公开(公告)号：US20110063603A1

公开(公告)日：2011-03-17

申请号：US12950243

申请日：2010-11-19

申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC分类号： G01N21/88 ,  G01J4/00

CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

摘要： A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

摘要翻译： 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。

公开(公告)号：US20110057649A1

公开(公告)日：2011-03-10

申请号：US12946555

申请日：2010-11-15

申请人： Minoru YOSHIDA ,  Shunji Maeda

发明人： Minoru YOSHIDA ,  Shunji Maeda

IPC分类号： G01R33/12

CPC分类号： G01N21/9501 ,  G01N21/4738

摘要： In the present invention, to make corrective matching thereof, it is designed as follows; position effect of defects coordinates, which are output from an inspection apparatus, is allowed, coordinates of inspected data are mutually corrected, and a state of coincidence or non-coincidence among a plurality sets of inspected data is output or displayed. Inspection data is designed to include kinds, kinds difference and dimension of defects. A state of coincidence or non-coincidence between inspected data is designed to be output or displayed appropriately, by kinds or dimensions, or by a grouping thereof, of a defects object. The same sample is inspected by every time of passing a production step, and a state of data increase or decrease, or coincidence or non-coincidence between the inspected data is designed to be output or displayed.

摘要翻译： 在本发明中，为了进行校正匹配，设计如下： 允许从检查装置输出的缺陷坐标的位置效果，相互校正被检查数据的坐标，并且输出或显示多组检查数据之间的一致或不一致的状态。 检验数据旨在包括缺陷的种类，种类差异和尺寸。 被检查数据之间的重合或不一致的状态被设计为通过种类或尺寸或其分组来输出或显示缺陷对象。 通过每次通过生产步骤检查相同的样品，并且被设计为输出或显示检查数据之间的数据增加或减少或一致或不一致的状态。

公开(公告)号：US07903249B2

公开(公告)日：2011-03-08

申请号：US12366003

申请日：2009-02-05

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

IPC分类号： G01N21/55

CPC分类号： G01N21/95684 ,  G01N2021/9513

摘要： An apparatus and method for inspecting defects includes an illuminator for irradiating light having an ultraviolet wavelength emitted from a light source onto a specimen through a reflection objective lens, an image-former for forming an image of light reflected from the specimen by the illumination of the light from the illuminator, which is passed through at least the reflection objective lens, a detector which detects the image of light formed by the image-former with an image sensor, and an image processor for processing a signal output from the detector to detect defects on the specimen. The image sensor is a reverse-surface irradiation type image sensor.

摘要翻译： 用于检查缺陷的装置和方法包括：照射器，用于将通过光源发射的具有从光源发射的紫外线波长的光通过反射物镜照射到样本上;成像器，用于形成从样本反射的光的图像， 至少通过反射物镜的照明器的光，用图像传感器检测由成像器形成的光的图像的检测器，以及用于处理从检测器输出的信号以检测缺陷的图像处理器 在标本上。 图像传感器是反面照射型图像传感器。

公开(公告)号：US07895014B2

公开(公告)日：2011-02-22

申请号：US11803860

申请日：2007-05-15

申请人： Claude Launay ,  Joaquim Da Silva ,  Florent Voisin ,  Tomoaki Hirai ,  Takanori Ninomiya ,  Shunji Maeda

发明人： Claude Launay ,  Joaquim Da Silva ,  Florent Voisin ,  Tomoaki Hirai ,  Takanori Ninomiya ,  Shunji Maeda

IPC分类号： G01B3/00

CPC分类号： B60R21/01532

摘要： The present invention relates to a method to locate a target in regard of a sensor, comprising the steps of collecting the outputs of a capacitive sensor comprising a plurality of electrodes and combining said outputs so as to obtain a signal representative of the distance separating said target from the sensor.

摘要翻译： 本发明涉及一种针对传感器定位目标的方法，包括以下步骤：收集包括多个电极的电容传感器的输出并组合所述输出，以便获得表示分离所述目标的距离的信号 从传感器。

公开(公告)号：US07792352B2

公开(公告)日：2010-09-07

申请号：US12123160

申请日：2008-05-19

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T2207/30148

摘要： An apparatus for inspecting pattern defects, the apparatus including: a defect candidate extraction unit configured to perform a defect candidate extraction process by comparing a detected image signal with a reference image signal; and a defect detection unit configured to perform a defect detection process and a defect classification process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the processes performed by the defect candidate extraction unit and/or the defect detection unit are performed asynchronously with an image acquisition process.

摘要翻译： 一种用于检查图案缺陷的装置，所述装置包括：缺陷候选提取单元，被配置为通过将检测到的图像信号与参考图像信号进行比较来执行缺陷候选提取处理; 以及缺陷检测单元，被配置为基于包含由缺陷候选提取单元提取的缺陷候选的部分图像执行缺陷检测处理和缺陷分类处理，其中由缺陷候选提取单元执行的处理和/或 缺陷检测单元与图像获取处理异步地执行。

公开(公告)号：US07791725B2

公开(公告)日：2010-09-07

申请号：US12271348

申请日：2008-11-14

申请人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

发明人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

IPC分类号： G01J4/00

CPC分类号： G01N21/9501 ,  G01J3/0218 ,  G01J3/0224 ,  G01J3/10 ,  G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/479 ,  G01N2021/95676 ,  G01N2201/06113 ,  G02B5/09 ,  G02B21/365 ,  G02B26/12

摘要： An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.

摘要翻译： 一种检查装置和方法，包括发射紫外线激光的光源，具有偏振光控制器和物镜的照明单元，用于利用从光源发出并通过偏振光控制器和物镜的光照射样本， 检测单元，具有用于检测由照明单元照射的样本的光的传感器;处理器，处理从传感器输出的信号以检测样本上的缺陷;以及显示器，显示从处理器输出的信息。 处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

公开(公告)号：US07711178B2

公开(公告)日：2010-05-04

申请号：US11869217

申请日：2007-10-09

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method including: sequentially imaging plural chips formed on a substrate; selecting a pattern which is suitable for calculating position gap between an inspection image of a subject chip and reference image stored in memory from an image of a firstly imaged chip among said sequentially imaged plural chips formed on the substrate; computing position gap between an inspection image of a chip obtained by the sequential imaging and reference image stored in a memory by using a positional information of a pattern image included in the inspection image and a reference pattern image included in the reference image which are both corresponding to the pattern selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image and extracting a difference as a defect candidate.

摘要翻译： 一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 从形成在所述基板上的所述顺序成像的多个芯片中，选择适合于计算被检体图像的检查图像与存储在存储器中的参考图像之间的位置间隔的图案， 通过使用包括在检查图像中的图案图像的位置信息和包括在参考图像中的参考图案图像来计算通过顺序成像获得的芯片的检查图像和存储在存储器中的参考图像之间的位置间隙， 到选择时选择的图案; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 并且将对准的检查图像与参考图像进行比较，并提取差异作为缺陷候选。

公开(公告)号：US07620232B2

公开(公告)日：2009-11-17

申请号：US11119944

申请日：2005-05-03

申请人： Kaoru Sakai ,  Shunji Maeda ,  Hidetoshi Nishiyama

发明人： Kaoru Sakai ,  Shunji Maeda ,  Hidetoshi Nishiyama

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： According to the present invention, for a pattern inspection apparatus that compares images in corresponding areas of two patterns that are identical and that determines an unmatched portion between the images is a defect, a plurality of detection systems and a plurality of corresponding image comparison methods are provided. With this configuration, the affect of uneven brightnesses for a pattern that occurs due to differences in film thicknesses can be reduced, a highly sensitive pattern inspection can be performed, a variety of defects can be revealed, and the pattern inspection apparatus can be applied for processing performed within a wide range. Furthermore, the pattern inspection apparatus also includes a unit for converting the tone of image signals of comparison images for a plurality of different processing units, and when a difference in brightness occurs in the same pattern of the images, a defect can be correctly detected.

摘要翻译： 根据本发明，对于对相同的两个图案的相应区域中的图像进行比较并且确定图像之间的不匹配部分的图像的图案检查装置是缺陷，多个检测系统和多个对应的图像比较方法是 提供。 利用这种结构，可以降低由于膜厚度差异而产生的图案的不均匀亮度的影响，可以进行高灵敏度图案检查，可以显示各种缺陷，并且图案检查装置可以应用于 在广泛的范围内进行处理。 此外，图案检查装置还包括用于转换多个不同处理单元的比较图像的图像信号的色调的单元，并且当在相同图案中出现亮度差时，可以正确地检测缺陷。

公开(公告)号：US07599545B2

公开(公告)日：2009-10-06

申请号：US10893988

申请日：2004-07-20

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Hitoshi Kubota

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Hitoshi Kubota

IPC分类号： G06K9/00 ,  H04N7/18

CPC分类号： G01N21/9501 ,  G01N21/13 ,  G01N21/8806 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/154 ,  G01N2021/8825 ,  G01N2021/9513

摘要： The present invention relates to a high-sensitivity inspection method and apparatus adapted for the fine-structuring of patterns, wherein defect inspection sensitivity is improved using the following technologies: detection optical system is improved in resolution by filling the clearance between an objective lens 30 and a sample 1, with a liquid, and increasing effective NA (Numerical Aperture); and when a transparent interlayer-insulating film is formed on the surface of the sample, amplitude splitting at the interface between the liquid and the insulating film is suppressed for reduction in the unevenness of optical images in brightness due to interference of thin-film, by immersing the clearance between the objective lens and the sample, with a liquid of a refractive index close to that of the transparent film.

摘要翻译： 本发明涉及一种适用于图案精细化的高灵敏度检测方法和装置，其中使用以下技术提高了缺陷检查灵敏度：通过填充物镜30与物镜30之间的间隙来提高检测光学系统的分辨率。 样品1，具有液体，并且增加有效NA（数值孔径）; 并且当在样品的表面上形成透明的层间绝缘膜时，抑制液体与绝缘膜之间的界面处的振幅分裂，以减少由于薄膜的干扰引起的光学图像在亮度上的不均匀性，由 将物镜与样品之间的间隙浸入折射率接近于透明膜的液体。

公开(公告)号：US20090169093A1

公开(公告)日：2009-07-02

申请号：US12393848

申请日：2009-02-26

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： In a pattern inspection apparatus for comparing images of corresponding areas of two patterns, which are formed so as to be identical, so as to judge that a non-coincident part of the images is a defect, the influence of unevenness in brightness of patterns caused by a difference of thickness or the like is reduced, whereby highly sensitive pattern inspection is realized. In addition, high-speed pattern inspection can be carried out without changing the image comparison algorithm. For this purpose, the pattern inspection apparatus operates to perform comparison processing of images in parallel in plural areas. Further, the pattern inspection apparatus operates to convert gradation of an image signal among compared images using different plural processing units such that, even in the case in which a difference of brightness occurs in an identical pattern among images, a defect can be detected correctly.