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公开(公告)号:US10903053B2
公开(公告)日:2021-01-26
申请号:US16549408
申请日:2019-08-23
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hak Young Kim , Jung Pyo Hong , Jong Woo Sun , Doug Yong Sung , Yong Ho Lim , Yun Kwang Jeon , Hwa Jun Jung
Abstract: A plasma processing apparatus includes a chamber, a window plate disposed in an upper portion of the chamber and having a fastening hole defined therein, an injector having a body part including a plurality of nozzles and configured to be fastened to the fastening hole, and a flange part extending radially from the body part to partially cover a bottom surface of the window plate when the body part is fastened to the fastening hole, and a stopper configured to be fastened to the body part on an upper surface of the window plate to hold the injector in the fastening hole when the body part is fastened to the fastening hole.
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公开(公告)号:US10481005B2
公开(公告)日:2019-11-19
申请号:US16157682
申请日:2018-10-11
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Se Jin Oh , Tae Kyun Kang , Yu Sin Kim , Jae Ik Kim , Chan Bin Mo , Doug Yong Sung , Seung Bin Ahn , Kul Inn , Yun Kwang Jeon
Abstract: A semiconductor substrate measuring apparatus includes a light source unit generating irradiation light including light in a first wavelength band and light in a second wavelength band. An optical unit irradiates the irradiation light on a measurement object and condenses reflected light. A light splitting unit splits the reflected light, condensed in the optical unit, into a first optical path and a second optical path. A first detecting unit is disposed on the first optical path and detects first interference light in the first wavelength band in the reflected light. A second detecting unit is disposed on the second optical path and detects second interference light in the second wavelength band in the reflected light. A controlling unit calculates at least one of a surface shape or a thickness of the measurement object. The controlling unit calculates a temperature of the measurement object.
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公开(公告)号:US10229818B2
公开(公告)日:2019-03-12
申请号:US15260910
申请日:2016-09-09
Applicant: Samsung Electronics Co., Ltd.
Inventor: Protopopov Vladimir , Ki Ho Hwang , Doug Yong Sung , Se Jin Oh , Kul Inn , Sung Ho Jang , Yun Kwang Jeon
Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
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公开(公告)号:US10971343B2
公开(公告)日:2021-04-06
申请号:US16262024
申请日:2019-01-30
Applicant: Samsung Electronics Co., Ltd.
Inventor: Protopopov Vladimir , Ki Ho Hwang , Doug Yong Sung , Se Jin Oh , Kul Inn , Sung Ho Jang , Yun Kwang Jeon
Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
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公开(公告)号:US10395900B2
公开(公告)日:2019-08-27
申请号:US15415403
申请日:2017-01-25
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hak Young Kim , Jung Pyo Hong , Jong Woo Sun , Doug Yong Sung , Yong Ho Lim , Yun Kwang Jeon , Hwa Jun Jung
Abstract: A plasma processing apparatus includes a chamber, a window plate disposed in an upper portion of the chamber and having a fastening hole defined therein, an injector having a body part including a plurality of nozzles and configured to be fastened to the fastening hole, and a flange part extending radially from the body part to partially cover a bottom surface of the window plate when the body part is fastened to the fastening hole, and a stopper configured to be fastened to the body part on an upper surface of the window plate to hold the injector in the fastening hole when the body part is fastened to the fastening hole.
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公开(公告)号:US20170365444A1
公开(公告)日:2017-12-21
申请号:US15415403
申请日:2017-01-25
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hak Young Kim , Jung Pyo Hong , Jong Woo Sun , Doug Yong Sung , Yong Ho Lim , Yun Kwang Jeon , Hwa Jun Jung
CPC classification number: H01J37/3244 , H01J37/321 , H01J37/32119 , H01J37/32449 , H01J37/32458 , H01J2237/334 , H01L21/67069
Abstract: A plasma processing apparatus includes a chamber, a window plate disposed in an upper portion of the chamber and having a fastening hole defined therein, an injector having a body part including a plurality of nozzles and configured to be fastened to the fastening hole, and a flange part extending radially from the body part to partially cover a bottom surface of the window plate when the body part is fastened to the fastening hole, and a stopper configured to be fastened to the body part on an upper surface of the window plate to hold the injector in the fastening hole when the body part is fastened to the fastening hole.
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