知搜-全球专利检索

  1. 登录
  2. 注册

搜索结果

36 条记录 (耗时 0.018 秒)

    OPTICAL APPARATUS COMPRISING AN OPTICAL COMPONENT AND AN ADJUSTMENT DEVICE AND METHOD FOR INFLUENCING A POLARIZATION STATE OF THE OPTICAL COMPONENT
    14.
    发明申请
    OPTICAL APPARATUS COMPRISING AN OPTICAL COMPONENT AND AN ADJUSTMENT DEVICE AND METHOD FOR INFLUENCING A POLARIZATION STATE OF THE OPTICAL COMPONENT 有权
    包含光学部件的光学装置和调整装置以及影响光学部件的极化状态的方法

    公开(公告)号：US20060279856A1

    公开(公告)日：2006-12-14

    申请号：US11383012

    申请日：2006-05-12

    申请人： Frank Melzer

    发明人： Frank Melzer

    IPC分类号： G02B7/02

    CPC分类号： G02B7/023 ,  G03F7/70825 ,  G03F7/70966

    摘要： An optical apparatus comprises an optical component having at least one optical surface and a first optical axis, a socket in which said optical component is mounted, first manipulators arranged to exert forces approximately parallel to the optical axis of the optical component for varying stresses in the optical component, the forces having a strength such that stress birefringence is induced in the component.

    摘要翻译： 光学装置包括具有至少一个光学表面和第一光轴的光学部件，安装有所述光学部件的插座，布置成施加近似平行于光学部件的光轴的力的第一操纵器，用于改变 光学部件，具有在部件中引起应力双折射的强度的力。

    System for damping oscillations
    17.
    发明授权
    System for damping oscillations 失效
    阻尼振荡系统

    公开(公告)号：US06897599B2

    公开(公告)日：2005-05-24

    申请号：US10075797

    申请日：2002-02-12

    申请人： Franz Sorg ,  Stefan Xalter ,  Frank Melzer ,  Bernhard Gellrich ,  Michael Muehlbeyer

    发明人： Franz Sorg ,  Stefan Xalter ,  Frank Melzer ,  Bernhard Gellrich ,  Michael Muehlbeyer

    IPC分类号： F16F15/00 ,  F16F15/02 ,  F16L55/04 ,  G03F7/20 ,  H01L21/027 ,  H01L41/09 ,  H01L41/08

    CPC分类号： G03F7/70991 ,  F16F15/005 ,  F16F15/02 ,  G03F7/709

    摘要： In a system for overcoming or at least damping oscillations in or through channels (9) which carry fluid in a component, in particular coolant in cooling channels in an optical element (1), in particular a projection objective lens (1a) for semiconductor lithography, oscillations which occur are detected and evaluated by sensors (5), after which the result is passed, in the form of an adaptronic control loop to piezoelectric elements (9), which are integrated in the optical element, and are in the form of thin plates, films or layers which, when activated, produce the oscillations or frequencies which counteract oscillations and natural frequencies produced by the turbulence.

    摘要翻译： 在用于克服或至少阻挡在通道（9）中或至少阻尼振荡的系统中，所述通道（9）承载组件中的流体，特别是光学元件（1）中的冷却通道中的冷却剂，特别是用于半导体的投影物镜（1a） 光刻，发生的振荡由传感器（5）检测和评估，之后结果通过自适应控制环路形式的压电元件（9）的形式，压电元件（9）集成在光学元件中，呈现形式 薄板，薄膜或层，当被激活时，产生抵消由湍流产生的振荡和固有频率的振荡或频率。

    Optical system for semiconductor lithography
    18.
    发明授权
    Optical system for semiconductor lithography 有权
    用于半导体光刻的光学系统

    公开(公告)号：US09383544B2

    公开(公告)日：2016-07-05

    申请号：US13590509

    申请日：2012-08-21

    申请人： Frank Melzer ,  Yim-Bun Patrick Kwan ,  Stefan Xalter ,  Damian Fiolka

    发明人： Frank Melzer ,  Yim-Bun Patrick Kwan ,  Stefan Xalter ,  Damian Fiolka

    IPC分类号： G03B27/54 ,  G02B7/14 ,  G02B7/02 ,  G02B7/10 ,  G03F7/20

    CPC分类号： G02B7/14 ,  G02B7/023 ,  G02B7/102 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/70825

    摘要： An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.

    摘要翻译： 公开了一种包括多个光学部件的半导体光刻用光学系统以及相关的部件和方法。 该装置可以包括可以在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。 直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸 仪器。 该装置还可以包括构造成引导光学部件的引导单元。 该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用 在导向单元上相互补偿，小于10％。

    Method and system for indirect determination of local irradiance in an optical system
    19.
    发明授权
    Method and system for indirect determination of local irradiance in an optical system 有权
    用于间接确定光学系统中局部辐照度的方法和系统

    公开(公告)号：US08454230B2

    公开(公告)日：2013-06-04

    申请号：US12706422

    申请日：2010-02-16

    申请人： Frank Melzer ,  Axel Scholz

    发明人： Frank Melzer ,  Axel Scholz

    IPC分类号： G01K7/00 ,  G01J5/00

    CPC分类号： G01J1/4257 ,  G01J2005/0077 ,  G03F7/70075 ,  G03F7/7085

    摘要： The invention concerns a method for the indirect determination of local irradiance in an optical system; wherein the optical system comprises optical elements between which an illuminated beam path is formed and a measurement object which absorbs the radiation in the beam path at least partially is positioned in a partial region of the beam path selected for the locally-resolved determination of the irradiance and the temperature distribution of at least one part of the measurement object is determined by means of a temperature detector.

    摘要翻译： 本发明涉及一种用于间接确定光学系统中局部辐照度的方法; 其中所述光学系统包括光学元件，在所述光学元件之间形成照明光束路径，并且吸收所述光束路径中的辐射的测量对象至少部分地位于所述光束路径的部分区域中，所述光束路径被选择用于局部分辨的辐射度确定 并且通过温度检测器确定测量对象的至少一部分的温度分布。

    OPTICAL SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY
    20.
    发明申请
    OPTICAL SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY 有权
    用于半导体光刻的光学系统

    公开(公告)号：US20120327385A1

    公开(公告)日：2012-12-27

    申请号：US13590509

    申请日：2012-08-21

    申请人： Frank Melzer ,  Yim-Bun Patrick Kwan ,  Stefan Xalter ,  Damian Fiolka

    发明人： Frank Melzer ,  Yim-Bun Patrick Kwan ,  Stefan Xalter ,  Damian Fiolka

    IPC分类号： G03B27/54

    CPC分类号： G02B7/14 ,  G02B7/023 ,  G02B7/102 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/70825

    摘要： Semiconductor lithography system includes a plurality of optical components, including an optical component movable a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.

    摘要翻译： 半导体光刻系统包括多个光学部件，包括在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。 直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸 仪器。 该装置还可以包括构造成引导光学部件的引导单元。 该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用 在导向单元上相互补偿，小于10％。