摘要:
Aluminum-base alloys and a method of preparing aluminum-base alloys by mechanical alloying in the presence of a carbidiferous processing aid wherein a strong carbide former such as titanium is included so as to produce carbides in the final alloy more thermally stable at temperatures in excess of 100.degree. C. than Al.sub.4 C.sub.3.
摘要:
An improved process is provided for producing mechanically alloyed powders of simple and complex alloy systems. In the improved process, the mechanically alloyed powder is milled to an acceptable processing level in a gravity-dependent ball mill to obtain a powder characterized by a laminate-type microstructure which is substantially optically homogeneous at a magnification of 100.times.. Such acceptable processing level is reached without processing the powder to a featureless microstructure or to saturation hardness.
摘要:
The present invention relates to a method and apparatus of forming a sputter target assembly having a controlled solder thickness. In particular, the method includes the introduction of a bonding foil, between the backing plate and the sputter target, wherein the bonding foil is an ignitable heterogeneous stratified structure for the propagation of an exothermic reaction.
摘要:
The present invention relates to a method and apparatus of forming a sputter target assembly having a controlled solder thickness. In particular, the method includes the introduction of a bonding foil, between the backing plate and the sputter target, wherein the bonding foil is an ignitable heterogeneous stratified structure for the propagation of an exothermic reaction.
摘要:
A precious metal sputter target has a composition selected from the group consisting of platinum, palladium, rhodium, iridium, ruthenium, osmium and single-phase alloys thereof. The sputter target's grain structure is at least about 99 percent recrystallized and has a grain size of less than about 200 μm for improving sputter uniformity. The cryogenic method for producing these sputter targets is also effective for improving sputter performance for silver and gold sputter targets.
摘要:
Provided is a method of forming ferromagnetic sputter targets and sputter target assemblies having a uniform distribution of magnetic leakage flux. The method includes providing a ferromagnetic sputter workpiece and hot rolling the workpiece to a substantially circular configuration sputter target; machining a taper in a surface of the sputter target to have a thickness gradient of the sputter target, where the center of the sputter target is about 0.020 to about 0.005 inches thinner than the edge of the sputter target, and where the magnetic leakage flux across the sputter target is uniformly distributed.
摘要:
The method forms a sputter target assembly by attaching a sputter target to an insert and applying a bond metal layer between the insert and a backing plate. Then pressing the insert and backing plate together forms a solid state bond with the bond metal layer, attaches the insert to the backing plate and forms at least one cooling channel between the insert and the backing plate. A filler metal secures the outer perimeter of the insert to the backing plate in order to eliminate leakage from the cooling channel during sputtering of the sputter target.
摘要:
A target assembly for use in a sputtering system used for forming a thin film on a substrate is disclosed. The target assembly includes a mounting element having an interior wall which defines an aperture. The target assembly further includes a target for providing material for forming the film on the substrate. In particular, the target is affixed within the mounting element by an interference fit between the aperture and the target. Furthermore, the mounting ring includes a groove for holding an O-ring which serves to maintain a vacuum in the sputtering system.
摘要:
A target assembly in which the sputtering material is not soldered or otherwise metallurgically bonded to a backing plate. Rather, the target, which is homogeneously manufactured of sputtering material, is mechanically coupled (e.g., with bolts) to an adapter, which is itself permanently affixed to the chamber. As a result, the target can be easily uncoupled from the chamber and replaced, without also requiring removal and replacement of a backing plate.
摘要:
A composite has a magnesium base metal matrix and a reinforcing phase. The composite is produced from a charge containing a rapidly solidified magnesium base alloy and particles of a reinforcing material present in an amount ranging from about 0.1 to 50 percent by volume of the charge. Ball milling the charge energetically enfolds metal matrix material around each of the particles, while maintaining the charge in a pulverant state. Consolidation of the charge provides a mechanically formable, substantially void-free mass.