADJUSTERS
    2.
    发明公开
    METROLOGY SYSTEM AND COHERENCE ADJUSTERS 审中-公开

    公开(公告)号：US20240027913A1

    公开(公告)日：2024-01-25

    申请号：US18255261

    申请日：2021-12-02

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： Sergei SOKOLOV ,  Simon Reinald HUISMAN ,  Jin LIAN ,  Sebastianus Adrianus GOORDEN ,  Muhsin ERALP ,  Henricus Petrus Maria PELLEMANS ,  Justin Lloyd KREUZER

    IPC: G03F7/00

    CPC classification number: G03F7/70091 ,  G03F7/70625 ,  G03F7/70633

    Abstract: A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).

    Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method
    3.
    发明申请
    Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 有权
    检验方法和装置，平版印刷设备，平版印刷加工单元和器件制造方法

    公开(公告)号：US20150131076A1

    公开(公告)日：2015-05-14

    申请号：US14536979

    申请日：2014-11-10

    Applicant: ASML Netherlands B.V.

    Inventor： Henricus Petrus Maria PELLEMANS ,  Arie Jeffrey DEN BOEF

    IPC: G01B11/24 ,  G03F7/20

    CPC classification number: G01B11/24 ,  G03F7/70191 ,  G03F7/70633 ,  G03F7/7085

    Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes a scatterometer configured to measure a property of the substrate. The scatterometer includes a radiation source configured to produce a radiated spot on a target on the substrate, where the radiated spot includes positions on the target. The scatterometer further includes a detector configured to generate measurement signals that correspond to respective ones of the positions of the radiated spot and a processor configured to output, based on the measurement signals, a single value that is representative of the property of the substrate.

    Abstract translation: 公开了一种光刻设备。 光刻设备包括配置成测量衬底性质的散射仪。 散射仪包括被配置为在基板上的目标上产生辐射点的辐射源，其中辐射光点包括目标上的位置。 散射仪还包括检测器，其被配置为产生对应于辐射光斑的相应位置的测量信号和被配置为基于测量信号输出代表衬底性质的单个值的处理器。

    Focus Monitoring Arrangement and Inspection Apparatus Including such an Arrangement
    4.
    发明申请
    Focus Monitoring Arrangement and Inspection Apparatus Including such an Arrangement 有权
    包括这样一种安排的聚焦监测装置和检验装置

    公开(公告)号：US20160097984A1

    公开(公告)日：2016-04-07

    申请号：US14867594

    申请日：2015-09-28

    Applicant: ASML Netherlands B.V.

    Inventor： Amandev SINGH ,  Henricus Petrus Maria PELLEMANS

    IPC: G03F7/20

    CPC classification number: G03F7/70641 ,  G02B21/245 ,  G03F7/70616 ,  G03F9/7026

    Abstract: An inspection apparatus (300) includes a focus monitoring arrangement (500, 500′). Focusing radiation (505) comprises radiation having a first wavelength and radiation having a second wavelength. Reference radiation and focusing radiation at each wavelength are provided with at least one relative frequency shift so that the interfering radiation detected in the detection system includes a time-varying component having a characteristic frequency. A focus detection system (520) comprises one or more lock-in detectors (520b, 520c, 900). Operating the lock-in detectors with reference to both the first and second characteristic frequencies allows the arrangement to select which of the first and second focusing radiation is used to determine whether the optical system is in focus. Good quality signals can be obtained from targets of different structure.

    Abstract translation: 检查装置（300）包括聚焦监视装置（500,500'）。 聚焦辐射（505）包括具有第一波长的辐射和具有第二波长的辐射。 在每个波长处的参考辐射和聚焦辐射被提供有至少一个相对频移，使得在检测系统中检测到的干扰辐射包括具有特征频率的时变分量。 焦点检测系统（520）包括一个或多个锁定检测器（520b，520c，900）。 参考第一和第二特征频率操作锁定检测器允许该装置选择使用第一和第二聚焦辐射中的哪一个来确定光学系统是否聚焦。 可以从不同结构的目标获得良好的质量信号。

    INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL AND DEVICE MANUFACTURING METHOD
    7.
    发明公开
    INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL AND DEVICE MANUFACTURING METHOD 审中-公开

    公开(公告)号：US20240044639A1

    公开(公告)日：2024-02-08

    申请号：US18486811

    申请日：2023-10-13

    Applicant: ASML Netherlands B.V.

    Inventor： Henricus Petrus Maria PELLEMANS ,  Arie Jeffrey DEN BOEF

    IPC: G01B11/24 ,  G03F7/00

    CPC classification number: G01B11/24 ,  G03F7/70633 ,  G03F7/7085 ,  G03F7/70191

    Abstract: A scatterometer for measuring a property of a target on a substrate includes a radiation source, a detector, and a processor. The radiation source produces a radiated spot on the target. The scatterometer adjusts a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction. The detector receives radiation scattered by the target. The received radiation is associated with positions of the radiated spot on the target along at least the first direction. The detector generates measurement signals based on the positions of the radiated spot on the target. The processor outputs, based on the measurement signals, a single value that is representative of the property of the target. The processor also combines the measurement signals to output a combined signal and derives, based on the combined signal, the single value.

    METROLOGY SENSOR FOR POSITION METROLOGY
    8.
    发明申请
    METROLOGY SENSOR FOR POSITION METROLOGY 有权

    公开(公告)号：US20220035257A1

    公开(公告)日：2022-02-03

    申请号：US17277353

    申请日：2019-08-27

    Applicant: ASML Netherlands B.V.

    Inventor： Sebastianus Adrianus GOORDEN ,  Simon Reinald HUISMAN ,  Simon Gijsbert Josephus MATHIJSSEN ,  Henricus Petrus Maria PELLEMANS

    IPC: G03F7/20

    Abstract: Disclosed is a metrology device (1600) configured to produce measurement illumination comprising a plurality of illumination beams, each of said illumination beams being spatially incoherent or pseudo-spatially incoherent and comprising multiple pupil points in an illumination pupil of the metrology device. Each pupil point in each one of said plurality of illumination beams has a corresponding pupil point in at least one of the other illumination beams of said plurality of illumination beams thereby defining multiple sets of corresponding pupil points, and the pupil points of each set of corresponding pupil points are spatially coherent with respect to each other.

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