PHOTOELECTRIC CONVERSION DEVICE
    133.
    发明公开

    公开(公告)号:US20240284064A1

    公开(公告)日:2024-08-22

    申请号:US18444419

    申请日:2024-02-16

    Inventor: MAHITO SHINOHARA

    Abstract: A photoelectric conversion device includes a photoelectric conversion unit including a first semiconductor region, a second semiconductor region, and a third semiconductor region forming a p-n junction with the second semiconductor region, and a control circuit for switching a voltage of a reverse bias voltage applied between the first and the second semiconductor regions between first and second voltages. The photoelectric conversion device performs a period in which the reverse bias voltage is set to the first voltage to accumulate signal charge in the third semiconductor region, and a period in which the reverse bias voltage is set to the second voltage to enable transfer of signal charge to the first semiconductor region, and avalanche multiplication at the p-n junction between the first and second semiconductor regions. The control circuit switches between the first voltage and the second voltage by changing the reverse bias voltage to a rectangular shape.

    Solid-state imaging element
    138.
    发明授权

    公开(公告)号:US12047701B2

    公开(公告)日:2024-07-23

    申请号:US17995745

    申请日:2021-02-24

    CPC classification number: H04N25/77 H04N25/616 H04N25/65 H04N25/78 H04N25/79

    Abstract: Solid-state imaging elements are disclosed. In one example, an upstream circuit sequentially generates a predetermined reset level and a signal level corresponding to an exposure amount, and causes first and second capacitive elements to hold the reset level and the signal level. A selection circuit sequentially connects one of the capacitive elements to a predetermined downstream node, disconnects both capacitive elements from the downstream node, and connects the other capacitive element to the downstream node. A downstream reset transistor initializes a level of the downstream node when both capacitive elements are disconnected from the downstream node. A downstream circuit sequentially reads the reset level and the signal level from the first and second capacitive elements via the downstream node and outputs the reset level and the signal level.

    IMAGE SENSORS HAVING HIGH DYNAMIC RANGE PIXELS
    139.
    发明公开

    公开(公告)号:US20240205562A1

    公开(公告)日:2024-06-20

    申请号:US18067493

    申请日:2022-12-16

    CPC classification number: H04N25/77 H04N25/78 H04N25/79

    Abstract: An image sensor may include an array of imaging pixels arranged in rows and columns. Each imaging pixel may include a photodiode, an overflow capacitor, an overflow transistor that is interposed between the photodiode and the overflow capacitor, a floating diffusion region, a transfer transistor that is interposed between the photodiode and the floating diffusion region, a voltage supply, and a reset transistor that is interposed between the floating diffusion region and the voltage supply. The voltage supply may provide a voltage at a first magnitude that is less than the pinning voltage for a first portion of a reset period and may provide the voltage at a second magnitude that is greater than the pinning voltage for a second portion of the reset period.

    IMAGING DEVICE
    140.
    发明公开
    IMAGING DEVICE 审中-公开

    公开(公告)号:US20240204028A1

    公开(公告)日:2024-06-20

    申请号:US18398746

    申请日:2023-12-28

    Abstract: An imaging device of an embodiment has a first substrate, a second substrate, a wire, and a trench. The first substrate has a pixel having a photodiode and a floating diffusion that holds a charge converted by the photodiode. The second substrate has a pixel circuit that reads a pixel signal based on the charge held in the floating diffusion in the pixel, and is stacked on the first substrate. The wire penetrates the first substrate and the second substrate in a stacking direction, and electrically connects the floating diffusion in the first substrate to an amplification transistor in the pixel circuit of the second substrate. The trench is formed at least in the second substrate, runs in parallel with the wire, and has a depth equal to or greater than the thickness of a semiconductor layer in the second substrate.

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