公开(公告)号：US08968980B2

公开(公告)日：2015-03-03

申请号：US13288963

申请日：2011-11-04

申请人： Ken Maruyama ,  Kota Nishino ,  Kazuki Kasahara ,  Hirokazu Sakakibara

发明人： Ken Maruyama ,  Kota Nishino ,  Kazuki Kasahara ,  Hirokazu Sakakibara

IPC分类号： G03F7/004 ,  G03F7/039 ,  C07C65/10

CPC分类号： C07C65/10 ,  C08F8/12 ,  C08F12/22 ,  C08F212/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/122 ,  Y10S430/126 ,  C08F2220/1891 ,  C08F220/18

摘要： A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, and a compound shown by the following general formula (1). wherein Z− represents a monovalent anion shown by a general formula (2), M+ represents a monovalent onium cation, R1 represents a linear or branched alkyl group having 1 to 12 carbon atoms substituted or unsubstantiated with a fluorine atom, or a linear or branched alkoxy group having 1 to 12 carbon atoms, and n is 1 or 2.

摘要翻译： 辐射敏感性树脂组合物包含含酸解离基团的树脂和由以下通式（1）表示的化合物。 其中Z-表示由通式（2）表示的一价阴离子，M +表示一价鎓阳离子，R1表示碳原子数1〜12的被氟原子取代或未取代的直链或支链烷基，或直链或支链 具有1至12个碳原子的烷氧基，n为1或2。

公开(公告)号：US08900792B2

公开(公告)日：2014-12-02

申请号：US13339948

申请日：2011-12-29

申请人： James W. Thackeray ,  Suzanne M. Coley ,  Vipul Jain ,  Owendi Ongayi ,  James F. Cameron ,  Paul J. Labeaume ,  Ahmad E. Madkour

发明人： James W. Thackeray ,  Suzanne M. Coley ,  Vipul Jain ,  Owendi Ongayi ,  James F. Cameron ,  Paul J. Labeaume ,  Ahmad E. Madkour

IPC分类号： G03F7/004 ,  G03F7/029 ,  C07D333/76 ,  G03F7/20 ,  C07C309/12 ,  C07C309/42 ,  C07C381/12 ,  G03F7/039 ,  C08F220/38

CPC分类号： G03F7/0045 ,  C07C309/12 ,  C07C309/42 ,  C07C381/12 ,  C07D333/76 ,  C08F220/38 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  Y10S430/122 ,  Y10S430/123 ,  Y10S430/126

摘要： A compound has formula (I): Q-O-(A)-Z−G+  (I) wherein Q is a halogenated or non-halogenated, C2-30 olefin-containing group, A is a fluorine-substituted C1-30 alkylene group, a fluorine-substituted C3-30 cycloalkylene group, a fluorine-substituted C6-30 arylene group, or a fluorine-substituted C7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonimide, and G+ has formula (II): wherein X is S or I, each R0 is halogenated or non-halogenated and is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination of these, wherein when X is S, one of the R0 groups is optionally attached to one adjacent R0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.

摘要翻译： 化合物具有式（I）：QO-（A）-Z-G +（I）其中Q是卤代或非卤代的含C30-30烯烃基团，A是氟取代的C1-30亚烷基， 氟取代的C3-30亚环烷基，氟取代的C6-30亚芳基或氟取代的C7-30亚烷基 - 亚芳基，Z是包含磺酸酯，磺酰胺或磺酰亚胺的阴离子基团，G +具有式 （II）：其中X为S或I，每个R 0为卤代或非卤代，独立地为C 1-30烷基; 多环或单环C 3-30环烷基; 多环或单环C 4-30芳基; 或这些的组合，其中当X是S时，R0中的一个可任选地通过单键连接到一个相邻的R0基团，a是2或3，其中当X是I时，a是2，或当X 是S，a是3。公开了共聚物，光致抗蚀剂，涂布的基材和图案化方法。

公开(公告)号：US08808975B2

公开(公告)日：2014-08-19

申请号：US12858128

申请日：2010-08-17

申请人： Haruki Inabe ,  Hiromi Kanda ,  Kunihiko Kodama

发明人： Haruki Inabe ,  Hiromi Kanda ,  Kunihiko Kodama

IPC分类号： G03F7/004 ,  G03F7/029 ,  G03F7/039 ,  G03F7/26

CPC分类号： G03F7/0045 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/122 ,  Y10S430/126

摘要： A positive resist composition for immersion exposure comprises: (A) a resin capable of increasing its solubility in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, wherein the acid satisfies conditions of V≧230 and V/S≦0.93 taking van der Waals volume of the acid as V (Å3), and van der Waals surface area of the acid as S (Å2).

摘要翻译： 用于浸渍曝光的正型抗蚀剂组合物包括：（A）能够通过酸的作用增加其在碱性显影剂中的溶解度的树脂，和（B）在用光化射线或辐射照射时能够产生酸的化合物，其中 该酸满足V≥230的条件，V / S＆NlE; 0.93以V（Å3）的酸的范德瓦尔体积和酸的范德华表面积为S（Å2）。

公开(公告)号：US08808959B2

公开(公告)日：2014-08-19

申请号：US12591152

申请日：2009-11-10

申请人： Hideo Hada ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

发明人： Hideo Hada ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/027 ,  C07C309/12 ,  C07C311/46 ,  C07C311/48 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/30 ,  Y10S430/111 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R1″-R3″ represents an aryl group or an alkyl group, provided that at least one of R1″-R3″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1″-R3″ may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(═O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).

摘要翻译： 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中具有改变的溶解性的碱成分（A）和包含（b1-1）表示的化合物的酸产生剂成分（B），由（b1- 1'）和/或（b1-1“）表示的化合物（R1”-R3“表示芳基或烷基，条件是R1”-R3“中的至少一个表示被 由（b1-1-0）表示的基团和R1“-R3”中的两个可以相互键合形成与硫原子的环; X表示C3-C30烃基; Q1表示含羰基的二价 连接基团; X10表示C1-C30烃基; Q3表示单键或二价连接基团; Y10表示-C（= O） - 或-SO2-; Y11表示C1-C10烷基或氟化烷基 ：Q2表示单键或亚烷基; W表示C2-C10亚烷基）。

公开(公告)号：US08617791B2

公开(公告)日：2013-12-31

申请号：US13614561

申请日：2012-09-13

申请人： Sen Liu ,  Pushkara R. Varanasi

发明人： Sen Liu ,  Pushkara R. Varanasi

IPC分类号： G03F7/028 ,  G03F7/26 ,  C07C309/06 ,  C07C309/26

CPC分类号： G03F7/004 ,  C07C309/25 ,  C07C309/26 ,  C07D209/04 ,  C07D261/20 ,  C07D277/62 ,  C07D307/82 ,  G03F7/0045 ,  G03F7/028 ,  G03F7/029 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123 ,  Y10S430/126

摘要： The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.

公开(公告)号：US20130260316A1

公开(公告)日：2013-10-03

申请号：US13905170

申请日：2013-05-30

申请人： JSR CORPORATION

发明人： Ken MARUYAMA

IPC分类号： G03F7/027

CPC分类号： G03F7/027 ,  C07C309/06 ,  C08F220/10 ,  C08K5/42 ,  C08L33/04 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/029 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126 ,  C08F220/18 ,  C08F220/22 ,  C08F220/20

摘要： A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. A represents —CO— or —CH2—. R1 represents a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms, or a combination of a first group and a second group. The first group is —CO—, —COO—, —OCO—, —O—CO—O—, —NHCO—, —CONH—, —NH—CO—O—, —O—CO—NH—, —NH—, —S—, —SO—, —SO2—, —SO2—O— or a combination thereof, and the second group is a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms or a combination thereof. A part or all of hydrogen atoms included in the hydrocarbon group and the heterocyclic group are not substituted or substituted. M+ represents a monovalent cation.

摘要翻译： 辐射敏感性树脂组合物包含由式（1）表示的化合物和基础聚合物。 A表示-CO-或-CH2-。 R1表示碳原子数1〜30的烃基，环原子数3〜30的杂环基或第一基和第二基的组合。 第一组为-CO-，-COO-，-OCO-，-O-CO-O-，-NHCO-，-CONH-，-NH-CO-O-，-O-CO-NH-，-NH - ， - S - ， - SO - ， - SO 2 - ， - SO 2 -O-或其组合，第二组是具有1至30个碳原子的烃基，具有3至30个环原子的杂环基或 的组合。 包含在烃基和杂环基中的部分或全部氢原子不被取代或取代。 M +表示一价阳离子。

公开(公告)号：US08541159B2

公开(公告)日：2013-09-24

申请号：US13057287

申请日：2009-09-25

申请人： Kei Yamamoto ,  Hiroshi Saegusa

发明人： Kei Yamamoto ,  Hiroshi Saegusa

IPC分类号： G03F7/26

CPC分类号： G03F7/039 ,  C09D133/16 ,  C09D133/26 ,  C09D143/04 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  Y10S430/122 ,  Y10S430/126

摘要： A positive resist composition for immersion exposure includes the following (A) to (D): (A) a resin capable of decomposing by an action of an acid to increase a solubility of the resin in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a resin having at least either one of a fluorine atom and a silicon atom; and (D) a mixed solvent containing at least one kind of a solvent selected from the group consisting of solvents represented by any one of the following formulae (S1) to (S3) as defined in the specification, in which a total amount of the at least one kind of the solvent is from 3 to 20 mass % based on all solvents of the mixed solvent (D).

公开(公告)号：US20130017490A1

公开(公告)日：2013-01-17

申请号：US13617623

申请日：2012-09-14

申请人： Sen Liu ,  Pushkara R. Varanasi

发明人： Sen Liu ,  Pushkara R. Varanasi

IPC分类号： C07D333/62 ,  G03F7/20 ,  C07D277/76 ,  G03F7/027

CPC分类号： G03F7/004 ,  C07C309/25 ,  C07C309/26 ,  C07D209/04 ,  C07D261/20 ,  C07D277/62 ,  C07D307/82 ,  G03F7/0045 ,  G03F7/028 ,  G03F7/029 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123 ,  Y10S430/126

摘要： The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.

公开(公告)号：US08334088B2

公开(公告)日：2012-12-18

申请号：US12938459

申请日：2010-11-03

申请人： Robert D. Allen ,  Matthew E. Colburn ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Hoa D. Truong

发明人： Robert D. Allen ,  Matthew E. Colburn ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Hoa D. Truong

IPC分类号： G03F7/038 ,  G03F7/039

CPC分类号： G03F7/0757 ,  C08G77/60 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/126

摘要： Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.

摘要翻译： 提供了在193nm处具有小于3.0μm-1的吸光度和相对高的折射率的线性或分支官能化的聚碳硅烷。 官能化聚碳硅烷含有至少一个酸不稳定或水溶性碱可溶的侧基。 还公开了含有适用于光刻（例如浸渍光刻）的官能化聚碳硅烷的光致抗蚀剂制剂。

公开(公告)号：US20120219904A1

公开(公告)日：2012-08-30

申请号：US13404226

申请日：2012-02-24

申请人： Koji ICHIKAWA ,  Yuichi MUKAI ,  Satoshi YAMAMOTO

发明人： Koji ICHIKAWA ,  Yuichi MUKAI ,  Satoshi YAMAMOTO

IPC分类号： G03F7/20 ,  G03F7/027

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

摘要： A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and (B) an acid generator represented by the formula (II). wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; R3 and R4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; X1 represents an C1 to C17 divalent saturated hydrocarbon group; R5 represents a group having cyclic ether structure; and Z1+ represents an organic cation.

摘要翻译： 抗蚀剂组合物含有（A1）具有由式（I）表示的结构单元的树脂，（A2）不溶于碱性水溶液或难溶于碱性水溶液的树脂，但通过酸的作用变得可溶于碱性水溶液 ，（B）由式（II）表示的酸发生剂。 其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基; R3和R4独立地表示氟原子或C1〜C6全氟烷基; X1表示C1〜C17二价饱和烃基; R5表示具有环醚结构的基团; Z1 +表示有机阳离子。