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公开(公告)号:US20170141146A1
公开(公告)日:2017-05-18
申请号:US15139505
申请日:2016-04-27
Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Inventor: Aaron BELSHER , Richard MAURITZSON , Swarnal BORTHAKUR , Ulrich BOETTIGER
IPC: H01L27/146
CPC classification number: H01L27/14603 , H01L27/14632 , H01L27/14636 , H01L27/1464 , H01L27/14643 , H01L27/14689
Abstract: A backside illuminated image sensor with an array of pixels formed in a substrate is provided. To improve surface planarity, bond pads formed at the periphery of the array of pixels may be recessed into a back surface of the substrate. The bond pads may be recessed into a semiconductor layer of the substrate, may be recessed into a window in the semiconductor layer, or may be recessed in a passivation layer and covered with non-conductive material such as resin. In order to further improve surface planarity, a window may be formed in the semiconductor layer at the periphery of the array of pixels, or scribe region, over alignment structures. By providing an image sensor with improved surface planarity, device yield and time-to-market may be improved, and window framing defects and microlens/color filter non-uniformity may be reduced.
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公开(公告)号:US20220367534A1
公开(公告)日:2022-11-17
申请号:US17302836
申请日:2021-05-13
Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Inventor: Jeffrey Peter GAMBINO , David T. PRICE , Marc Allen SULFRIDGE , Richard MAURITZSON , Michael Gerard KEYES , Ryan RETTMANN , Kevin MCSTAY
IPC: H01L27/146
Abstract: An imaging device may include single-photon avalanche diodes (SPADs). To mitigate crosstalk, isolation structures may be formed around each SPAD. The isolation structures may include front side deep trench isolation structures that extend partially or fully through a semiconductor substrate for the SPADs. The isolation structures may include a metal filler such as tungsten that absorbs photons. The isolation structures may include a p-type doped semiconductor liner to mitigate dark current. The isolation structures may include a buffer layer such as silicon dioxide that is interposed between the metal filler and the p-type doped semiconductor liner. The isolation structures may have a tapered portion or may be formed in two steps such that the isolation structures have different portions with different properties. An additional filler such as polysilicon or borophosphosilicate glass may be included in some of the isolation structures in addition to the metal filler.
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公开(公告)号:US20240371905A1
公开(公告)日:2024-11-07
申请号:US18309933
申请日:2023-05-01
Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Inventor: Swarnal BORTHAKUR , Marc Allen SULFRIDGE , Jeffrey Peter GAMBINO , Vladimir KOROBOV , Richard MAURITZSON , David T. PRICE
IPC: H01L27/146 , H01L23/58
Abstract: A semiconductor device may include a first chip that includes a first wafer and a first dielectric layer disposed thereon. The semiconductor device may include a second chip that includes a second wafer and a second dielectric layer disposed thereon, the second chip having a backside surface and a frontside surface opposed to the backside surface, the second chip being bonded to the first chip at the frontside surface to define a bond line between the first dielectric layer and the second dielectric layer. An opening through the backside surface of the second chip may extend into the second dielectric layer, and a bond pad may be disposed within the second dielectric layer between the second wafer and the bond line.
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公开(公告)号:US20240321924A1
公开(公告)日:2024-09-26
申请号:US18673521
申请日:2024-05-24
Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Inventor: Jeffrey Peter GAMBINO , David T. PRICE , Marc Allen SULFRIDGE , Richard MAURITZSON , Michael Gerard KEYES , Ryan RETTMANN , Kevin MCSTAY
IPC: H01L27/146
CPC classification number: H01L27/1463 , H01L27/14603 , H01L27/14623 , H01L27/1464
Abstract: An imaging device may include single-photon avalanche diodes (SPADs). To mitigate crosstalk, isolation structures may be formed around each SPAD. The isolation structures may include front side deep trench isolation structures that extend partially or fully through a semiconductor substrate for the SPADs. The isolation structures may include a metal filler such as tungsten that absorbs photons. The isolation structures may include a p-type doped semiconductor liner to mitigate dark current. The isolation structures may include a buffer layer such as silicon dioxide that is interposed between the metal filler and the p-type doped semiconductor liner. The isolation structures may have a tapered portion or may be formed in two steps such that the isolation structures have different portions with different properties. An additional filler such as polysilicon or borophosphosilicate glass may be included in some of the isolation structures in addition to the metal filler.
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公开(公告)号:US20240205562A1
公开(公告)日:2024-06-20
申请号:US18067493
申请日:2022-12-16
Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Inventor: Sergey VELICHKO , Manuel H. INNOCENT , Richard MAURITZSON
Abstract: An image sensor may include an array of imaging pixels arranged in rows and columns. Each imaging pixel may include a photodiode, an overflow capacitor, an overflow transistor that is interposed between the photodiode and the overflow capacitor, a floating diffusion region, a transfer transistor that is interposed between the photodiode and the floating diffusion region, a voltage supply, and a reset transistor that is interposed between the floating diffusion region and the voltage supply. The voltage supply may provide a voltage at a first magnitude that is less than the pinning voltage for a first portion of a reset period and may provide the voltage at a second magnitude that is greater than the pinning voltage for a second portion of the reset period.
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公开(公告)号:US20180269245A1
公开(公告)日:2018-09-20
申请号:US15758387
申请日:2016-12-08
Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Inventor: Marko MLINAR , Ulrich BOETTIGER , Richard MAURITZSON
IPC: H01L27/146 , H04N5/369 , H04N9/04
CPC classification number: H01L27/14621 , H01L27/14607 , H01L27/14627 , H01L27/1463 , H01L27/14645 , H04N5/3696 , H04N9/04
Abstract: An image sensor may include pixels having nested sub-pixels. A pixel with nested sub-pixels may include an inner sub-pixel that has either an elliptical or a rectangular light collecting area. The inner sub-pixel may be formed in a substrate and may be immediately surrounded by a sub-pixel group that includes one or more sub-pixels. The inner sub-pixel may have a light collecting area at a surface that is less sensitive than the light collecting area of the one or more outer sub-pixel groups. Microlenses may be formed over the nested sub-pixels, to direct light away from the inner sub-pixel group to the outer sub-pixel groups in nested sub-pixels. A color filter of a single color may be formed over the nested sub-pixels. Hybrid color filters having a single color filter region over the inner sub-pixel and a portion of the one or more outer sub-pixel groups may also be used.
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公开(公告)号:US20170366772A1
公开(公告)日:2017-12-21
申请号:US15185829
申请日:2016-06-17
Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Inventor: Richard Scott JOHNSON , Richard MAURITZSON
CPC classification number: H04N5/372 , H04N5/3355 , H04N5/35581 , H04N5/37452
Abstract: Various embodiments of the present technology may comprise a method and apparatus for a pixel array. Each pixel may include multiple storage regions capable of storing pixel signals during integration. The method and apparatus may utilize the floating diffusion region as a storage region during both an integration period and readout period. The method and apparatus may store pixel signals corresponding to a first exposure periods in the floating diffusion region and pixel signals corresponding to a second exposure periods in a separate storage region.
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公开(公告)号:US20170221954A1
公开(公告)日:2017-08-03
申请号:US15155245
申请日:2016-05-16
Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Inventor: Raminda MADURAWE , Richard MAURITZSON
IPC: H01L27/146 , H01L25/04
Abstract: A stacked-die image sensor may be provided with an array of image pixels. The stacked-die image sensor may include at least first and second integrated circuit dies stacked on top of one another. Some of the pixel circuitry in each pixel may be formed in the first integrated circuit die and some of the pixel circuitry in each pixel may be formed in the second integrated circuit die. Coupling structures such as conductive pads may electrically couple the pixel circuitry in the first integrated circuit die to the pixel circuitry in the second integrated circuit die. A shielding structure may partially or completely surround each conductive pad to reduce parasitic capacitive coupling between adjacent conductive pads. The shielding structure may be a metal wire coupled to a ground voltage. The shielding structure may extend between columns of image pixels and/or between rows of image pixels.
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公开(公告)号:US20200052024A1
公开(公告)日:2020-02-13
申请号:US16455046
申请日:2019-06-27
Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Inventor: Richard MAURITZSON , Bartosz Piotr BANACHOWICZ , Jon DALEY , Brian Anthony VAARTSTRA
IPC: H01L27/146 , H01L27/148
Abstract: Implementations of image sensors may include a passivation layer coupled over a silicon layer, a color-filter-array coupled over the passivation layer, a lens coupled over the color-filter-array, and at least two optically transmissive charge dissipation layers coupled over the silicon layer.
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公开(公告)号:US20200020730A1
公开(公告)日:2020-01-16
申请号:US16583743
申请日:2019-09-26
Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Inventor: Marko MLINAR , Ulrich BOETTIGER , Richard MAURITZSON
IPC: H01L27/146 , H04N9/04 , H04N5/369
Abstract: An image sensor may include pixels having nested sub-pixels. A pixel with nested sub-pixels may include an inner sub-pixel that has either an elliptical or a rectangular light collecting area. The inner sub-pixel may be formed in a substrate and may be immediately surrounded by a sub-pixel group that includes one or more sub-pixels. The inner sub-pixel may have a light collecting area at a surface that is less sensitive than the light collecting area of the one or more outer sub-pixel groups. Microlenses may be formed over the nested sub-pixels, to direct light away from the inner sub-pixel group to the outer sub-pixel groups in nested sub-pixels. A color filter of a single color may be formed over the nested sub-pixels. Hybrid color filters having a single color filter region over the inner sub-pixel and a portion of the one or more outer sub-pixel groups may also be used.
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