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公开(公告)号：US10367117B2
公开(公告)日：2019-07-30
申请号：US15551282
申请日：2017-06-20
Inventor： Macai Lu , Jiangbo Yao
IPC: H01L21/00 , H01L33/00 , H01L21/683 , H01L33/20
Abstract: The present invention provides an apparatus and a method for transferring micro light-emitting diodes. Said apparatus for transferring the micro light-emitting diodes comprises a main body, and a spraying module, a cooling module and a heating module disposed on said main body. The spraying module sprays metallic adhesive liquid onto the micro light-emitting diodes that wait to transfer, the cooling module cools the metallic adhesive liquid on the wait-to-transfer micro light-emitting diodes, thereby curing the metallic adhesive liquid to adhesively bond the main body with the wait-to-transfer micro light-emitting diodes together implementing the transfer of the micro light-emitting diodes, After transferred to reach the position, the cured metallic adhesive liquid is heated by the heating module, thereby melting the metallic adhesive liquid to separate the main body from the wait-to-transfer micro light-emitting diodes. This is capable of lowering the difficulty of transferring the micro light-emitting diodes, and enhancing the efficiently of transferring the micro light-emitting diodes.
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公开(公告)号：US10090414B2
公开(公告)日：2018-10-02
申请号：US15513562
申请日：2017-02-13
Inventor： Macai Lu , Jiangbo Yao , Shijian Qin
IPC: H01L21/84 , H01L29/786 , H01L29/51 , H01L21/02 , H01L29/423
Abstract: The present invention provides a TFT (Thin Film Transistor) substrate manufacture method, which includes forming a TFT gate electrode on a substrate, sequentially forming a first insulation layer, an active layer, a source electrode, and a drain electrode, and then forming a second insulation layer and coating a photoresist thereon, defining a pixel electrode pattern, forming a drain VIA hole on the second insulation layer, depositing a pixel electrode layer after preparing suede on the photoresist, and permeating the suede with a stripping liquid to remove the photoresist and the pixel electrode layer on the photoresist so as to form a pixel electrode connecting to the drain electrode via the drain VIA hole.
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公开(公告)号：US09779660B2
公开(公告)日：2017-10-03
申请号：US14761344
申请日：2015-05-12
Inventor： Jiangbo Yao
IPC: G09G3/32 , G09G3/3233
CPC classification number: G09G3/3233 , G09G2300/0842 , G09G2320/0214 , G09G2320/0223 , G09G2320/0247
Abstract: A pixel cell driving circuit driving an organic electric lighting component comprises a first, a second and a third thin film transistors and a storage capacitor. The first thin film transistor is turned on or turned off under a control of a first scanning signal. When the first thin film transistor is turned on, the storage capacitor is charged by a data signal. The second thin film transistor is turned on under an action of the storage capacitor and drives an OLED. The third thin film transistor is turned on under a control of the second scanning signal when the first thin film transistor is turned off, and the storage capacitor is charged by a charging signal. The pixel cell driving circuit may effectively avoid the flicker due to the electrical charge leakage of the storage capacitor. The disclosure further provides a pixel cell and a pixel cell driving method.
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公开(公告)号：US20160365371A1
公开(公告)日：2016-12-15
申请号：US14771208
申请日：2015-07-01
Inventor： Jiangbo Yao
CPC classification number: H01L27/1262 , B08B5/00 , B08B7/0057 , B08B15/00 , C03C23/002 , C03C23/0075 , H01L21/02068 , H01L21/02082 , H01L21/6704 , H01L21/67115
Abstract: The present invention provides an UV cleaning device of a glass substrate, comprising a lamp box, an UV lamp positioned above inside the lamp box, a transparent shield positioned under the UV lamp, a humidifier positioned under the transparent shield and a power exhaust device under the transparent shield and opposite to the humidifier; in usage, the glass substrate is conveyed to be inside the lamp box, and UV light generated by the UV lamp irradiates on the glass substrate through the shield to clean the glass substrate and a humidity and an oxygen content inside the lamp box are adjusted with the humidifier to make a surface of the glass substrate adsorb one layer of water molecules. The electrons generated as the UV light cleans can be gradually conducted and led out with water molecules to effectively restrain the accumulation of the electrostatic to reduce the phenomenon of electrostatic damage, and meanwhile, the increase of the oxygen content makes the concentration of the activated oxygen atoms increases along with. Accordingly, the result of cleaning the organic objects with the UV light is promoted.
Abstract translation: 本发明提供一种玻璃基板的紫外线清洁装置，其特征在于，包括灯箱，位于灯箱内部的紫外灯，位于紫外灯下方的透明屏蔽体，位于透明屏蔽下方的加湿器， 透明屏蔽并与加湿器相对; 在使用中，玻璃基板被输送到灯箱内部，并且由UV灯产生的UV光通过屏蔽件照射在玻璃基板上以清洁玻璃基板，并且用灯箱内的湿度和氧含量调节 加湿器使玻璃基板的表面吸附一层水分子。 紫外光清洗产生的电子可以逐渐导入，并用水分子引出，有效地抑制了静电的积聚，减少了静电损伤的现象，同时氧含量的增加也使活性氧的浓度 原子一起增加。 因此，促进了用UV光清洁有机物体的结果。
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公开(公告)号：US11114476B2
公开(公告)日：2021-09-07
申请号：US16076186
申请日：2018-06-11
Inventor： Chuanbao Luo , Jiangbo Yao
IPC: H01L27/12 , G02F1/1362 , G02F1/1368 , H01L29/66 , H01L29/786
Abstract: A manufacturing method of a TFT array substrate is provided, comprising: depositing and forming a gate and a gate scanning line; depositing sequentially a gate insulating layer, an active layer and a second metal layer; depositing and forming a first photoresist layer and a second photoresist layer on the second metal layer; first photoresist layer comprising a first-stage photoresist layer, second-stage photoresist layer and third-stage photoresist layer with increasing thickness, the first-stage photoresist layer being in the middle of the first photoresist layer and a channel being formed; ashing to remove first-stage photoresist layer, forming a source and a drain by etching; and ashing to remove the second-stage photoresist layer, and then depositing a passivation layer as a whole; stripping third-stage photoresist layer and second photoresist layer, depositing and forming a pixel electrode and a common electrode.
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Patent Agency Ranking
公开(公告)号：US09680114B2
公开(公告)日：2017-06-13
申请号：US14417744
申请日：2015-01-07
Inventor： Jiangbo Yao
CPC classification number: H01L27/3262 , H01L27/3244 , H01L27/3246 , H01L51/0097 , H01L51/5253 , H01L51/56 , H01L2227/32 , H01L2227/323 , H01L2251/5338 , H01L2251/558 , Y02E10/549
Abstract: A flexible organic light emitting display and a method for manufacturing the same are disclosed. The method is: sequentially forming a first buffer layer, a switch array layer, a display unit layer, and a thin film package layer on a flexible underlay substrate. When the flexible organic light emitting display bends along the flexible underlay substrate, a first bending deformation force is generated. The first buffer layer is used to absorb the first bending deformation force, and the material of the first buffer layer is an organic insulating material.
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公开(公告)号：US20150144153A1
公开(公告)日：2015-05-28
申请号：US14118231
申请日：2013-08-29
Inventor： Jiangbo Yao , Chunliang Lee
CPC classification number: B08B7/0057 , B08B3/022 , B08B3/041 , B08B3/08 , B08B7/04
Abstract: The present invention provides an ultraviolet light based cleansing method and cleansing device. The method includes: (1) irradiating a substrate to be cleansed with ultraviolet light and controlling output energy of the ultraviolet light in order to control photon energy received by TFT component patterns formed on the substrate to be cleansed within an irradiation time period to be less than electron excitation energy that breaks down TFT component patterns; (2) cleansing the substrate to be cleansed with an alkaline solution; (3) cleansing the substrate to be cleansed with water/gas dual-fluid; (4) cleansing the substrate to be cleansed with deionized water; (5) drying the substrate to be cleansed with an air knife; and (6) subjecting the substrate to be cleansed to dehydration and drying to complete the cleansing operation, thereby improving product yield rate and cleanness.
Abstract translation: 本发明提供了一种基于紫外光的清洁方法和清洁装置。 该方法包括：（1）用紫外线照射待清洁的基板并控制紫外光的输出能量，以便控制在照射时间段内在基板上形成的TFT部件图案所接收的光子能量被更少地被清洁 比分解TFT组件图案的电子激发能量; （2）用碱性溶液清洗待清洗的基材; （3）用水/气双液清洗待清洗的基材; （4）用去离子水清洗待清洗的基材; （5）用气刀干燥待清洗的基材; 和（6）对基材进行清洁脱水干燥以完成清洁操作，从而提高产品成品率和清洁度。
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公开(公告)号：US09786699B2
公开(公告)日：2017-10-10
申请号：US14771208
申请日：2015-07-01
Inventor： Jiangbo Yao
CPC classification number: H01L27/1262 , B08B5/00 , B08B7/0057 , B08B15/00 , C03C23/002 , C03C23/0075 , H01L21/02068 , H01L21/02082 , H01L21/6704 , H01L21/67115
Abstract: The present invention provides an UV cleaning device of a glass substrate, comprising a lamp box, an UV lamp positioned above inside the lamp box, a transparent shield positioned under the UV lamp, a humidifier positioned under the transparent shield and a power exhaust device under the transparent shield and opposite to the humidifier; in usage, the glass substrate is conveyed to be inside the lamp box, and UV light generated by the UV lamp irradiates on the glass substrate through the shield to clean the glass substrate and a humidity and an oxygen content inside the lamp box are adjusted with the humidifier to make a surface of the glass substrate adsorb one layer of water molecules. The electrons generated as the UV light cleans can be gradually conducted and led out with water molecules to effectively restrain the accumulation of the electrostatic to reduce the phenomenon of electrostatic damage, and meanwhile, the increase of the oxygen content makes the concentration of the activated oxygen atoms increases along with. Accordingly, the result of cleaning the organic objects with the UV light is promoted.
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公开(公告)号：US09700921B2
公开(公告)日：2017-07-11
申请号：US14381200
申请日：2014-06-12
Inventor： Jiangbo Yao
IPC: B08B7/00 , B08B13/00 , G02F1/1368 , G02F1/13 , G02F1/1333
CPC classification number: B08B7/0057 , B08B13/00 , G02F1/1368 , G02F2001/1316 , G02F2001/133302
Abstract: The present invention is related with a method of cleaning a substrate by ultraviolet rays with adjustable radiation energy, comprising steps of: providing an ultraviolet ray light (10) and a substrate (20) to be cleaned with the ultraviolet rays; locating several shading plates (30) between the ultraviolet ray light (10) and the substrate (20) to be cleaned with the ultraviolet rays; rotating the shading plates (30) to adjust an area of the substrate (20) irradiated with the ultraviolet rays emitted by the ultraviolet ray light (10) and thus to control the radiation energy on the substrate (20) in the unit time; cleaning the substrate (20) with the ultraviolet rays emitted by the ultraviolet ray light (10). With the method, the radiation energy of the ultraviolet rays for cleaning the substrate can be flexibly adjusted. The objectives of efficiently removing the organic matter stick on the surface of the substrate and preventing the static damage to the circuit pattern of the substrate can be achieved. Thus, the quality and the yield of the productions can be promoted.
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公开(公告)号：US09486842B2
公开(公告)日：2016-11-08
申请号：US14118231
申请日：2013-08-29
Inventor： Jiangbo Yao , Chunliang Lee
CPC classification number: B08B7/0057 , B08B3/022 , B08B3/041 , B08B3/08 , B08B7/04
Abstract: The present invention provides an ultraviolet light based cleansing method and cleansing device. The method includes: (1) irradiating a substrate to be cleansed with ultraviolet light and controlling output energy of the ultraviolet light in order to control photon energy received by TFT component patterns formed on the substrate to be cleansed within an irradiation time period to be less than electron excitation energy that breaks down TFT component patterns; (2) cleansing the substrate to be cleansed with an alkaline solution; (3) cleansing the substrate to be cleansed with water/gas dual-fluid; (4) cleansing the substrate to be cleansed with deionized water; (5) drying the substrate to be cleansed with an air knife; and (6) subjecting the substrate to be cleansed to dehydration and drying to complete the cleansing operation, thereby improving product yield rate and cleanness.
Abstract translation: 本发明提供了一种基于紫外光的清洁方法和清洁装置。 该方法包括：（1）用紫外线照射待清洁的基板并控制紫外光的输出能量，以便控制在照射时间段内在基板上形成的TFT部件图案所接收的光子能量被更少地被清洁 比分解TFT组件图案的电子激发能量; （2）用碱性溶液清洗待清洗的基材; （3）用水/气双液清洗待清洗的基材; （4）用去离子水清洗待清洗的基材; （5）用气刀干燥待清洗的基材; 和（6）对基材进行清洁脱水干燥以完成清洁操作，从而提高产品成品率和清洁度。
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